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Application filed by Nedko T Todorov, Georgi P BlazhevfiledCriticalNedko T Todorov
Priority to BG8776089ApriorityCriticalpatent/BG50691A1/en
Publication of BG50691A1publicationCriticalpatent/BG50691A1/en
This method and device are used in electronics. It enhances the degree of repetition of the sensor's characteristics and the output in its production. The method consists of the formation and baking of enamelling coverage from a solid electrolyte, layers of glass mass and porous ceramics in a neutral gaseous medium, by radiation with heat and light radiation from a source (1.1, 1.2, 1.3) with an internal temperature higher than 3,000 degrees C. After this, a check-up of the prepared sensor is carried out. The device contains a chamber (4), in which the blank (2) is placed, sources of heat and light radiation (1.1, 1.2, 1.3), focused onto it, an observation device (3) and a refined positioning (5) of the blank (2), a manageable gas-supply node (6) and a computer bloc (7) for tracking and management of the technological regime (a baking temperature and a composition of the gaseous medium). The device is used both for the production of the sensor, and for its consequent check-up.
BG8776089A1989-03-221989-03-22Method and device for manufacturing of oxigen sensor
BG50691A1
(en)