BE894686A - Composition photopolymerisable pour la confection de pochoirs d'impression au cadre - Google Patents

Composition photopolymerisable pour la confection de pochoirs d'impression au cadre

Info

Publication number
BE894686A
BE894686A BE0/209229A BE209229A BE894686A BE 894686 A BE894686 A BE 894686A BE 0/209229 A BE0/209229 A BE 0/209229A BE 209229 A BE209229 A BE 209229A BE 894686 A BE894686 A BE 894686A
Authority
BE
Belgium
Prior art keywords
manufacture
photopolymerizable composition
frame printing
printing stencils
stencils
Prior art date
Application number
BE0/209229A
Other languages
English (en)
Original Assignee
Sericol Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sericol Group Ltd filed Critical Sericol Group Ltd
Publication of BE894686A publication Critical patent/BE894686A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
BE0/209229A 1981-11-03 1982-10-12 Composition photopolymerisable pour la confection de pochoirs d'impression au cadre BE894686A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08133096A GB2109392B (en) 1981-11-03 1981-11-03 Photopolymerisable materials for use in producing screen printing stencils

Publications (1)

Publication Number Publication Date
BE894686A true BE894686A (fr) 1983-01-31

Family

ID=10525595

Family Applications (1)

Application Number Title Priority Date Filing Date
BE0/209229A BE894686A (fr) 1981-11-03 1982-10-12 Composition photopolymerisable pour la confection de pochoirs d'impression au cadre

Country Status (9)

Country Link
US (1) US4499175A (fr)
BE (1) BE894686A (fr)
CA (1) CA1200037A (fr)
CH (1) CH655506B (fr)
DE (1) DE3236068A1 (fr)
FR (1) FR2515835B1 (fr)
GB (1) GB2109392B (fr)
IT (1) IT1163009B (fr)
NL (1) NL8203802A (fr)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124212A (en) * 1983-10-26 1992-06-23 Dow Corning Corporation Articles prepared from fast ultraviolet radiation curing silicone composition
US5169879A (en) * 1983-10-26 1992-12-08 Dow Corning Corporation Fast ultraviolet radiation curing silicone composition
US4946874A (en) * 1983-10-26 1990-08-07 Dow Corning Corporation Fast ultraviolet radiation curing silicone composition containing two vinyl polymers
US5162389A (en) * 1983-10-26 1992-11-10 Dow Corning Corporation Fast ultraviolet radiation curing silicone composition having a high refractive index
US4780486A (en) * 1983-10-26 1988-10-25 Dow Corning Corporation Fast ultraviolet radiation curing silicone composition
US4822720A (en) * 1985-08-02 1989-04-18 Hoechst Celanese Corporation Water developable screen printing composition
US4764395A (en) * 1985-11-06 1988-08-16 Ciba-Geigy Corporation Process for finishing a textile fabric with a radiation crosslinkable compound
GB2202858A (en) * 1987-03-26 1988-10-05 Sericol Group Ltd Photopolymerisable compositions for producing screen printing stencils
US5264318A (en) * 1987-06-15 1993-11-23 Sanyo-Kokusaku Pulp Co., Ltd. Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin
JPH0693118B2 (ja) * 1987-06-15 1994-11-16 日本製紙株式会社 感光性シート
GB8716378D0 (en) * 1987-07-11 1987-08-19 Autotype Int Ltd Photopolymerisable compositions
US5128387A (en) * 1987-07-28 1992-07-07 Borden, Inc. Extensible and pasteurizable radiation curable coating for metal
US5128391A (en) * 1988-02-24 1992-07-07 Borden, Inc. Extensible and pasteurizable radiation curable coating for metal containing organofunctional silane adhesion promoter
US5015557A (en) * 1989-09-14 1991-05-14 Mais Ralph G Silk screen process
GB2263699B (en) * 1992-02-03 1995-11-29 Sericol Ltd Photopolymerizable alcohols and compositions containing them
US5359928A (en) * 1992-03-12 1994-11-01 Amtx, Inc. Method for preparing and using a screen printing stencil having raised edges
IL111014A (en) * 1994-09-21 1999-05-09 Scitex Corp Ltd Ink compositions and a method for making same
WO1999018134A1 (fr) * 1997-10-08 1999-04-15 Angus Chemical Company Revetements durcis aux uv contenant des amino-alcools tertiaires
US6092464A (en) * 1998-03-19 2000-07-25 M J Grant Company Three-dimensional raised image screen printing
FR2816545B1 (fr) * 2000-11-16 2003-08-15 Grosfillex Sarl Procede et installation d'impression par serigraphie, encre d'impression
US20040192876A1 (en) * 2002-11-18 2004-09-30 Nigel Hacker Novolac polymer planarization films with high temparature stability
KR101020164B1 (ko) * 2003-07-17 2011-03-08 허니웰 인터내셔날 인코포레이티드 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법
JP5595413B2 (ja) * 2008-12-12 2014-09-24 ビーエーエスエフ ソシエタス・ヨーロピア 変性ポリビニルラクタム
US20110218295A1 (en) * 2010-03-02 2011-09-08 Basf Se Anionic associative rheology modifiers

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3136638A (en) * 1959-06-26 1964-06-09 Gen Aniline & Film Corp Photosensitive stencil and process of making the same
US3448089A (en) * 1966-03-14 1969-06-03 Du Pont Photopolymerizable polymers containing free acid or acid anhydride groups reacted with glycidyl acrylate or glycidyl methacrylate
US3510303A (en) * 1966-12-29 1970-05-05 Corning Glass Works Thin emulsion deposition stencil screen and method
GB1307995A (en) * 1970-03-06 1973-02-21 Norprint Ltd Photopolymerisation
JPS503041B1 (fr) * 1970-03-27 1975-01-31
US3718473A (en) * 1971-01-27 1973-02-27 Du Pont Photopolymerizable elements containing hydro philic colloids and polymerizable monomers for making gravure printing plate resists
US3787213A (en) * 1972-01-19 1974-01-22 J Gervay Process for modifying surfaces using photopolymerizable elements comprising hydrophilic colloids and polymerizable monomers
BE795477A (fr) * 1972-02-16 1973-05-29 Quadrimetal Offset Le Compositions photopolymerisables ameliorees
US3961961A (en) * 1972-11-20 1976-06-08 Minnesota Mining And Manufacturing Company Positive or negative developable photosensitive composition
AU476446B2 (en) * 1974-04-18 1976-09-23 Japan Synthetic Rubber Co., Ltd Photosensitive composition
JPS5917414B2 (ja) * 1975-10-07 1984-04-21 村上スクリ−ン （株） スクリ−ン版用感光性組成物及び感光膜
JPS5290304A (en) * 1976-01-24 1977-07-29 Asahi Chemical Ind Photoosensitive resin composition for making flexo graphic printing plate
DE2853921A1 (de) * 1978-12-14 1980-07-03 Basf Ag Strahlungshaertbare waessrige bindemitteldispersionen
US4262084A (en) * 1979-07-02 1981-04-14 Imaging Sciences Process for preparing a screen stencil
JPS568146A (en) * 1979-07-03 1981-01-27 Kansai Paint Co Ltd Manufacture of screen plate material
US4252888A (en) * 1980-02-26 1981-02-24 Minnesota Mining And Manufacturing Company Solder mask composition
JPS56120718A (en) * 1980-02-28 1981-09-22 Asahi Chem Ind Co Ltd Improved polyurethane type photosensitive resin composition
US4360541A (en) * 1981-02-23 1982-11-23 Celanese Corporation Radiation cured microvoid coatings
US4418138A (en) * 1981-11-03 1983-11-29 Sericol Group Limited Photopolymerizable materials for use in producing stencils for screen printing

Also Published As

Publication number Publication date
US4499175A (en) 1985-02-12
FR2515835A1 (fr) 1983-05-06
DE3236068C2 (fr) 1993-01-28
FR2515835B1 (fr) 1986-02-07
CA1200037A (fr) 1986-01-28
IT8223544A0 (it) 1982-09-30
CH655506B (fr) 1986-04-30
NL8203802A (nl) 1983-06-01
GB2109392B (en) 1985-06-26
GB2109392A (en) 1983-06-02
DE3236068A1 (de) 1983-05-11
IT1163009B (it) 1987-04-08

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: SERICOL GROUP LTD

Effective date: 19931031