BE727168A - - Google Patents
Info
- Publication number
- BE727168A BE727168A BE727168DA BE727168A BE 727168 A BE727168 A BE 727168A BE 727168D A BE727168D A BE 727168DA BE 727168 A BE727168 A BE 727168A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/109—Polyester
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP323868 | 1968-01-22 | ||
| JP1687968 | 1968-03-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE727168A true BE727168A (da) | 1969-07-01 |
Family
ID=26336772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE727168D BE727168A (da) | 1968-01-22 | 1969-01-21 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3630746A (da) |
| BE (1) | BE727168A (da) |
| DE (2) | DE1902639A1 (da) |
| FR (1) | FR2000515A1 (da) |
| GB (1) | GB1233883A (da) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3936254A (en) * | 1973-03-26 | 1976-02-03 | Nippon Paint Company Ltd. | Apparatus for the continuous manufacture of polymer plates |
| US3877939A (en) * | 1973-06-25 | 1975-04-15 | Nippon Paint Co Ltd | Photopolymer printing plates and coated relief printing plates |
| US3898087A (en) * | 1974-06-14 | 1975-08-05 | Ball Corp | Photopolymerizable compositions containing aminimides |
| JPS5917414B2 (ja) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン （株） | スクリ−ン版用感光性組成物及び感光膜 |
| IT1159073B (it) * | 1981-07-22 | 1987-02-25 | Basf Ag | Metodo per migliorare la preparazione,l'essiccazione e la immagazzinabilita' di elementi pluristrato adatti per la preparazione di stampi per stampaggio a rilievo |
| DE3144905A1 (de) * | 1981-11-12 | 1983-05-19 | Basf Ag, 6700 Ludwigshafen | Zur herstellung von druck- und reliefformen geeignetes lichtempfindliches auszeichnungsmaterial und verfahren zur herstellung von druck- und reliefformen mittels dieses aufzeichnungsmaterials |
| EP0081964B2 (en) * | 1981-12-10 | 1993-08-04 | Toray Industries, Inc. | Photosensitive polymer composition |
| JPS6051833A (ja) * | 1983-07-01 | 1985-03-23 | Toray Ind Inc | 感光性樹脂組成物 |
| DE3324643A1 (de) * | 1983-07-08 | 1985-01-17 | Basf Ag, 6700 Ludwigshafen | Photopolymerisierbare wasserloesliche oder wasserdispergierbare mischung |
| DE3324642A1 (de) * | 1983-07-08 | 1985-01-17 | Basf Ag, 6700 Ludwigshafen | Verfahren zur stabilisierung von photopolymerisierbaren mischungen |
| US5204222A (en) * | 1988-07-16 | 1993-04-20 | Hoechst Aktiengesellschaft | Photocurable elastomeric mixture and recording material, obtained therefrom, for the production of relief printing plates |
| DE3916463A1 (de) * | 1989-05-20 | 1990-11-22 | Hoechst Ag | Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten |
| US5238772A (en) * | 1989-06-21 | 1993-08-24 | Hoechst Aktiengesellschaft | Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units |
| US5683837A (en) * | 1994-11-18 | 1997-11-04 | Napp Systems, Inc. | Water-soluble compositions for preparation of durable, high-resolution printing plates |
| WO1996018133A1 (en) * | 1994-12-06 | 1996-06-13 | Napp Systems, Inc. | High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor |
| US20070071884A1 (en) * | 2005-09-27 | 2007-03-29 | Koji Takeshita | Electroluminescent element and a method of manufacturing the same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE603930A (da) * | 1960-05-19 | |||
| US3147117A (en) * | 1961-05-26 | 1964-09-01 | Horizons Inc | Process of forming print-out images from light sensitive organic amine compositions |
| US3366481A (en) * | 1963-09-20 | 1968-01-30 | Harmick Res & Dev Corp | Photoengraving resists and compositions therefor |
| US3259499A (en) * | 1965-01-18 | 1966-07-05 | Du Pont | Polymerizable elements |
| US3357831A (en) * | 1965-06-21 | 1967-12-12 | Harris Intertype Corp | Photopolymer |
-
1969
- 1969-01-07 GB GB1233883D patent/GB1233883A/en not_active Expired
- 1969-01-14 US US791189A patent/US3630746A/en not_active Expired - Lifetime
- 1969-01-20 FR FR6900938A patent/FR2000515A1/fr active Pending
- 1969-01-20 DE DE19691902639 patent/DE1902639A1/de active Pending
- 1969-01-20 DE DE1917917*A patent/DE1917917C3/de not_active Expired
- 1969-01-21 BE BE727168D patent/BE727168A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE1902639B2 (da) | 1973-10-11 |
| GB1233883A (da) | 1971-06-03 |
| US3630746A (en) | 1971-12-28 |
| DE1917917C3 (de) | 1973-10-04 |
| FR2000515A1 (da) | 1969-09-12 |
| DE1917917B2 (de) | 1973-03-15 |
| DE1902639A1 (de) | 1969-10-02 |
| DE1917917A1 (de) | 1969-12-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RE20 | Patent expired |
Owner name: NIPPON PAINT CO. LTD Effective date: 19890121 |