BE849868A - Matieres a copier photosensibles et photoinitiateurs pour la mise en oeuvre - Google Patents
Matieres a copier photosensibles et photoinitiateurs pour la mise en oeuvreInfo
- Publication number
- BE849868A BE849868A BE173644A BE173644A BE849868A BE 849868 A BE849868 A BE 849868A BE 173644 A BE173644 A BE 173644A BE 173644 A BE173644 A BE 173644A BE 849868 A BE849868 A BE 849868A
- Authority
- BE
- Belgium
- Prior art keywords
- photoinitiators
- implementation
- photosensitive materials
- photosensitive
- materials
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/54—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings condensed with carbocyclic rings or ring systems
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2558812A DE2558812C2 (de) | 1975-12-27 | 1975-12-27 | Photopolymerisierbares Gemisch |
Publications (1)
Publication Number | Publication Date |
---|---|
BE849868A true BE849868A (fr) | 1977-06-24 |
Family
ID=5965724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE173644A BE849868A (fr) | 1975-12-27 | 1976-12-24 | Matieres a copier photosensibles et photoinitiateurs pour la mise en oeuvre |
Country Status (8)
Country | Link |
---|---|
US (1) | US4101327A (fr) |
JP (1) | JPS6037456B2 (fr) |
BE (1) | BE849868A (fr) |
CA (1) | CA1088057A (fr) |
DE (1) | DE2558812C2 (fr) |
FR (1) | FR2400222A1 (fr) |
GB (1) | GB1576218A (fr) |
NL (1) | NL7614410A (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2807933A1 (de) * | 1978-02-24 | 1979-08-30 | Hoechst Ag | Photopolymerisierbares gemisch |
IL69211A (en) * | 1982-07-23 | 1987-01-30 | Warner Lambert Co | Substituted anthra(1,9-cd)pyrazol-6(2h)-ones,their preparation and pharmaceutical compositions containing them |
GB2237023B (en) * | 1989-10-06 | 1993-09-29 | Toa Gosei Chem Ind | A catalytic composition for photopolymerization and a photopolymerizable composition containing the same |
JP3498869B2 (ja) * | 1995-01-30 | 2004-02-23 | 富士写真フイルム株式会社 | 光重合性組成物を有する画像形成材料 |
US6987184B2 (en) * | 2001-02-15 | 2006-01-17 | Signal Pharmaceuticals, Llc | Isothiazoloanthrones, isoxazoloanthrones, isoindolanthrones and derivatives thereof as JNK inhibitors and compositions and methods related |
JP4219289B2 (ja) * | 2004-03-10 | 2009-02-04 | 独立行政法人科学技術振興機構 | 多環性ケトン化合物及びその製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2136133A (en) * | 1936-02-07 | 1938-11-08 | Soc Of Chemical Ind | Pyrazole-anthrones and process of making same |
US2670285A (en) * | 1951-01-20 | 1954-02-23 | Eastman Kodak Co | Photosensitization of polymeric cinnamic acid esters |
NL108006C (fr) * | 1957-05-17 | |||
NL301574A (fr) * | 1962-12-14 | |||
US3874947A (en) * | 1968-08-20 | 1975-04-01 | Fuji Photo Film Co Ltd | Process for the production of polymer images |
DE2027467C3 (de) * | 1970-06-04 | 1974-08-15 | Kalle Ag, 6202 Wiesbaden-Biebrich | Photopolymerisierbare Kopiermasse |
DE2039861C3 (de) * | 1970-08-11 | 1973-12-13 | Kalle Ag, 6202 Wiesbaden-Biebrich | Photopolymensierbare Kopier masse |
US3949143A (en) * | 1973-02-09 | 1976-04-06 | American Can Company | Epoxy resin coatings cured with phototropic aromatic nitro compounds |
US3959100A (en) * | 1973-11-08 | 1976-05-25 | Scm Corporation | Photopolymerizable coating compositions containing activated halogenated azine photoinitiator and process for making same |
US3925077A (en) * | 1974-03-01 | 1975-12-09 | Horizons Inc | Photoresist for holography and laser recording with bleachout dyes |
-
1975
- 1975-12-27 DE DE2558812A patent/DE2558812C2/de not_active Expired
-
1976
- 1976-12-23 US US05/753,875 patent/US4101327A/en not_active Expired - Lifetime
- 1976-12-24 NL NL7614410A patent/NL7614410A/xx not_active Application Discontinuation
- 1976-12-24 GB GB54130/76A patent/GB1576218A/en not_active Expired
- 1976-12-24 CA CA268,714A patent/CA1088057A/fr not_active Expired
- 1976-12-24 BE BE173644A patent/BE849868A/fr not_active IP Right Cessation
- 1976-12-27 JP JP51160860A patent/JPS6037456B2/ja not_active Expired
- 1976-12-27 FR FR7639132A patent/FR2400222A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2400222A1 (fr) | 1979-03-09 |
NL7614410A (nl) | 1977-06-29 |
DE2558812A1 (de) | 1977-07-07 |
CA1088057A (fr) | 1980-10-21 |
US4101327A (en) | 1978-07-18 |
DE2558812C2 (de) | 1987-04-30 |
FR2400222B1 (fr) | 1982-02-26 |
JPS5283369A (en) | 1977-07-12 |
GB1576218A (en) | 1980-10-01 |
JPS6037456B2 (ja) | 1985-08-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: HOECHST A.G. Effective date: 19881231 |