BR0104528A - Sistema de revestimento a vapor incluindo revestir recipiente com controle de atividade de vapor de revestimento - Google Patents

Sistema de revestimento a vapor incluindo revestir recipiente com controle de atividade de vapor de revestimento

Info

Publication number
BR0104528A
BR0104528A BR0104528-8A BR0104528A BR0104528A BR 0104528 A BR0104528 A BR 0104528A BR 0104528 A BR0104528 A BR 0104528A BR 0104528 A BR0104528 A BR 0104528A
Authority
BR
Brazil
Prior art keywords
coating
steam
inlet
system including
container
Prior art date
Application number
BR0104528-8A
Other languages
English (en)
Inventor
Richard Roy Worthing
Nripendra Nath Das
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of BR0104528A publication Critical patent/BR0104528A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
    • C23C10/08—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases only one element being diffused
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/06—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases
    • C23C10/08—Solid state diffusion of only metal elements or silicon into metallic material surfaces using gases only one element being diffused
    • C23C10/10—Chromising
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Patente de Invenção: "SISTEMA DE REVESTIMENTO A VAPOR INCLUINDO REVESTIR RECIPIENTE COM CONTROLE DE ATIVIDADE DE VAPOR DE REVESTIMENTO". Um sistema de revestimento a vapor (20) é operável para revestir uma peça de trabalho posicionada no mesmo. O sistema de revestimento a vapor (20) inclui um recipiente de revestimento a vapor (22) com uma parede de revestimento (28). A parede de recipiente (28) possui pelo menos um orifício de entrada (34) através da mesma, com todos os orifícios de entrada (34) possuindo uma área de orifício de entrada total, e pelo menos um orifício de saída (36) através da mesma, com todos os orifícios de saída (36) possuindo uma área de orifício de saída total que é menor que a área de orifício de entrada total. O sistema (20) ainda inclui uma fonte de um gás de varredura (38) em comunicação com pelo menos um orifício de entrada (34), e uma fonte de um vapor de revestimento (44) disposta para fornecer um vapor de revestimento dentro do recipiente de revestimento a vapor (22).
BR0104528-8A 2000-10-13 2001-10-15 Sistema de revestimento a vapor incluindo revestir recipiente com controle de atividade de vapor de revestimento BR0104528A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68742300A 2000-10-13 2000-10-13

Publications (1)

Publication Number Publication Date
BR0104528A true BR0104528A (pt) 2002-05-21

Family

ID=24760397

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0104528-8A BR0104528A (pt) 2000-10-13 2001-10-15 Sistema de revestimento a vapor incluindo revestir recipiente com controle de atividade de vapor de revestimento

Country Status (4)

Country Link
EP (1) EP1197583A1 (pt)
JP (1) JP2002235174A (pt)
BR (1) BR0104528A (pt)
SG (1) SG97203A1 (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070026205A1 (en) 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating
FR2900416B1 (fr) * 2006-04-28 2008-10-24 Snecma Sa Dispositif et procede de traitement thermochimique de diffusion de chrome dans un substrat
DE102008053540A1 (de) * 2008-10-28 2010-04-29 Mtu Aero Engines Gmbh Hochtemperaturkorrosionsschutzschicht und Verfahren zur Herstellung
JP2013159814A (ja) * 2012-02-03 2013-08-19 Nisshin Kasei Kk 金属構造体、錠剤を打錠する杵又は臼、錠剤、及び金属構造体の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10242123A (ja) * 1997-02-25 1998-09-11 Kokusai Electric Co Ltd 減圧処理装置
JP3749776B2 (ja) * 1997-02-28 2006-03-01 株式会社東芝 半導体装置
US6120605A (en) * 1998-02-05 2000-09-19 Asm Japan K.K. Semiconductor processing system
US6039810A (en) * 1998-11-13 2000-03-21 General Electric Company High temperature vapor coating container

Also Published As

Publication number Publication date
EP1197583A1 (en) 2002-04-17
JP2002235174A (ja) 2002-08-23
SG97203A1 (en) 2003-07-18

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Legal Events

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B07A Technical examination (opinion): publication of technical examination (opinion)
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B09B Decision: refusal

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