BE726267A - - Google Patents

Info

Publication number
BE726267A
BE726267A BE726267DA BE726267A BE 726267 A BE726267 A BE 726267A BE 726267D A BE726267D A BE 726267DA BE 726267 A BE726267 A BE 726267A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE726267A publication Critical patent/BE726267A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
BE726267D 1968-01-11 1968-12-30 BE726267A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR135568 1968-01-11
FR06009034 1968-02-21
FR161082A FR94900E (en) 1968-01-11 1968-07-30 Large capacity sputtering apparatus.

Publications (1)

Publication Number Publication Date
BE726267A true BE726267A (en) 1969-05-29

Family

ID=27244767

Family Applications (1)

Application Number Title Priority Date Filing Date
BE726267D BE726267A (en) 1968-01-11 1968-12-30

Country Status (4)

Country Link
BE (1) BE726267A (en)
DE (1) DE1901211A1 (en)
FR (1) FR94900E (en)
GB (1) GB1257342A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114720048B (en) * 2022-06-09 2022-09-02 季华实验室 Capacitor film vacuum gauge and NEG film preparation method

Also Published As

Publication number Publication date
GB1257342A (en) 1971-12-15
DE1901211A1 (en) 1970-09-24
FR94900E (en) 1970-01-16

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