BE861301A - Procede de stratifications d'une pellicule de reserve photosensible sur un support en relief - Google Patents
Procede de stratifications d'une pellicule de reserve photosensible sur un support en reliefInfo
- Publication number
- BE861301A BE861301A BE183011A BE183011A BE861301A BE 861301 A BE861301 A BE 861301A BE 183011 A BE183011 A BE 183011A BE 183011 A BE183011 A BE 183011A BE 861301 A BE861301 A BE 861301A
- Authority
- BE
- Belgium
- Prior art keywords
- lamination process
- relief support
- reserve film
- photosensitive
- photosensitive reserve
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/0038—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding involving application of liquid to the layers prior to lamination, e.g. wet laminating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/281—Applying non-metallic protective coatings by means of a preformed insulating foil
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/06—Lamination
- H05K2203/068—Features of the lamination press or of the lamination process, e.g. using special separator sheets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/136—Coating process making radiation sensitive element
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Formation Of Insulating Films (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/745,680 US4069076A (en) | 1976-11-29 | 1976-11-29 | Liquid lamination process |
Publications (1)
Publication Number | Publication Date |
---|---|
BE861301A true BE861301A (fr) | 1978-05-29 |
Family
ID=24997776
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE183011A BE861301A (fr) | 1976-11-29 | 1977-11-29 | Procede de stratifications d'une pellicule de reserve photosensible sur un support en relief |
Country Status (7)
Country | Link |
---|---|
US (1) | US4069076A (nl) |
JP (1) | JPS5369034A (nl) |
BE (1) | BE861301A (nl) |
DE (1) | DE2752900C2 (nl) |
FR (1) | FR2372456A1 (nl) |
GB (1) | GB1546290A (nl) |
NL (1) | NL174993C (nl) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4201581A (en) * | 1978-03-13 | 1980-05-06 | Eastman Kodak Company | Method of providing close contact for contact printing |
US4226933A (en) * | 1978-11-28 | 1980-10-07 | Toppan Printing Co., Ltd. | Method of manufacturing a decorative panel |
JPS5676531A (en) * | 1979-11-28 | 1981-06-24 | Fujitsu Ltd | Manufacture of semiconductor device |
BR8103186A (pt) * | 1980-05-27 | 1982-02-09 | Du Pont | Processo para laminar uma camada fotossensivel sobre suporte a uma superficie de substrato atraves de pressao |
US4378264A (en) * | 1980-05-27 | 1983-03-29 | E. I. Du Pont De Nemours And Company | Integrated laminating process |
US4405394A (en) * | 1980-05-27 | 1983-09-20 | E. I. Du Pont De Nemours And Company | Laminating process |
EP0042894B1 (en) * | 1980-06-30 | 1984-05-02 | International Business Machines Corporation | A process for forming microcircuits |
DE3125564C2 (de) * | 1981-06-29 | 1984-08-30 | Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf | Verfahren zur Verbesserung der Druckqualität von Hochdruckformen |
EP0141868A1 (en) * | 1982-04-01 | 1985-05-22 | Inc. M & T Chemicals | High resolution phototransparency image forming with photopolymers |
US4732829A (en) * | 1982-04-01 | 1988-03-22 | Donald Sullivan | Polymer printing |
KR910005880B1 (ko) * | 1984-10-29 | 1991-08-06 | 아메리칸 텔리폰 앤드 텔레그라프 캄파니 | 석판화 기술을 이용한 장치 및 그 제조방법 |
US4886727A (en) * | 1985-11-25 | 1989-12-12 | International Business Machines Corporation | Method for developing negative photoresists |
US4698294A (en) * | 1986-09-12 | 1987-10-06 | E. I. Du Pont De Nemours And Company | Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer |
EP0259853A3 (en) * | 1986-09-12 | 1989-11-08 | E.I. Du Pont De Nemours And Company | Lamination of photopolymerizable film onto a substrate employing an intermediate photosensitive layer |
US4976817A (en) * | 1988-12-09 | 1990-12-11 | Morton International, Inc. | Wet lamination process and apparatus |
US4927733A (en) * | 1988-12-23 | 1990-05-22 | E. I. Du Pont De Nemours And Company | Conformation of vacuum - laminated solder mask coated printed circuit boards by fluid pressurizing |
US4971894A (en) * | 1989-02-13 | 1990-11-20 | International Business Machines Corporation | Method and structure for preventing wet etchant penetration at the interface between a resist mask and an underlying metal layer |
JPH0651360B2 (ja) * | 1989-06-04 | 1994-07-06 | ソマール株式会社 | 薄膜の張付方法及びその装置 |
SG63582A1 (en) * | 1989-06-14 | 1999-03-30 | Hewlett Packard Co | Method for improving deposit of photoresist on wafers |
US4971931A (en) * | 1990-02-12 | 1990-11-20 | Eastman Kodak Company | Diffuser features for spin-coated films |
US5240817A (en) * | 1991-12-20 | 1993-08-31 | E. I. Du Pont De Nemours And Company | Lamination of a photopolymerizable solder mask layer to a substate containing holes using an intermediate photopolymerizable liquid layer |
US5372670A (en) * | 1994-02-02 | 1994-12-13 | International Business Machines Corporation | System for wet application of a dry film to a panel |
US6002322A (en) * | 1998-05-05 | 1999-12-14 | Littelfuse, Inc. | Chip protector surface-mounted fuse device |
US6608757B1 (en) | 2002-03-18 | 2003-08-19 | International Business Machines Corporation | Method for making a printed wiring board |
US7247269B2 (en) * | 2003-07-21 | 2007-07-24 | Biosense Webster, Inc. | Method for making a spiral array ultrasound transducer |
WO2005088665A2 (en) * | 2004-03-05 | 2005-09-22 | Littelfuse, Inc. | Low profile automotive fuse |
TWI241001B (en) * | 2004-03-26 | 2005-10-01 | Advanced Semiconductor Eng | Method of improving adhesive characteristic between photoresist layer and substrate, and bumping process |
US7465343B2 (en) * | 2005-05-13 | 2008-12-16 | Hewlett-Packard Development Company, L.P. | Inkjet ink for use on polymeric substrate |
US8153019B2 (en) * | 2007-08-06 | 2012-04-10 | Micron Technology, Inc. | Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices |
CN101430507A (zh) * | 2007-08-27 | 2009-05-13 | E.I.内穆尔杜邦公司 | 基片上的可光聚合干膜的湿层叠以及与湿层叠有关的组合物 |
US20090087774A1 (en) * | 2007-08-27 | 2009-04-02 | E.I. Du Pont De Nemours And Company | Compositions and methods for wet lamination of photopolymerizable dry films onto substrates |
US8077007B2 (en) * | 2008-01-14 | 2011-12-13 | Littlelfuse, Inc. | Blade fuse |
CN102256446A (zh) * | 2011-07-29 | 2011-11-23 | 江西鑫力华数码科技有限公司 | 柔性线路板的压膜方法 |
US9865490B2 (en) | 2014-01-07 | 2018-01-09 | Brewer Science Inc. | Cyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB898871A (en) * | 1959-07-20 | 1962-06-14 | Koch Processes Ltd | Improvements in or relating to printing |
US3402087A (en) * | 1964-12-23 | 1968-09-17 | Eastman Kodak Co | Coating non-planar surfaces |
US3617411A (en) * | 1969-01-14 | 1971-11-02 | Ibm | Process for etching a pattern of closely spaced conducting lines in an integrated circuit |
US3629036A (en) * | 1969-02-14 | 1971-12-21 | Shipley Co | The method coating of photoresist on circuit boards |
FR2071069A5 (nl) * | 1969-12-17 | 1971-09-17 | Progil | |
DE2106574A1 (de) * | 1970-03-03 | 1971-09-23 | Shpley Co Inc | Lichtempfindliches Laminat |
DE2332799A1 (de) * | 1973-06-28 | 1975-01-16 | Kalle Ag | Lichtempfindliches kopiermaterial und verfahren zur herstellung von siebdruckschablonen |
US3976524A (en) * | 1974-06-17 | 1976-08-24 | Ibm Corporation | Planarization of integrated circuit surfaces through selective photoresist masking |
DE2544553C2 (de) * | 1974-10-08 | 1983-08-04 | E.I. du Pont de Nemours and Co., 19898 Wilmington, Del. | Verfahren zum Aufbringen einer photopolymerisierbaren festen Resistschicht auf ein Substrat |
JPS51108577A (nl) * | 1975-03-19 | 1976-09-25 | Kogyo Gijutsuin |
-
1976
- 1976-11-29 US US05/745,680 patent/US4069076A/en not_active Expired - Lifetime
-
1977
- 1977-11-26 DE DE2752900A patent/DE2752900C2/de not_active Expired
- 1977-11-28 NL NLAANVRAGE7713063,A patent/NL174993C/nl not_active IP Right Cessation
- 1977-11-28 GB GB49470/77A patent/GB1546290A/en not_active Expired
- 1977-11-28 FR FR7735735A patent/FR2372456A1/fr active Granted
- 1977-11-29 BE BE183011A patent/BE861301A/xx not_active IP Right Cessation
- 1977-11-29 JP JP14378577A patent/JPS5369034A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5537738B2 (nl) | 1980-09-30 |
NL174993C (nl) | 1984-09-03 |
US4069076A (en) | 1978-01-17 |
DE2752900A1 (de) | 1978-06-01 |
NL174993B (nl) | 1984-04-02 |
FR2372456A1 (fr) | 1978-06-23 |
NL7713063A (nl) | 1978-05-31 |
GB1546290A (en) | 1979-05-23 |
FR2372456B1 (nl) | 1985-04-26 |
JPS5369034A (en) | 1978-06-20 |
DE2752900C2 (de) | 1982-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: E.I. DU PONT DE NEMOURS AND CY Effective date: 19891130 |