BR7016778D0 - Composicao foto resistente de processamento positivo - Google Patents

Composicao foto resistente de processamento positivo

Info

Publication number
BR7016778D0
BR7016778D0 BR216778/70A BR21677870A BR7016778D0 BR 7016778 D0 BR7016778 D0 BR 7016778D0 BR 216778/70 A BR216778/70 A BR 216778/70A BR 21677870 A BR21677870 A BR 21677870A BR 7016778 D0 BR7016778 D0 BR 7016778D0
Authority
BR
Brazil
Prior art keywords
positive processing
photo composition
resistant photo
processing resistant
composition
Prior art date
Application number
BR216778/70A
Other languages
English (en)
Inventor
A Deutsch
F Loprest
Original Assignee
Gaf Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gaf Corp filed Critical Gaf Corp
Publication of BR7016778D0 publication Critical patent/BR7016778D0/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BR216778/70A 1969-02-17 1970-02-16 Composicao foto resistente de processamento positivo BR7016778D0 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US79999869A 1969-02-17 1969-02-17

Publications (1)

Publication Number Publication Date
BR7016778D0 true BR7016778D0 (pt) 1973-01-18

Family

ID=25177259

Family Applications (1)

Application Number Title Priority Date Filing Date
BR216778/70A BR7016778D0 (pt) 1969-02-17 1970-02-16 Composicao foto resistente de processamento positivo

Country Status (12)

Country Link
US (1) US3637384A (pt)
JP (1) JPS505082B1 (pt)
BE (1) BE746019A (pt)
BR (1) BR7016778D0 (pt)
CH (1) CH534374A (pt)
DE (1) DE2007208A1 (pt)
ES (1) ES376608A1 (pt)
FR (1) FR2037095A1 (pt)
GB (1) GB1290747A (pt)
IL (1) IL33863A (pt)
NL (1) NL7002130A (pt)
SE (1) SE358749B (pt)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890153A (en) * 1971-03-13 1975-06-17 Philips Corp Positive-acting napthoquinone diazide photosensitive composition
US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
DE2236941C3 (de) * 1972-07-27 1982-03-25 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
US3891438A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US3891439A (en) * 1972-11-02 1975-06-24 Polychrome Corp Aqueous developing composition for lithographic diazo printing plates
US3868254A (en) * 1972-11-29 1975-02-25 Gaf Corp Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
US4093461A (en) * 1975-07-18 1978-06-06 Gaf Corporation Positive working thermally stable photoresist composition, article and method of using
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS56143824A (en) * 1980-04-12 1981-11-09 Akebono Brake Ind Co Ltd Disc brake with air-oil converter
US4332881A (en) * 1980-07-28 1982-06-01 Bell Telephone Laboratories, Incorporated Resist adhesion in integrated circuit processing
US4423138A (en) * 1982-01-21 1983-12-27 Eastman Kodak Company Resist developer with ammonium or phosphonium compound and method of use to develop o-quinone diazide and novolac resist
DE3379983D1 (en) * 1982-11-01 1989-07-06 Du Pont Single exposure positive contact litho film
DE3442756A1 (de) * 1984-11-23 1986-05-28 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen
US4634659A (en) * 1984-12-19 1987-01-06 Lehigh University Processing-free planographic printing plate
US4640884A (en) * 1985-03-29 1987-02-03 Polychrome Corp. Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group
JPS613062U (ja) * 1985-05-15 1986-01-09 株式会社ナブコ 車両用ブレーキシリンダ
US4822722A (en) * 1985-07-18 1989-04-18 Petrarch Systems, Inc. Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image
JP2593305B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物
US5206348A (en) * 1992-07-23 1993-04-27 Morton International, Inc. Hexahydroxybenzophenone sulfonate esters of diazonaphthoquinone sensitizers and positive photoresists employing same
US20050074552A1 (en) * 2003-10-07 2005-04-07 Howard Ge Photoresist coating process for microlithography
US7305251B2 (en) * 2003-10-07 2007-12-04 Motorola Inc. Method for selecting a core network

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL95406C (pt) * 1954-08-20
BE540225A (pt) * 1954-08-20
US2980534A (en) * 1956-12-17 1961-04-18 Monsanto Chemicals Photographic compositions and photographic elements
US2990281A (en) * 1956-12-17 1961-06-27 Monsanto Chemicals Photosensitive resinous compositions and photographic elements
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
US3323917A (en) * 1963-03-07 1967-06-06 Gen Aniline & Film Corp Photomechanical bleachout color process
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
GB1116674A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Naphthoquinone diazide sulphofluoride
GB1136544A (en) * 1966-02-28 1968-12-11 Agfa Gevaert Nv Photochemical cross-linking of polymers
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
US3551154A (en) * 1966-12-28 1970-12-29 Ferrania Spa Light sensitive article comprising a quinone diazide and polymeric binder

Also Published As

Publication number Publication date
NL7002130A (pt) 1970-08-19
CH534374A (de) 1973-02-28
BE746019A (fr) 1970-07-31
GB1290747A (pt) 1972-09-27
DE2007208A1 (de) 1970-09-03
IL33863A (en) 1973-06-29
FR2037095A1 (pt) 1970-12-31
JPS505082B1 (pt) 1975-02-28
US3637384A (en) 1972-01-25
ES376608A1 (es) 1972-05-01
IL33863A0 (en) 1970-05-21
SE358749B (pt) 1973-08-06

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