BR112014012376A2 - sistema hf, dispositivo de acoplamento de sinal e processo para operação de um dispositivo hf - Google Patents

sistema hf, dispositivo de acoplamento de sinal e processo para operação de um dispositivo hf

Info

Publication number
BR112014012376A2
BR112014012376A2 BR112014012376A BR112014012376A BR112014012376A2 BR 112014012376 A2 BR112014012376 A2 BR 112014012376A2 BR 112014012376 A BR112014012376 A BR 112014012376A BR 112014012376 A BR112014012376 A BR 112014012376A BR 112014012376 A2 BR112014012376 A2 BR 112014012376A2
Authority
BR
Brazil
Prior art keywords
signal
operating
oscillator
producing
signal coupling
Prior art date
Application number
BR112014012376A
Other languages
English (en)
Inventor
Sadeghfam Arash
Heuermann Holger
Original Assignee
Dritte Patentportfolio Beteili
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dritte Patentportfolio Beteili filed Critical Dritte Patentportfolio Beteili
Publication of BR112014012376A2 publication Critical patent/BR112014012376A2/pt

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B47/00Circuit arrangements for operating light sources in general, i.e. where the type of light source is not relevant
    • H05B47/10Controlling the light source
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03LAUTOMATIC CONTROL, STARTING, SYNCHRONISATION OR STABILISATION OF GENERATORS OF ELECTRONIC OSCILLATIONS OR PULSES
    • H03L7/00Automatic control of frequency or phase; Synchronisation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B41/00Circuit arrangements or apparatus for igniting or operating discharge lamps
    • H05B41/14Circuit arrangements
    • H05B41/24Circuit arrangements in which the lamp is fed by high frequency ac, or with separate oscillator frequency
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02BCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
    • Y02B20/00Energy efficient lighting technologies, e.g. halogen lamps or gas discharge lamps

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Circuit Arrangements For Discharge Lamps (AREA)
  • Stabilization Of Oscillater, Synchronisation, Frequency Synthesizers (AREA)
  • Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)
  • Circuits Of Receivers In General (AREA)

Abstract

resumo “sistema hf, dispositivo de acoplamento de sinal e processo para operação de um dispositivo hf” é proposto um sistema hf (1) compreendendo um dispositivo hf (5), particularmente uma lâmpada hf, uma vela de ignição hf ou aplicação de plasma hf similar, assim como um dispositivo de acoplamento de sinal (3) para operação do dispositivo hf (5). o sistema hf apresenta um oscilador (7) para a produção de um sinal hf para operação do dispositivo hf (5). o sistema hf se caracteriza por um meio (15) para produção de um sinal de tensão proporcional (uprop) ao grau de ajuste do dispositivo hf (5) com base no sinal hf produzido pelo oscilador (7) e de um sinal hf refletido pelo dispositivo hf, e um dispositivo preferivelmente sem microprocessador (27) para produção de um sinal de regulagem (ua) para ajuste da frequência de saída do oscilador (7) com base no sinal de tensão proporcional (uprop) ao grau de ajuste do dispositivo hf (5). 1/1
BR112014012376A 2011-11-23 2012-11-22 sistema hf, dispositivo de acoplamento de sinal e processo para operação de um dispositivo hf BR112014012376A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011055624A DE102011055624A1 (de) 2011-11-23 2011-11-23 HF-System
PCT/EP2012/073292 WO2013076174A1 (de) 2011-11-23 2012-11-22 Hf-system für eine hochfrequenzlampe

Publications (1)

Publication Number Publication Date
BR112014012376A2 true BR112014012376A2 (pt) 2017-05-30

Family

ID=47326082

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112014012376A BR112014012376A2 (pt) 2011-11-23 2012-11-22 sistema hf, dispositivo de acoplamento de sinal e processo para operação de um dispositivo hf

Country Status (14)

Country Link
US (1) US9155164B2 (pt)
EP (2) EP2783553B1 (pt)
JP (1) JP2014533879A (pt)
KR (1) KR20140096149A (pt)
CN (1) CN103947298A (pt)
BR (1) BR112014012376A2 (pt)
CA (1) CA2854589A1 (pt)
DE (1) DE102011055624A1 (pt)
ES (1) ES2942568T3 (pt)
HK (1) HK1199162A1 (pt)
MX (1) MX2014006111A (pt)
RU (1) RU2014118753A (pt)
TW (1) TW201338631A (pt)
WO (1) WO2013076174A1 (pt)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013103670A1 (de) 2013-04-11 2014-10-30 Dritte Patentportfolio Beteiligungsgesellschaft Mbh & Co.Kg HF-Lampe mit dielektrischem Wellenleiter
DE102013226537B4 (de) 2013-12-18 2022-12-29 TRUMPF Hüttinger GmbH + Co. KG Leistungsversorgungssystem mit mehreren Verstärkerpfaden sowie Verfahren zur Anregung eines Plasmas
DE102013226511B4 (de) 2013-12-18 2016-12-15 TRUMPF Hüttinger GmbH + Co. KG Leistungsversorgungssystem und Verfahren zur Erzeugung einer Leistung
DE102016220349A1 (de) 2016-10-18 2018-04-19 Trumpf Schweiz Ag Hochfrequenztreiberschaltung für eine akustooptische Komponente und Verfahren zum Betrieb einer HF-Treiberschaltung
DE102017206132B3 (de) 2017-04-10 2018-07-12 TRUMPF Hüttinger GmbH + Co. KG Verfahren zur Erzeugung einer Hochfrequenzleistung mit einer vorgegebenen Frequenz und Leistungswandler
DE102017115438A1 (de) 2017-06-06 2018-12-06 Fricke Und Mallah Microwave Technology Gmbh Vorrichtung zum erzeugen eines plasmastrahls im mhz- und ghzbereich mit tem- und hohlleitermoden
EP3747241A1 (de) 2018-02-02 2020-12-09 Ionics SA Atmosphärenplasmajet mit geradem kanülenrohr

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US4044308A (en) * 1976-09-20 1977-08-23 Gte Sylvania Incorporated Communication transmitting apparatus with carrier level control
US4375051A (en) * 1981-02-19 1983-02-22 The Perkin-Elmer Corporation Automatic impedance matching between source and load
US5688357A (en) * 1995-02-15 1997-11-18 Applied Materials, Inc. Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor
US6313587B1 (en) * 1998-01-13 2001-11-06 Fusion Lighting, Inc. High frequency inductive lamp and power oscillator
KR20020026528A (ko) * 1999-07-02 2002-04-10 키플링 켄트 고휘도를 가진 고출력 램프
DE19934473A1 (de) * 1999-07-27 2001-02-01 Thomson Brandt Gmbh Gerät zum Beschreiben optischer Aufzeichnungsträger
JP2001284078A (ja) * 2000-03-30 2001-10-12 Toshiba Lighting & Technology Corp 無電極放電ランプ装置
DE10243271A1 (de) * 2002-09-18 2003-12-04 Bosch Gmbh Robert Vorrichtung zum Zünden eines Luft-Kraftstoff-Gemischs in einem Verbrennungsmotor
US7263344B2 (en) * 2002-10-15 2007-08-28 Sirific Wireless Corporation Method for reducing IM2 noise in a down conversion circuit
US20060252283A1 (en) * 2003-08-07 2006-11-09 Hitachi Kokusai Electric Inc. Substrate processing apparatus and sustrate processing method
JP2006128075A (ja) * 2004-10-01 2006-05-18 Seiko Epson Corp 高周波加熱装置、半導体製造装置および光源装置
JP4799947B2 (ja) * 2005-02-25 2011-10-26 株式会社ダイヘン 高周波電源装置および高周波電源の制御方法
WO2007126899A2 (en) * 2006-03-28 2007-11-08 Topanga Technologies Coaxial waveguide electrodeless lamp
US20100253231A1 (en) * 2006-10-16 2010-10-07 Devincentis Marc Electrodeless plasma lamp systems and methods
DE102007057581A1 (de) * 2007-11-28 2009-06-04 Fachhochschule Aachen Hochfrequenzlampe und Verfahren zu deren Betrieb
JP2009181771A (ja) * 2008-01-30 2009-08-13 Seiko Epson Corp 光源装置、光源装置の発光制御方法、およびプロジェクタ
WO2010080828A1 (en) * 2009-01-06 2010-07-15 Luxim Corporation Low frequency electrodeless plasma lamp
US8723531B2 (en) * 2009-03-12 2014-05-13 Sige Semiconductor, Inc. Integrated VSWR detector for monolithic microwave integrated circuits
US8670730B2 (en) * 2011-08-24 2014-03-11 Spectralux Corporation Power efficient radio frequency transmitter
US8878432B2 (en) * 2012-08-20 2014-11-04 Varian Medical Systems, Inc. On board diagnosis of RF spectra in accelerators

Also Published As

Publication number Publication date
WO2013076174A1 (de) 2013-05-30
TW201338631A (zh) 2013-09-16
EP2783553A1 (de) 2014-10-01
US20150115842A1 (en) 2015-04-30
US9155164B2 (en) 2015-10-06
DE102011055624A1 (de) 2013-05-23
CA2854589A1 (en) 2013-05-30
JP2014533879A (ja) 2014-12-15
EP2783553B1 (de) 2023-01-25
KR20140096149A (ko) 2014-08-04
EP4181628A1 (de) 2023-05-17
ES2942568T3 (es) 2023-06-02
RU2014118753A (ru) 2015-12-27
MX2014006111A (es) 2014-09-01
HK1199162A1 (en) 2015-06-19
CN103947298A (zh) 2014-07-23

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Legal Events

Date Code Title Description
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 7A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2541 DE 17-09-2019 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.