BE797382A - Procede de fabrication de dispositifs a couches minces - Google Patents

Procede de fabrication de dispositifs a couches minces

Info

Publication number
BE797382A
BE797382A BE129303A BE129303A BE797382A BE 797382 A BE797382 A BE 797382A BE 129303 A BE129303 A BE 129303A BE 129303 A BE129303 A BE 129303A BE 797382 A BE797382 A BE 797382A
Authority
BE
Belgium
Prior art keywords
layer devices
manufacturing thin
thin
manufacturing
devices
Prior art date
Application number
BE129303A
Other languages
English (en)
Inventor
E A Chandross
T A Shankoff
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE797382A publication Critical patent/BE797382A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/38—Alkaline compositions for etching refractory metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
BE129303A 1972-03-30 1973-03-27 Procede de fabrication de dispositifs a couches minces BE797382A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23949772A 1972-03-30 1972-03-30

Publications (1)

Publication Number Publication Date
BE797382A true BE797382A (fr) 1973-07-16

Family

ID=22902418

Family Applications (1)

Application Number Title Priority Date Filing Date
BE129303A BE797382A (fr) 1972-03-30 1973-03-27 Procede de fabrication de dispositifs a couches minces

Country Status (8)

Country Link
US (1) US3772104A (fr)
JP (1) JPS4915646A (fr)
BE (1) BE797382A (fr)
CA (1) CA965336A (fr)
DE (1) DE2315372A1 (fr)
FR (1) FR2178036A1 (fr)
IT (1) IT976348B (fr)
NL (1) NL7304188A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036126B1 (fr) * 1970-12-18 1975-11-21
JPS513529A (en) * 1974-06-27 1976-01-13 Matsushita Electric Ind Co Ltd Netsugatasatsuzodebaisuyotaagetsuto
JPS5915394B2 (ja) * 1978-08-31 1984-04-09 富士通株式会社 厚膜微細パタ−ン生成方法
JPS5879246A (ja) * 1981-11-05 1983-05-13 Toyobo Co Ltd 金属系画像形成方法および金属系画像減力方法
US4443295A (en) * 1983-06-13 1984-04-17 Fairchild Camera & Instrument Corp. Method of etching refractory metal film on semiconductor structures utilizing triethylamine and H2 O2
US4799993A (en) * 1988-05-10 1989-01-24 E. I. Du Pont De Nemours And Company Rotary developer and method for its use
US4995942A (en) * 1990-04-30 1991-02-26 International Business Machines Corporation Effective near neutral pH etching solution for molybdenum or tungsten
US5486234A (en) * 1993-07-16 1996-01-23 The United States Of America As Represented By The United States Department Of Energy Removal of field and embedded metal by spin spray etching
US6231676B1 (en) * 1998-01-27 2001-05-15 Seagate Technology Llc Cleaning process for disc drive components
US6464893B1 (en) * 2000-05-09 2002-10-15 Pace University Process for preparation of thin metallic foils and organic thin-film-metal structures
CN101523517B (zh) * 2006-09-29 2013-07-10 鹤见曹达株式会社 导电性高分子用蚀刻液、及将导电性高分子图案化的方法
JP4406845B2 (ja) * 2007-02-20 2010-02-03 トヨタ自動車株式会社 二次電池電極材の剥離剤及び該剥離剤を用いた二次電池の処理方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2566615A (en) * 1947-03-21 1951-09-04 Sylvania Electric Prod Etching tungsten coils

Also Published As

Publication number Publication date
US3772104A (en) 1973-11-13
NL7304188A (fr) 1973-10-02
IT976348B (it) 1974-08-20
CA965336A (en) 1975-04-01
DE2315372A1 (de) 1973-10-18
FR2178036A1 (fr) 1973-11-09
JPS4915646A (fr) 1974-02-12

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