BE720276A - - Google Patents
Info
- Publication number
- BE720276A BE720276A BE720276DA BE720276A BE 720276 A BE720276 A BE 720276A BE 720276D A BE720276D A BE 720276DA BE 720276 A BE720276 A BE 720276A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C317/28—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to acyclic carbon atoms of the carbon skeleton
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4057467 | 1967-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE720276A true BE720276A (no) | 1969-03-03 |
Family
ID=10415578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE720276D BE720276A (no) | 1967-09-05 | 1968-09-02 |
Country Status (3)
| Country | Link |
|---|---|
| BE (1) | BE720276A (no) |
| GB (1) | GB1231789A (no) |
| NL (1) | NL6812645A (no) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3930087A1 (de) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE3930086A1 (de) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| DE69125634T2 (de) * | 1990-01-30 | 1998-01-02 | Wako Pure Chem Ind Ltd | Chemisch verstärktes Photolack-Material |
| JP2500533B2 (ja) * | 1990-01-30 | 1996-05-29 | 和光純薬工業株式会社 | 新規なジアゾジスルホン化合物 |
| JPH03223863A (ja) * | 1990-01-30 | 1991-10-02 | Wako Pure Chem Ind Ltd | レジスト材料 |
| US5216135A (en) * | 1990-01-30 | 1993-06-01 | Wako Pure Chemical Industries, Ltd. | Diazodisulfones |
| DE4006190A1 (de) * | 1990-02-28 | 1991-08-29 | Hoechst Ag | Negativ arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
| JP3030672B2 (ja) * | 1991-06-18 | 2000-04-10 | 和光純薬工業株式会社 | 新規なレジスト材料及びパタ−ン形成方法 |
| DE69218393T2 (de) * | 1991-12-16 | 1997-10-16 | Matsushita Electric Ind Co Ltd | Resistmaterial |
| RU2153986C2 (ru) | 1996-04-23 | 2000-08-10 | Хорселл Грэфик Индастриз Лимитед | Термочувствительная композиция и способ ее применения для изготовления литографической печатной формы |
| US5858626A (en) | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US6117610A (en) | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| US6090532A (en) | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| US6063544A (en) | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| ATE204388T1 (de) | 1997-07-05 | 2001-09-15 | Kodak Polychrome Graphics Llc | Bilderzeugungsverfahren |
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6153733A (en) * | 1998-05-18 | 2000-11-28 | Tokyo Ohka Kogyo Co., Ltd. | (Disulfonyl diazomethane compounds) |
| US6783912B2 (en) * | 2000-02-27 | 2004-08-31 | Shipley Company, L.L.C. | Photoacid generators and photoresists comprising same |
-
1967
- 1967-09-05 GB GB1231789D patent/GB1231789A/en not_active Expired
-
1968
- 1968-09-02 BE BE720276D patent/BE720276A/xx unknown
- 1968-09-05 NL NL6812645A patent/NL6812645A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB1231789A (no) | 1971-05-12 |
| NL6812645A (no) | 1969-02-25 |