BR112013001053A2 - sensor e método de fabricação do mesmo - Google Patents

sensor e método de fabricação do mesmo

Info

Publication number
BR112013001053A2
BR112013001053A2 BR112013001053A BR112013001053A BR112013001053A2 BR 112013001053 A2 BR112013001053 A2 BR 112013001053A2 BR 112013001053 A BR112013001053 A BR 112013001053A BR 112013001053 A BR112013001053 A BR 112013001053A BR 112013001053 A2 BR112013001053 A2 BR 112013001053A2
Authority
BR
Brazil
Prior art keywords
sensor
support body
support
manufacture
circuit
Prior art date
Application number
BR112013001053A
Other languages
English (en)
Inventor
Massimo Monichino
Original Assignee
Metallux Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metallux Sa filed Critical Metallux Sa
Publication of BR112013001053A2 publication Critical patent/BR112013001053A2/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/14—Housings
    • G01L19/147—Details about the mounting of the sensor to support or covering means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/14—Housings
    • G01L19/148—Details about the circuit board integration, e.g. integrated with the diaphragm surface or encapsulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Measuring Fluid Pressure (AREA)
  • Laminated Bodies (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Abstract

sensor e método de fabricação do mesmo a presente invenção refere-se a um sensor, em particular, um sensor de pressão que compreede: uma estrutura, a qual compreende um corpo de apoio (10); uma disposição de circuito (4), compreendendo os componentes do circuito (3a,3b,3c,3d), entre os quais meios de detecção (3c) para a geração de sinais elétricos representando a quantidade a ser detectada, e pelo menos um suporte de circuito (4a), o qual está conectado ao corpo de suporte (10) e tem uma superfície sobre a qual é formada uma pluralidade dos ditos componentes do circuito (3a,3b,3c,3d), dentre os quais trilhas eletricamente condutoras (3a,3b), onde o suporte de circuito (4a) é laminado sobre a primeira face (10a), do corpo de apoio (10).
BR112013001053A 2010-07-15 2011-07-14 sensor e método de fabricação do mesmo BR112013001053A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ITTO2010A000616A IT1401220B1 (it) 2010-07-15 2010-07-15 Sensore e metodo di fabbricazione.
PCT/IB2011/053154 WO2012007922A1 (en) 2010-07-15 2011-07-14 Sensor and method of manufacture thereof

Publications (1)

Publication Number Publication Date
BR112013001053A2 true BR112013001053A2 (pt) 2016-05-24

Family

ID=43530809

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112013001053A BR112013001053A2 (pt) 2010-07-15 2011-07-14 sensor e método de fabricação do mesmo

Country Status (7)

Country Link
US (1) US8815625B2 (pt)
EP (1) EP2593764A1 (pt)
CN (1) CN103229033A (pt)
BR (1) BR112013001053A2 (pt)
IT (1) IT1401220B1 (pt)
RU (1) RU2556751C2 (pt)
WO (1) WO2012007922A1 (pt)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20120456A1 (it) * 2012-03-23 2013-09-24 Microtel Tecnologie Elettroniche S P A Sensore di pressione ceramico e relativo metodo di produzione, e trasduttore che incorpora un sensore di pressione ceramico
US10415964B2 (en) * 2014-05-30 2019-09-17 General Electric Company Methods for producing passive strain indicator on turbine components
US9546928B2 (en) * 2014-05-30 2017-01-17 General Electric Company Methods for producing strain sensors on turbine components
US9410868B2 (en) * 2014-05-30 2016-08-09 General Electric Company Methods for producing strain sensors on turbine components
EP3012596A1 (de) 2014-10-21 2016-04-27 wenglor fluid GmbH Messeinrichtung zur Bestimmung der Fließgeschwindigkeit eines Mediums in einem Rohr
CN107529767A (zh) 2014-12-19 2018-01-02 先进科技研究公司 用于制备全麦和全无麸质谷物面粉的节水和节能方法
US9583406B2 (en) * 2015-03-17 2017-02-28 Infineon Technologies Austria Ag System and method for dual-region singulation
ITUB20150460A1 (it) * 2015-04-16 2016-10-16 Metallux Sa Sensore per la rilevazione di una o piu' grandezze di un fluido, particolarmente un sensore di pressione
TW201641461A (zh) * 2015-04-28 2016-12-01 賀利氏貴金屬北美康舍霍肯有限責任公司 介電物帶組合物
FR3041430B1 (fr) * 2015-09-17 2017-11-24 Sagem Defense Securite Dispositif de mesure et systeme de mesure d'une pression comprenant un tel capteur
FR3041431B1 (fr) * 2015-09-17 2019-04-05 Safran Electronics & Defense Capteur de pression, dispositif de mesure et systeme de mesure d'une pression comprenant un tel capteur
CN109490033B (zh) * 2018-11-12 2020-11-03 中国石油大学(北京) 一种用于去除岩样中无机碳的预处理装置
US11385118B2 (en) 2018-12-07 2022-07-12 Vitesco Technologies USA, LLC Pressure sensor with external vertical electrical interconnection system
EP3671160A1 (de) * 2018-12-21 2020-06-24 Exentis Knowledge GmbH Formkörper sowie verfahren zur herstellung eines formkörpers
RU197682U1 (ru) * 2019-12-27 2020-05-21 Федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский Томский государственный университет" (ТГУ, НИ ТГУ) Полупроводниковый датчик давления
CN111665165B (zh) * 2020-05-26 2021-09-24 中国地质大学（武汉） 一种基于感应电荷的天然气水合物密度传感器

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5142915A (en) * 1990-07-06 1992-09-01 Siemens Automotive L.P. Method for fabrication of force sensing elements by laminating dielectric tape
US5285690A (en) 1992-01-24 1994-02-15 The Foxboro Company Pressure sensor having a laminated substrate
US5634999A (en) 1994-09-06 1997-06-03 Ngk Insulators, Ltd. Method of producing ceramic diaphragm structure having convex diaphragm portion
US7600433B2 (en) * 2007-02-23 2009-10-13 Silicon Micro Sensors Gmbh Pressure sensor with roughened and treated surface for improving adhesive strength and method of manufacturing the sensor
US7513164B1 (en) * 2007-12-18 2009-04-07 Honeywell International Inc. Single diaphragm ATF differential pressure transducer

Also Published As

Publication number Publication date
ITTO20100616A1 (it) 2012-01-16
EP2593764A1 (en) 2013-05-22
RU2013101589A (ru) 2014-08-20
US20130168785A1 (en) 2013-07-04
CN103229033A (zh) 2013-07-31
US8815625B2 (en) 2014-08-26
WO2012007922A1 (en) 2012-01-19
RU2556751C2 (ru) 2015-07-20
IT1401220B1 (it) 2013-07-12

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 5A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2384 DE 13-09-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.