BR0214324A - Formas diméricas e multiméricas de acilfosfinas, óxidos de acilfosfina e sulfetos de acilfosfina - Google Patents
Formas diméricas e multiméricas de acilfosfinas, óxidos de acilfosfina e sulfetos de acilfosfinaInfo
- Publication number
- BR0214324A BR0214324A BR0214324-0A BR0214324A BR0214324A BR 0214324 A BR0214324 A BR 0214324A BR 0214324 A BR0214324 A BR 0214324A BR 0214324 A BR0214324 A BR 0214324A
- Authority
- BR
- Brazil
- Prior art keywords
- substituted
- acylphosphine
- unsubstituted
- interrupted
- dimeric
- Prior art date
Links
- 150000003568 thioethers Chemical class 0.000 title 1
- 229910052717 sulfur Inorganic materials 0.000 abstract 5
- 229910052760 oxygen Inorganic materials 0.000 abstract 4
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 abstract 2
- 125000002373 5 membered heterocyclic group Chemical group 0.000 abstract 1
- 125000004070 6 membered heterocyclic group Chemical group 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- -1 anthracyl Chemical group 0.000 abstract 1
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000004350 aryl cycloalkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000004305 biphenyl Chemical group 0.000 abstract 1
- 235000010290 biphenyl Nutrition 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 125000000392 cycloalkenyl group Chemical group 0.000 abstract 1
- 125000000753 cycloalkyl group Chemical group 0.000 abstract 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 abstract 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 125000005647 linker group Chemical group 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
- C07F9/576—Six-membered rings
- C07F9/58—Pyridine rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Cosmetics (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP01811113 | 2001-11-20 | ||
| PCT/EP2002/012680 WO2003044030A1 (en) | 2001-11-20 | 2002-11-13 | Multimer forms of acylphosphines and their derivatives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR0214324A true BR0214324A (pt) | 2004-11-03 |
Family
ID=8184252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR0214324-0A BR0214324A (pt) | 2001-11-20 | 2002-11-13 | Formas diméricas e multiméricas de acilfosfinas, óxidos de acilfosfina e sulfetos de acilfosfina |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7109250B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1446410A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP2005509685A (cg-RX-API-DMAC7.html) |
| KR (1) | KR20050044549A (cg-RX-API-DMAC7.html) |
| CN (1) | CN1589276A (cg-RX-API-DMAC7.html) |
| AU (1) | AU2002366198A1 (cg-RX-API-DMAC7.html) |
| BR (1) | BR0214324A (cg-RX-API-DMAC7.html) |
| CA (1) | CA2467576A1 (cg-RX-API-DMAC7.html) |
| MX (1) | MXPA04004729A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2003044030A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1324037C (zh) * | 2002-06-11 | 2007-07-04 | 西巴特殊化学品控股有限公司 | 单酰基和二酰基氧化膦的多聚体形式 |
| JP4676434B2 (ja) * | 2003-08-29 | 2011-04-27 | チバ ホールディング インコーポレーテッド | 光ファイバコーティング |
| ATE496928T1 (de) * | 2004-11-23 | 2011-02-15 | Basf Se | Bisacylphosphane und ihre verwendung als photoinitiatoren, verfahren zur herstellung von acylphosphanen |
| US7547735B1 (en) * | 2006-12-04 | 2009-06-16 | Henkel Corporation | UV curable compositions |
| BR112015007295B1 (pt) | 2012-10-01 | 2021-12-14 | Eth Zurich | Processo para a preparação de compostos; compostos; e uso dos mesmos |
| EP3149013B1 (en) * | 2014-05-30 | 2018-10-24 | IGM Resins Italia S.r.l. | Multifunctional acylphosphine oxide photoinitiators |
| CN105334697B (zh) * | 2015-12-08 | 2019-10-11 | 深圳市华星光电技术有限公司 | 光刻胶组合物及彩色滤光片的制作方法 |
| EP3386462B1 (en) * | 2015-12-08 | 2024-10-23 | Solventum Intellectual Properties Company | Two-component self-adhesive dental composition, storage stable initiator system, and use thereof |
| EP3409680B1 (en) * | 2017-05-30 | 2021-01-06 | IGM Group B.V. | Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4265723A (en) * | 1979-07-06 | 1981-05-05 | Basf Aktiengesellschaft | Photocurable molding, impregnating and coating compositions |
| DE3034697A1 (de) * | 1980-09-15 | 1982-05-06 | Basf Ag, 6700 Ludwigshafen | Acylphosphinsulfidverbindungen, ihre herstellung und verwendung |
| ES2098260T3 (es) | 1989-08-04 | 1997-05-01 | Ciba Geigy Ag | Oxidos de mono- y diacilfosfina. |
| US5218009A (en) * | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| TW303379B (cg-RX-API-DMAC7.html) * | 1994-03-02 | 1997-04-21 | Ciba Sc Holding Ag | |
| DE19618720A1 (de) * | 1995-05-12 | 1996-11-14 | Ciba Geigy Ag | Bisacyl-bisphosphine, -oxide und -sulfide |
| US6075065A (en) * | 1996-12-20 | 2000-06-13 | Takeda Chemical Industries, Ltd. | Photocurable resin composition and a method for producing the same |
| BR9808960B1 (pt) * | 1997-04-22 | 2008-11-18 | composiÇço de revestimento de fibra àtica curÁvel por radiaÇço, composiÇço de revestimento lÍquida, de revestimento primÁrio interno e externo, material de matriz ou de acondicionamento, fribra àtica de vidro e dispositivo de transmissço de luz. | |
| JP2001200007A (ja) * | 2000-01-19 | 2001-07-24 | Shin Etsu Chem Co Ltd | 光硬化性樹脂組成物及び光ファイバー用被覆材 |
| GB2360283B (en) * | 2000-02-08 | 2002-08-21 | Ciba Sc Holding Ag | Monoacylarylphosphines and acylphosphine oxides and sulphides |
| GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| CA2456229A1 (en) * | 2001-08-03 | 2003-02-13 | Diversa Corporation | Epoxide hydrolases, nucleic acids encoding them and methods for making and using them |
-
2002
- 2002-11-13 CA CA002467576A patent/CA2467576A1/en not_active Abandoned
- 2002-11-13 US US10/495,958 patent/US7109250B2/en not_active Expired - Fee Related
- 2002-11-13 KR KR1020047007699A patent/KR20050044549A/ko not_active Withdrawn
- 2002-11-13 MX MXPA04004729A patent/MXPA04004729A/es unknown
- 2002-11-13 AU AU2002366198A patent/AU2002366198A1/en not_active Abandoned
- 2002-11-13 WO PCT/EP2002/012680 patent/WO2003044030A1/en not_active Ceased
- 2002-11-13 CN CNA028229142A patent/CN1589276A/zh active Pending
- 2002-11-13 BR BR0214324-0A patent/BR0214324A/pt not_active Application Discontinuation
- 2002-11-13 JP JP2003545667A patent/JP2005509685A/ja active Pending
- 2002-11-13 EP EP02790367A patent/EP1446410A1/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| MXPA04004729A (es) | 2004-07-30 |
| JP2005509685A (ja) | 2005-04-14 |
| WO2003044030A1 (en) | 2003-05-30 |
| KR20050044549A (ko) | 2005-05-12 |
| CA2467576A1 (en) | 2003-05-30 |
| AU2002366198A1 (en) | 2003-06-10 |
| US20050004247A1 (en) | 2005-01-06 |
| US7109250B2 (en) | 2006-09-19 |
| EP1446410A1 (en) | 2004-08-18 |
| CN1589276A (zh) | 2005-03-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
| B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |