BR0200848A - Condutores blindados microfabricados - Google Patents
Condutores blindados microfabricadosInfo
- Publication number
- BR0200848A BR0200848A BR0200848-3A BR0200848A BR0200848A BR 0200848 A BR0200848 A BR 0200848A BR 0200848 A BR0200848 A BR 0200848A BR 0200848 A BR0200848 A BR 0200848A
- Authority
- BR
- Brazil
- Prior art keywords
- microfabricated
- microstructure
- shielded conductors
- mems
- conductors
- Prior art date
Links
- 239000004020 conductor Substances 0.000 title abstract 2
- 230000008054 signal transmission Effects 0.000 abstract 2
- 239000012530 fluid Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/0006—Interconnects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14403—Structure thereof only for on-demand ink jet heads including a filter
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Abstract
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/812,498 US6465856B2 (en) | 2001-03-19 | 2001-03-19 | Micro-fabricated shielded conductors |
Publications (2)
Publication Number | Publication Date |
---|---|
BR0200848A true BR0200848A (pt) | 2003-03-25 |
BR0200848B1 BR0200848B1 (pt) | 2014-08-05 |
Family
ID=25209756
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0200848-3A BR0200848B1 (pt) | 2001-03-19 | 2002-03-18 | Microestrutura de um sistema eletromecânico microfabricado |
Country Status (7)
Country | Link |
---|---|
US (1) | US6465856B2 (pt) |
EP (1) | EP1243550B1 (pt) |
JP (1) | JP2002307697A (pt) |
BR (1) | BR0200848B1 (pt) |
CA (1) | CA2375712C (pt) |
DE (1) | DE60212229T2 (pt) |
MX (1) | MXPA02002849A (pt) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040213511A1 (en) * | 2002-03-19 | 2004-10-28 | Scholz Christopher J. | Erbium doped waveguide amplifier (EDWA) with pump reflector |
US6952042B2 (en) * | 2002-06-17 | 2005-10-04 | Honeywell International, Inc. | Microelectromechanical device with integrated conductive shield |
US7781850B2 (en) | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
US7002215B1 (en) * | 2002-09-30 | 2006-02-21 | Pts Corporation | Floating entrance guard for preventing electrical short circuits |
DE10304835A1 (de) * | 2003-02-06 | 2004-08-05 | Robert Bosch Gmbh | Mikroelektromechanisches Bauelement |
US8367215B2 (en) * | 2003-10-31 | 2013-02-05 | Epcos Ag | Radio-frequency microelectromechanical systems and method of manufacturing such systems |
KR101140688B1 (ko) * | 2003-10-31 | 2012-05-03 | 에프코스 아게 | 전자 장치 및 그 제조 방법 |
US7369296B2 (en) | 2004-09-27 | 2008-05-06 | Idc, Llc | Device and method for modifying actuation voltage thresholds of a deformable membrane in an interferometric modulator |
US7373026B2 (en) | 2004-09-27 | 2008-05-13 | Idc, Llc | MEMS device fabricated on a pre-patterned substrate |
EP2495212A3 (en) | 2005-07-22 | 2012-10-31 | QUALCOMM MEMS Technologies, Inc. | Mems devices having support structures and methods of fabricating the same |
EP1928780A2 (en) * | 2005-09-30 | 2008-06-11 | Qualcomm Mems Technologies, Inc. | Mems device and interconnects for same |
US7652814B2 (en) | 2006-01-27 | 2010-01-26 | Qualcomm Mems Technologies, Inc. | MEMS device with integrated optical element |
US7643203B2 (en) | 2006-04-10 | 2010-01-05 | Qualcomm Mems Technologies, Inc. | Interferometric optical display system with broadband characteristics |
US7369292B2 (en) | 2006-05-03 | 2008-05-06 | Qualcomm Mems Technologies, Inc. | Electrode and interconnect materials for MEMS devices |
US7706042B2 (en) | 2006-12-20 | 2010-04-27 | Qualcomm Mems Technologies, Inc. | MEMS device and interconnects for same |
US7733552B2 (en) | 2007-03-21 | 2010-06-08 | Qualcomm Mems Technologies, Inc | MEMS cavity-coating layers and methods |
US7719752B2 (en) | 2007-05-11 | 2010-05-18 | Qualcomm Mems Technologies, Inc. | MEMS structures, methods of fabricating MEMS components on separate substrates and assembly of same |
US20090033516A1 (en) * | 2007-08-02 | 2009-02-05 | Schlumberger Technology Corporation | Instrumented wellbore tools and methods |
US8566759B2 (en) * | 2007-08-24 | 2013-10-22 | International Business Machines Corporation | Structure for on chip shielding structure for integrated circuits or devices on a substrate |
US8589832B2 (en) * | 2007-08-24 | 2013-11-19 | International Business Machines Corporation | On chip shielding structure for integrated circuits or devices on a substrate and method of shielding |
US20090088618A1 (en) | 2007-10-01 | 2009-04-02 | Arneson Michael R | System and Method for Manufacturing a Swallowable Sensor Device |
US8349635B1 (en) * | 2008-05-20 | 2013-01-08 | Silicon Laboratories Inc. | Encapsulated MEMS device and method to form the same |
JP5715734B2 (ja) | 2011-10-24 | 2015-05-13 | ヒューレット−パッカード デベロップメント カンパニー エル.ピー.Hewlett‐Packard Development Company, L.P. | インクジェットプリントヘッド装置、流体噴射装置、及びその方法 |
AU2011380023B2 (en) * | 2011-10-24 | 2015-03-26 | Hewlett-Packard Development Company, L.P. | Fluid ejection devices and methods thereof |
US9323041B2 (en) | 2011-11-30 | 2016-04-26 | Pixtronix, Inc. | Electromechanical systems display apparatus incorporating charge dissipation surfaces |
US9018715B2 (en) | 2012-11-30 | 2015-04-28 | Silicon Laboratories Inc. | Gas-diffusion barriers for MEMS encapsulation |
US11646576B2 (en) | 2021-09-08 | 2023-05-09 | Analog Devices International Unlimited Company | Electrical overstress protection of microelectromechanical systems |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5467068A (en) * | 1994-07-07 | 1995-11-14 | Hewlett-Packard Company | Micromachined bi-material signal switch |
US6012336A (en) * | 1995-09-06 | 2000-01-11 | Sandia Corporation | Capacitance pressure sensor |
US6758552B1 (en) * | 1995-12-06 | 2004-07-06 | Hewlett-Packard Development Company | Integrated thin-film drive head for thermal ink-jet printer |
US6174820B1 (en) * | 1999-02-16 | 2001-01-16 | Sandia Corporation | Use of silicon oxynitride as a sacrificial material for microelectromechanical devices |
-
2001
- 2001-03-19 US US09/812,498 patent/US6465856B2/en not_active Expired - Lifetime
-
2002
- 2002-03-11 CA CA002375712A patent/CA2375712C/en not_active Expired - Fee Related
- 2002-03-14 JP JP2002069401A patent/JP2002307697A/ja active Pending
- 2002-03-14 MX MXPA02002849A patent/MXPA02002849A/es active IP Right Grant
- 2002-03-18 BR BRPI0200848-3A patent/BR0200848B1/pt not_active IP Right Cessation
- 2002-03-19 EP EP02006203A patent/EP1243550B1/en not_active Expired - Lifetime
- 2002-03-19 DE DE60212229T patent/DE60212229T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2375712C (en) | 2005-01-25 |
EP1243550A2 (en) | 2002-09-25 |
DE60212229T2 (de) | 2006-10-05 |
JP2002307697A (ja) | 2002-10-23 |
CA2375712A1 (en) | 2002-09-19 |
BR0200848B1 (pt) | 2014-08-05 |
DE60212229D1 (de) | 2006-07-27 |
EP1243550B1 (en) | 2006-06-14 |
US6465856B2 (en) | 2002-10-15 |
MXPA02002849A (es) | 2005-07-25 |
EP1243550A3 (en) | 2004-06-16 |
US20020130916A1 (en) | 2002-09-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B15K | Others concerning applications: alteration of classification |
Free format text: ALTERADA A CLASSIFICACAO DE H01R 43/00 PARA B87B 7/04 E B81C 1/00 Ipc: B81B 7/04 (2006.01), B81C 1/00 (2006.01) |
|
B06A | Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette] | ||
B06A | Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette] | ||
B06A | Notification to applicant to reply to the report for non-patentability or inadequacy of the application [chapter 6.1 patent gazette] | ||
B09A | Decision: intention to grant [chapter 9.1 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted |
Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 05/08/2014, OBSERVADAS AS CONDICOES LEGAIS. |
|
B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time |
Free format text: REFERENTE A 14A ANUIDADE. |
|
B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |
Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2371 DE 14-06-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |