BR112015024628A2 - método e dispositivo de limpeza de película de revestimento de carbono - Google Patents
método e dispositivo de limpeza de película de revestimento de carbonoInfo
- Publication number
- BR112015024628A2 BR112015024628A2 BR112015024628A BR112015024628A BR112015024628A2 BR 112015024628 A2 BR112015024628 A2 BR 112015024628A2 BR 112015024628 A BR112015024628 A BR 112015024628A BR 112015024628 A BR112015024628 A BR 112015024628A BR 112015024628 A2 BR112015024628 A2 BR 112015024628A2
- Authority
- BR
- Brazil
- Prior art keywords
- workpiece
- coating film
- carbon coating
- cleaning method
- film cleaning
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Abstract
resumo patente de invenção: "método e dispositivo de limpeza de película de revestimento de carbono". a presente invenção refere-se a um dispositivo cvd de plasma; e um método para limpeza de película de revestimento de carbono com o qual uma película de revestimento de carbono formada em cada parte do cvd de plasma pode ser limpa. esse dispositivo cvd de plasma (1) é dotado de: primeiro e segundo membros de vedação (2a e 2b) que compreendem isolantes que vedam cada extremidade de uma peça de trabalho (w) ou de uma peça de trabalho simulada (w'), eletrodos positivos (3); meios de redução de pressão (16, 17) para reduzir a pressão em um interior da peça de trabalho (w) ou da peça de trabalho simulada (w'); meios de suprimento de gás de material de partida (6) para suprir um gás de material de partida para o interior da peça de trabalho (w); uma fonte de alimentação pulsada (27); e um meio de suprimento de gás oxigênio (8) para suprir gás oxigênio para o interior da peça de trabalho simulada (w').
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013-116035 | 2013-05-31 | ||
JP2013116035 | 2013-05-31 | ||
PCT/JP2014/064467 WO2014192929A1 (ja) | 2013-05-31 | 2014-05-30 | 炭素被膜クリーニング方法及び装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112015024628A2 true BR112015024628A2 (pt) | 2017-07-18 |
BR112015024628B1 BR112015024628B1 (pt) | 2021-10-26 |
Family
ID=51988947
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112015024628-1A BR112015024628B1 (pt) | 2013-05-31 | 2014-05-30 | Método e dispositivo de limpeza de película de revestimento de carbono |
Country Status (7)
Country | Link |
---|---|
US (2) | US9994957B2 (pt) |
JP (2) | JP6030759B2 (pt) |
CN (1) | CN105229197B (pt) |
BR (1) | BR112015024628B1 (pt) |
CA (1) | CA2903184C (pt) |
MX (1) | MX2015015989A (pt) |
WO (2) | WO2014192928A1 (pt) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112531180B (zh) * | 2019-09-17 | 2024-05-31 | 全球能源互联网研究院有限公司 | 一种去除平板式电池阳极积炭的方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6087025A (en) * | 1994-03-29 | 2000-07-11 | Southwest Research Institute | Application of diamond-like carbon coatings to cutting surfaces of metal cutting tools |
JPH0931626A (ja) | 1995-07-25 | 1997-02-04 | Mitsubishi Electric Corp | 金型加工装置 |
JP3119172B2 (ja) * | 1995-09-13 | 2000-12-18 | 日新電機株式会社 | プラズマcvd法及び装置 |
JPH09195036A (ja) * | 1996-01-22 | 1997-07-29 | Ulvac Japan Ltd | 蒸着装置、及び薄膜製造方法 |
JPH10110269A (ja) | 1996-10-07 | 1998-04-28 | Nissin Electric Co Ltd | パチンコ玉およびその製造方法 |
JP3555844B2 (ja) | 1999-04-09 | 2004-08-18 | 三宅 正二郎 | 摺動部材およびその製造方法 |
JP2001003169A (ja) | 1999-06-18 | 2001-01-09 | Sanyo Electric Co Ltd | 炭素系被膜の処理方法及び炭素系被膜並びに炭素系被膜を有する部品 |
US6440864B1 (en) * | 2000-06-30 | 2002-08-27 | Applied Materials Inc. | Substrate cleaning process |
JP4413084B2 (ja) * | 2003-07-30 | 2010-02-10 | シャープ株式会社 | プラズマプロセス装置及びそのクリーニング方法 |
JP4973971B2 (ja) | 2003-08-08 | 2012-07-11 | 日産自動車株式会社 | 摺動部材 |
FR2865420B1 (fr) * | 2004-01-28 | 2007-09-14 | Saint Gobain | Procede de nettoyage d'un substrat |
US7300684B2 (en) | 2004-07-15 | 2007-11-27 | Sub-One Technology, Inc. | Method and system for coating internal surfaces of prefabricated process piping in the field |
US7608151B2 (en) * | 2005-03-07 | 2009-10-27 | Sub-One Technology, Inc. | Method and system for coating sections of internal surfaces |
JP4717591B2 (ja) | 2005-10-28 | 2011-07-06 | スタンレー電気株式会社 | プラズマ成膜装置 |
US7838793B2 (en) * | 2006-07-21 | 2010-11-23 | Sub-One Technology, Inc. | System and method for treating surfaces of components |
US8105660B2 (en) | 2007-06-28 | 2012-01-31 | Andrew W Tudhope | Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component |
GB2458507A (en) * | 2008-03-20 | 2009-09-23 | Tecvac Ltd | Oxidation of non ferrous metal components |
CA2724334A1 (en) * | 2008-05-13 | 2009-11-19 | Sub-One Technology, Inc. | Method of coating inner and outer surfaces of pipes for thermal solar and other applications |
US8715789B2 (en) * | 2009-12-18 | 2014-05-06 | Sub-One Technology, Inc. | Chemical vapor deposition for an interior of a hollow article with high aspect ratio |
JP2011162857A (ja) * | 2010-02-10 | 2011-08-25 | Nagoya Univ | コーティング前処理方法、ダイヤモンド被膜のコーティング方法、および脱膜処理方法 |
US8753725B2 (en) * | 2011-03-11 | 2014-06-17 | Southwest Research Institute | Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrode |
JP5816500B2 (ja) | 2011-09-15 | 2015-11-18 | スタンレー電気株式会社 | プラズマガンおよびそれを用いた成膜装置 |
US9121540B2 (en) * | 2012-11-21 | 2015-09-01 | Southwest Research Institute | Superhydrophobic compositions and coating process for the internal surface of tubular structures |
-
2014
- 2014-05-30 CA CA2903184A patent/CA2903184C/en active Active
- 2014-05-30 WO PCT/JP2014/064466 patent/WO2014192928A1/ja active Application Filing
- 2014-05-30 CN CN201480028664.7A patent/CN105229197B/zh active Active
- 2014-05-30 WO PCT/JP2014/064467 patent/WO2014192929A1/ja active Application Filing
- 2014-05-30 US US14/778,309 patent/US9994957B2/en active Active
- 2014-05-30 MX MX2015015989A patent/MX2015015989A/es active IP Right Grant
- 2014-05-30 JP JP2015519966A patent/JP6030759B2/ja active Active
- 2014-05-30 US US14/778,302 patent/US10273581B2/en active Active
- 2014-05-30 JP JP2015519967A patent/JP5982570B2/ja not_active Expired - Fee Related
- 2014-05-30 BR BR112015024628-1A patent/BR112015024628B1/pt active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US20160281237A1 (en) | 2016-09-29 |
US10273581B2 (en) | 2019-04-30 |
CA2903184A1 (en) | 2014-12-04 |
JPWO2014192929A1 (ja) | 2017-02-23 |
US20160281217A1 (en) | 2016-09-29 |
MX2015015989A (es) | 2017-01-11 |
US9994957B2 (en) | 2018-06-12 |
JP6030759B2 (ja) | 2016-11-24 |
BR112015024628B1 (pt) | 2021-10-26 |
WO2014192929A1 (ja) | 2014-12-04 |
JP5982570B2 (ja) | 2016-08-31 |
CA2903184C (en) | 2017-03-14 |
JPWO2014192928A1 (ja) | 2017-02-23 |
CN105229197A (zh) | 2016-01-06 |
WO2014192928A1 (ja) | 2014-12-04 |
CN105229197B (zh) | 2017-05-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 30/05/2014, OBSERVADAS AS CONDICOES LEGAIS. |