BE736740A - Procédé pour préparer une réserve positive directe utilisable pour la reproduction photomécanique - Google Patents

Procédé pour préparer une réserve positive directe utilisable pour la reproduction photomécanique

Info

Publication number
BE736740A
BE736740A BE736740A BE736740A BE736740A BE 736740 A BE736740 A BE 736740A BE 736740 A BE736740 A BE 736740A BE 736740 A BE736740 A BE 736740A BE 736740 A BE736740 A BE 736740A
Authority
BE
Belgium
Prior art keywords
preparing
positive resist
direct positive
photomechanical reproduction
usable
Prior art date
Application number
BE736740A
Other languages
English (en)
Inventor
J H Altman
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of BE736740A publication Critical patent/BE736740A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE736740A 1968-07-31 1969-07-29 Procédé pour préparer une réserve positive directe utilisable pour la reproduction photomécanique BE736740A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US74896868A 1968-07-31 1968-07-31

Publications (1)

Publication Number Publication Date
BE736740A true BE736740A (fr) 1969-09-30

Family

ID=25011659

Family Applications (1)

Application Number Title Priority Date Filing Date
BE736740A BE736740A (fr) 1968-07-31 1969-07-29 Procédé pour préparer une réserve positive directe utilisable pour la reproduction photomécanique

Country Status (4)

Country Link
US (1) US3591378A (fr)
BE (1) BE736740A (fr)
FR (1) FR2014049A1 (fr)
GB (1) GB1256637A (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3819377A (en) * 1971-08-12 1974-06-25 Energy Conversion Devices Inc Method of imaging and imaging material
US3779768A (en) * 1971-08-26 1973-12-18 Xidex Corp Fluorocarbon surfactants for vesicular films
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
JPS5525418B2 (fr) * 1972-12-20 1980-07-05
US4182665A (en) * 1974-04-01 1980-01-08 Japan Storage Battery Co., Ltd. Method for curing photo-curable composition
US4327172A (en) * 1980-12-16 1982-04-27 Western Electric Company, Inc. Photographic image definition improvement
US4971895A (en) * 1981-10-20 1990-11-20 Sullivan Donald F Double exposure method of photoprinting with liquid photopolymers
US4464458A (en) * 1982-12-30 1984-08-07 International Business Machines Corporation Process for forming resist masks utilizing O-quinone diazide and pyrene
US5264318A (en) * 1987-06-15 1993-11-23 Sanyo-Kokusaku Pulp Co., Ltd. Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin
US5057394A (en) * 1989-11-01 1991-10-15 Sanyo-Kokusaku Pulp Co., Ltd. Method of forming an image
US6623912B1 (en) 2001-05-30 2003-09-23 Taiwan Semiconductor Manufacturing Company Method to form the ring shape contact to cathode on wafer edge for electroplating in the bump process when using the negative type dry film photoresist

Also Published As

Publication number Publication date
FR2014049A1 (fr) 1970-04-10
GB1256637A (fr) 1971-12-08
US3591378A (en) 1971-07-06

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