BR0102475A - Fine material injection system by the electrode hollow in electric furnaces to reduce the production of metallic silicon and ferro-silicon - Google Patents
Fine material injection system by the electrode hollow in electric furnaces to reduce the production of metallic silicon and ferro-siliconInfo
- Publication number
- BR0102475A BR0102475A BR0102475A BR0102475A BR0102475A BR 0102475 A BR0102475 A BR 0102475A BR 0102475 A BR0102475 A BR 0102475A BR 0102475 A BR0102475 A BR 0102475A BR 0102475 A BR0102475 A BR 0102475A
- Authority
- BR
- Brazil
- Prior art keywords
- silicon
- electrode
- hollow
- electrode hollow
- ferro
- Prior art date
Links
Landscapes
- Silicon Compounds (AREA)
Abstract
"SISTEMA DE INJEçãO DE MATERIAIS FINOS PELO OCO DO ELETRODO EM FORNOS ELéTRICOS DE REDUçãO NA PRODUçãO DE SILìCIO METáLICO E FERRO-SILìCIO". Descreve-se um sistema para aproveitamento dos finos de silício metálico e ferro-silício através da refusão dentro do próprio forno de redução com elevado rendimento em relação aos processos de refusão convencionais. O gás utilizado no processo entra por um engate (27) sendo a sua pressão regulada por uma válvula reguladora de pressão (21) para efetuar a pressurização de um dispositivo de vedação (17) despressurizado, logo após a desobstrução do oco do eletrodo (9) pela retirada do dispositivo de medição de eletrodos. Em seguida, o dispositivo de vedação (17) é pressurizado, bloqueando totalmente o oco do eletrodo (9). O dispositivo de vedação (17) é constituído por um cilindro de borracha (30) com diâmetro externo ligeiramente inferior ao diâmetro interno do oco do eletrodo (9) para permitir a fácil inserção no oco do eletrodo (9) enquanto despressurizado."ELECTRICAL HOLLOW INJECTION SYSTEM IN ELECTRIC OVEN REDUCTION IN METAL SILICON AND IRON SILICON PRODUCTION". A system for the utilization of metal silicon fines and ferro silicon fines is described by reflow within the reduction furnace itself with high yield over conventional reflow processes. The gas used in the process enters a coupling (27) and its pressure is regulated by a pressure regulating valve (21) to pressurize a depressurized sealing device (17) immediately after clearing the electrode hollow (9 ) by removing the electrode measuring device. Then the sealing device (17) is pressurized, completely blocking the electrode hollow (9). The sealing device (17) consists of a rubber cylinder (30) with an outside diameter slightly smaller than the inside diameter of the electrode hollow (9) to allow easy insertion into the electrode hollow (9) while depressurized.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BR0102475A BR0102475B1 (en) | 2001-06-20 | 2001-06-20 | fine material injection system and process. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BR0102475A BR0102475B1 (en) | 2001-06-20 | 2001-06-20 | fine material injection system and process. |
Publications (2)
Publication Number | Publication Date |
---|---|
BR0102475A true BR0102475A (en) | 2003-04-08 |
BR0102475B1 BR0102475B1 (en) | 2009-01-13 |
Family
ID=3947478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0102475A BR0102475B1 (en) | 2001-06-20 | 2001-06-20 | fine material injection system and process. |
Country Status (1)
Country | Link |
---|---|
BR (1) | BR0102475B1 (en) |
-
2001
- 2001-06-20 BR BR0102475A patent/BR0102475B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
BR0102475B1 (en) | 2009-01-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06A | Notification to applicant to reply to the report for non-patentability or inadequacy of the application according art. 36 industrial patent law | ||
B15K | Others concerning applications: alteration of classification |
Free format text: ALTERACAO DE CLASSIFICACAO DA INT. CL. 7: C22B 5/00 Ipc: F27B 3/08 (2007.01), C22B 5/00 (2007.01) |
|
B09A | Decision: intention to grant | ||
B16A | Patent or certificate of addition of invention granted |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 20/06/2001, OBSERVADAS AS CONDICOES LEGAIS. |
|
B21F | Lapse acc. art. 78, item iv - on non-payment of the annual fees in time | ||
B24J | Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12) |