BE795116A - Procede d'alimentation de bain d'evaporation - Google Patents

Procede d'alimentation de bain d'evaporation

Info

Publication number
BE795116A
BE795116A BE795116DA BE795116A BE 795116 A BE795116 A BE 795116A BE 795116D A BE795116D A BE 795116DA BE 795116 A BE795116 A BE 795116A
Authority
BE
Belgium
Prior art keywords
feeding process
evaporation bath
bath feeding
evaporation
feeding
Prior art date
Application number
Other languages
English (en)
French (fr)
Inventor
G Donckel
D Streel
Original Assignee
Cockerill
Arbed
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE795116A publication Critical patent/BE795116A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
BE795116D 1972-02-08 Procede d'alimentation de bain d'evaporation BE795116A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU64748 1972-02-08

Publications (1)

Publication Number Publication Date
BE795116A true BE795116A (fr) 1973-05-29

Family

ID=19726945

Family Applications (1)

Application Number Title Priority Date Filing Date
BE795116D BE795116A (fr) 1972-02-08 Procede d'alimentation de bain d'evaporation

Country Status (10)

Country Link
US (1) US3860444A (me)
JP (1) JPS4984930A (me)
BE (1) BE795116A (me)
CA (1) CA992811A (me)
DE (1) DE2306035A1 (me)
FR (1) FR2171085B1 (me)
GB (1) GB1425095A (me)
IT (1) IT977238B (me)
LU (1) LU64748A1 (me)
NL (1) NL7217377A (me)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102485939A (zh) * 2010-12-02 2012-06-06 鸿富锦精密工业（深圳）有限公司 镀膜件及其制备方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
US4390571A (en) * 1981-06-30 1983-06-28 International Business Machines Corporation Boatless point source evaporation method
AU585531B2 (en) * 1984-09-17 1989-06-22 Mitsubishi Jukogyo Kabushiki Kaisha Method and apparatus for vacuum deposition plating
JPS6179755A (ja) * 1984-09-28 1986-04-23 Nisshin Steel Co Ltd 溶融めつき真空蒸着めつき兼用の連続めつき装置
KR920003591B1 (ko) * 1988-04-11 1992-05-04 미쯔비시주우고오교오 가부시기가이샤 연속진공증착장치
CH690440A5 (fr) * 1995-12-11 2000-09-15 Charmilles Technologies Procédé et dispositif de fabrication de fils ayant une surface en laiton, pour les besoins de l'électro-érosion à fil.
ES1034476Y (es) * 1996-06-21 1997-06-01 Mecanismos Aux Ind Hembrilla perfeccionada para circuito impreso.
AUPO663597A0 (en) * 1997-05-06 1997-05-29 Unisearch Limited Fabrication of zinc oxide films in non-planar substrates and the use thereof
DE19960465A1 (de) * 1999-12-15 2001-06-21 Alcatel Sa Flachleiter-Bandleitung
BE1017852A3 (fr) 2007-11-19 2009-09-01 Ind Plasma Services & Technologies Ipst Gmbh Procede et installation de galvanisation par evaporation plasma.
EP2270253B1 (en) * 2009-07-03 2012-09-12 Applied Materials, Inc. Bending fixture for homogenous and smooth operation of an evaporation source
US8920566B2 (en) 2010-12-30 2014-12-30 United Technologies Corporation Wire feed pressure lock system
CN110153382B (zh) * 2019-06-14 2022-02-08 上海交通大学 在线式合金熔配方法与装置
DE102022105889A1 (de) 2022-03-14 2023-09-14 Thyssenkrupp Steel Europe Ag Verfahren zum Beschichten eines Substrats mit einer Metalllegierungsbeschichtung, die wenigstens zwei Metalle enthält

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2899528A (en) * 1959-08-11 Method and apparatus for supplying
US2153786A (en) * 1936-07-17 1939-04-11 Alexander Process and apparatus for thermal deposition of metals
US3467058A (en) * 1965-12-03 1969-09-16 United States Steel Corp Apparatus for vaporizing metal
US3562002A (en) * 1968-04-24 1971-02-09 Air Reduction Method and apparatus for vapor deposition
US3607222A (en) * 1968-11-26 1971-09-21 Air Reduction Method for evaporating alloy

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102485939A (zh) * 2010-12-02 2012-06-06 鸿富锦精密工业（深圳）有限公司 镀膜件及其制备方法

Also Published As

Publication number Publication date
GB1425095A (en) 1976-02-18
DE2306035A1 (de) 1973-08-23
FR2171085A1 (me) 1973-09-21
LU64748A1 (me) 1973-02-19
IT977238B (it) 1974-09-10
FR2171085B1 (me) 1977-04-08
US3860444A (en) 1975-01-14
CA992811A (en) 1976-07-13
JPS4984930A (me) 1974-08-15
NL7217377A (me) 1973-08-10

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