BE733724A - - Google Patents
Info
- Publication number
- BE733724A BE733724A BE733724DA BE733724A BE 733724 A BE733724 A BE 733724A BE 733724D A BE733724D A BE 733724DA BE 733724 A BE733724 A BE 733724A
- Authority
- BE
- Belgium
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US73359468A | 1968-05-31 | 1968-05-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE733724A true BE733724A (enExample) | 1969-11-03 |
Family
ID=24948299
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE733724D BE733724A (enExample) | 1968-05-31 | 1969-05-28 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3616402A (enExample) |
| BE (1) | BE733724A (enExample) |
| DE (1) | DE1927253A1 (enExample) |
| FR (1) | FR2009759A1 (enExample) |
| GB (1) | GB1275428A (enExample) |
| NL (1) | NL6908267A (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2253769C3 (de) * | 1972-11-02 | 1979-07-12 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Kathodenzerstäubungsanlage mit kontinuierlichem Substratdurchlauf |
| US4125446A (en) * | 1977-08-15 | 1978-11-14 | Airco, Inc. | Controlled reflectance of sputtered aluminum layers |
| US4313815A (en) * | 1978-04-07 | 1982-02-02 | Varian Associates, Inc. | Sputter-coating system, and vaccuum valve, transport, and sputter source array arrangements therefor |
| US4356073A (en) * | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
| US4834856A (en) * | 1988-01-21 | 1989-05-30 | Wehner Gottfried K | Method and apparatus for sputtering a superconductor onto a substrate |
| US4911810A (en) * | 1988-06-21 | 1990-03-27 | Brown University | Modular sputtering apparatus |
| US5798029A (en) * | 1994-04-22 | 1998-08-25 | Applied Materials, Inc. | Target for sputtering equipment |
| DE19623359A1 (de) * | 1995-08-17 | 1997-02-20 | Leybold Ag | Vorrichtung zum Beschichten eines Substrats |
| US5830272A (en) * | 1995-11-07 | 1998-11-03 | Sputtered Films, Inc. | System for and method of providing a controlled deposition on wafers |
| JP2001003166A (ja) * | 1999-04-23 | 2001-01-09 | Nippon Sheet Glass Co Ltd | 基体表面に被膜を被覆する方法およびその方法による基体 |
| US20030209423A1 (en) * | 2001-03-27 | 2003-11-13 | Christie David J. | System for driving multiple magnetrons with multiple phase ac |
| US9175383B2 (en) * | 2008-01-16 | 2015-11-03 | Applied Materials, Inc. | Double-coating device with one process chamber |
| AU2009242568B2 (en) * | 2008-05-01 | 2013-06-13 | First Solar, Inc. | Transparent conductive materials including cadmium stannate |
| JP2013163856A (ja) * | 2012-02-13 | 2013-08-22 | Tokyo Electron Ltd | スパッタ装置 |
| CN104831247B (zh) * | 2015-04-15 | 2017-06-06 | 赫得纳米科技(昆山)有限公司 | 水平连续式磁控溅射镀膜机在线面板恒温加热装置 |
| CN106884150B (zh) * | 2017-04-24 | 2023-06-09 | 爱瑞德科技(大连)有限公司 | 一种悬浮阳极及带有悬浮阳极的磁控溅射装置 |
-
1968
- 1968-05-31 US US733594A patent/US3616402A/en not_active Expired - Lifetime
-
1969
- 1969-05-28 BE BE733724D patent/BE733724A/xx unknown
- 1969-05-29 DE DE19691927253 patent/DE1927253A1/de active Pending
- 1969-05-30 GB GB27428/69A patent/GB1275428A/en not_active Expired
- 1969-05-30 FR FR6917838A patent/FR2009759A1/fr not_active Withdrawn
- 1969-05-30 NL NL6908267A patent/NL6908267A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB1275428A (en) | 1972-05-24 |
| FR2009759A1 (enExample) | 1970-02-06 |
| DE1927253A1 (de) | 1969-12-04 |
| US3616402A (en) | 1971-10-26 |
| NL6908267A (enExample) | 1969-12-02 |