FR2078405A5 - - Google Patents

Info

Publication number
FR2078405A5
FR2078405A5 FR7104371A FR7104371A FR2078405A5 FR 2078405 A5 FR2078405 A5 FR 2078405A5 FR 7104371 A FR7104371 A FR 7104371A FR 7104371 A FR7104371 A FR 7104371A FR 2078405 A5 FR2078405 A5 FR 2078405A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7104371A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Application granted granted Critical
Publication of FR2078405A5 publication Critical patent/FR2078405A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
FR7104371A 1970-02-12 1971-02-10 Expired FR2078405A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB684670 1970-02-12

Publications (1)

Publication Number Publication Date
FR2078405A5 true FR2078405A5 (fr) 1971-11-05

Family

ID=9821826

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7104371A Expired FR2078405A5 (fr) 1970-02-12 1971-02-10

Country Status (5)

Country Link
US (1) US3984250A (fr)
BE (1) BE762831A (fr)
CA (1) CA942571A (fr)
FR (1) FR2078405A5 (fr)
GB (1) GB1331441A (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4106943A (en) * 1973-09-27 1978-08-15 Japan Synthetic Rubber Co., Ltd. Photosensitive cross-linkable azide containing polymeric composition
US4191573A (en) * 1974-10-09 1980-03-04 Fuji Photo Film Co., Ltd. Photosensitive positive image forming process with two photo-sensitive layers
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
GB2092164B (en) * 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
AU8021782A (en) * 1981-02-20 1982-08-26 Polychrome Corp. Non-silver positive working radiation sensitive compositions
JPS57163234A (en) * 1981-04-01 1982-10-07 Fuji Photo Film Co Ltd Photosensitive composition
JPS5872139A (ja) * 1981-10-26 1983-04-30 Tokyo Ohka Kogyo Co Ltd 感光性材料
US4571375A (en) * 1983-10-24 1986-02-18 Benedikt George M Ring-opened polynorbornene negative photoresist with bisazide
US4622284A (en) * 1984-03-01 1986-11-11 Digital Recording Corporation Process of using metal azide recording media with laser
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4902785A (en) * 1986-05-02 1990-02-20 Hoechst Celanese Corporation Phenolic photosensitizers containing quinone diazide and acidic halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5162510A (en) * 1986-05-02 1992-11-10 Hoechst Celanese Corporation Process for the preparation of photosensitive compositions containing a mixed ester o-quinone photosensitizer
DE3837500A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
ATE237831T1 (de) * 1997-01-30 2003-05-15 Hitachi Chemical Co Ltd Fotoempfindliche harzzusammensetzungen, verfahren zur herstellung eines harzmusters, damit hergestellte elektronische vorrichtungen und verfahren zur deren herstellung
FR2831534B1 (fr) * 2001-10-29 2004-01-30 Oreal Composition photoactivable et utilisations
US7241707B2 (en) * 2005-02-17 2007-07-10 Intel Corporation Layered films formed by controlled phase segregation

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78723C (fr) * 1949-07-23
NL77573C (fr) * 1951-06-30
DE900172C (de) * 1951-06-30 1953-12-21 Kalle & Co Ag Verfahren zur Herstellung von besonders als Druckformen verwendbaren Reproduktionen von Originalen mit Hilfe von Diazoverbindungen
US2690968A (en) * 1952-10-04 1954-10-05 Powers Chemco Inc Development of diazo and azide sensitized colloids
BE528898A (fr) * 1953-05-28
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
US3143423A (en) * 1962-04-02 1964-08-04 Eastman Kodak Co New photo-resist benzoylazide compositions
GB1062884A (en) * 1964-06-15 1967-03-22 Agfa Gevaert Nv Photochemical cross-linding of polymers
GB1116674A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Naphthoquinone diazide sulphofluoride
ZA6801224B (fr) * 1967-03-08
GB1230772A (fr) * 1967-03-31 1971-05-05
GB1258244A (fr) * 1968-06-10 1971-12-22
US3573917A (en) * 1968-07-12 1971-04-06 Takashi Okamoto Light-sensitive printing plate composition

Also Published As

Publication number Publication date
BE762831A (fr) 1971-07-16
GB1331441A (en) 1973-09-26
US3984250A (en) 1976-10-05
CA942571A (en) 1974-02-26

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Legal Events

Date Code Title Description
ST Notification of lapse