BE762831A - Nouveaux compose et ses applications, notamment a la reproduction photomecanique - Google Patents

Nouveaux compose et ses applications, notamment a la reproduction photomecanique

Info

Publication number
BE762831A
BE762831A BE762831A BE762831A BE762831A BE 762831 A BE762831 A BE 762831A BE 762831 A BE762831 A BE 762831A BE 762831 A BE762831 A BE 762831A BE 762831 A BE762831 A BE 762831A
Authority
BE
Belgium
Prior art keywords
applications
new compounds
photomechanical reproduction
photomechanical
reproduction
Prior art date
Application number
BE762831A
Other languages
English (en)
French (fr)
Inventor
Ltd. Kodak
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of BE762831A publication Critical patent/BE762831A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
BE762831A 1970-02-12 1971-02-11 Nouveaux compose et ses applications, notamment a la reproduction photomecanique BE762831A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB684670 1970-02-12

Publications (1)

Publication Number Publication Date
BE762831A true BE762831A (fr) 1971-07-16

Family

ID=9821826

Family Applications (1)

Application Number Title Priority Date Filing Date
BE762831A BE762831A (fr) 1970-02-12 1971-02-11 Nouveaux compose et ses applications, notamment a la reproduction photomecanique

Country Status (5)

Country Link
US (1) US3984250A (https=)
BE (1) BE762831A (https=)
CA (1) CA942571A (https=)
FR (1) FR2078405A5 (https=)
GB (1) GB1331441A (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4106943A (en) * 1973-09-27 1978-08-15 Japan Synthetic Rubber Co., Ltd. Photosensitive cross-linkable azide containing polymeric composition
US4191573A (en) * 1974-10-09 1980-03-04 Fuji Photo Film Co., Ltd. Photosensitive positive image forming process with two photo-sensitive layers
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
US4571375A (en) * 1983-10-24 1986-02-18 Benedikt George M Ring-opened polynorbornene negative photoresist with bisazide
US4622284A (en) * 1984-03-01 1986-11-11 Digital Recording Corporation Process of using metal azide recording media with laser
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
DE3837500A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
DE69813508T2 (de) * 1997-01-30 2003-11-13 Hitachi Chemical Co., Ltd. Fotoempfindliche harzzusammensetzungen, verfahren zur herstellung eines harzmusters, damit hergestellte elektronische vorrichtungen und verfahren zur deren herstellung
FR2831534B1 (fr) * 2001-10-29 2004-01-30 Oreal Composition photoactivable et utilisations
US7241707B2 (en) * 2005-02-17 2007-07-10 Intel Corporation Layered films formed by controlled phase segregation

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL80628C (https=) * 1949-07-23
DE900172C (de) * 1951-06-30 1953-12-21 Kalle & Co Ag Verfahren zur Herstellung von besonders als Druckformen verwendbaren Reproduktionen von Originalen mit Hilfe von Diazoverbindungen
NL170716B (nl) * 1951-06-30 Agfa Gevaert Nv Werkwijze voor de vervaardiging van polymeerfoelie door extrusie.
US2690968A (en) * 1952-10-04 1954-10-05 Powers Chemco Inc Development of diazo and azide sensitized colloids
NL92615C (https=) * 1953-05-28
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
US3143423A (en) * 1962-04-02 1964-08-04 Eastman Kodak Co New photo-resist benzoylazide compositions
GB1062884A (en) * 1964-06-15 1967-03-22 Agfa Gevaert Nv Photochemical cross-linding of polymers
GB1116674A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Naphthoquinone diazide sulphofluoride
ZA6801224B (https=) * 1967-03-08
GB1230772A (https=) * 1967-03-31 1971-05-05
GB1258244A (https=) * 1968-06-10 1971-12-22
US3573917A (en) * 1968-07-12 1971-04-06 Takashi Okamoto Light-sensitive printing plate composition

Also Published As

Publication number Publication date
US3984250A (en) 1976-10-05
GB1331441A (en) 1973-09-26
FR2078405A5 (https=) 1971-11-05
CA942571A (en) 1974-02-26

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