GB1231789A - - Google Patents

Info

Publication number
GB1231789A
GB1231789A GB1231789DA GB1231789A GB 1231789 A GB1231789 A GB 1231789A GB 1231789D A GB1231789D A GB 1231789DA GB 1231789 A GB1231789 A GB 1231789A
Authority
GB
United Kingdom
Prior art keywords
diazomethanes
phenyl
reacting
appropriate
diazomethane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1231789A publication Critical patent/GB1231789A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00—Sulfones; Sulfoxides
    • C07C317/26—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C317/28—Sulfones; Sulfoxides having sulfone or sulfoxide groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton with sulfone or sulfoxide groups bound to acyclic carbon atoms of the carbon skeleton

Abstract

1,231,789. Diazomethanes. GEVAERTAGFA N.V. 6 Aug., 1968 [5 Sept., 1967], No. 40574/67. Heading C2C. [Also in Division G2] Diazomethanes of formula wherein R 1 and R 2 are the same and aliphatic, aromatic or heterocyclic are prepared by reacting the appropriate mercaptan with methyl - ene bromide and oxidizing the product with hydrogen peroxide to form the disulphomethylene compound. This compound is reacted with p-toluene-sulphonylazide to form the diazomethane. Specified diazomethanes are wherein R 1 and R 2 are phenyl, naphthyl and p-methyl-, chloro- or nitro-phenyl. Diazomethanes of formula wherein R 1 and R 2 may be different but the values are those given above may be prepared by reacting the appropriate sodium sulphonate with the appropriate alpha-ketomethyl bromide and then reacting the product with p-toluenesulphonyl azide to form the diazomethane. Specified diazomethanes are those wherein R 1 is phenyl or decyl and R 2 is phenyl, p-alkyl-, alkoxy-, halo- or nitro-phenyl, naphthyl or benzofuryl.
GB1231789D 1967-09-05 1967-09-05 Expired GB1231789A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB4057467 1967-09-05

Publications (1)

Publication Number Publication Date
GB1231789A true GB1231789A (en) 1971-05-12

Family

ID=10415578

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1231789D Expired GB1231789A (en) 1967-09-05 1967-09-05

Country Status (3)

Country Link
BE (1) BE720276A (en)
GB (1) GB1231789A (en)
NL (1) NL6812645A (en)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0417556A2 (en) * 1989-09-09 1991-03-20 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and recording material prepared therefrom
EP0417557A2 (en) * 1989-09-09 1991-03-20 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and recording material prepared therefrom
EP0440375A1 (en) * 1990-01-30 1991-08-07 Wako Pure Chemical Industries Ltd Diazodisulfones
EP0440374A2 (en) * 1990-01-30 1991-08-07 Wako Pure Chemical Industries Ltd Chemical amplified resist material
JPH04210960A (en) * 1990-01-30 1992-08-03 Wako Pure Chem Ind Ltd Novel diazodisulfone compound
US5216135A (en) * 1990-01-30 1993-06-01 Wako Pure Chemical Industries, Ltd. Diazodisulfones
US5424166A (en) * 1990-02-28 1995-06-13 Hoechst Aktiengesellschaft Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom
US5468589A (en) * 1991-06-18 1995-11-21 Wako Pure Chemical Industries, Ltd. Resist material and pattern formation process
US5627006A (en) * 1991-12-16 1997-05-06 Wako Pure Chemical Industries, Ltd. Resist material
US6060217A (en) 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6063544A (en) 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6117610A (en) 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6153733A (en) * 1998-05-18 2000-11-28 Tokyo Ohka Kogyo Co., Ltd. (Disulfonyl diazomethane compounds)
US6218083B1 (en) 1997-07-05 2001-04-17 Kodak Plychrome Graphics, Llc Pattern-forming methods
US6280899B1 (en) * 1996-04-23 2001-08-28 Kodak Polychrome Graphics, Llc Relation to lithographic printing forms
US6482577B1 (en) 1996-09-30 2002-11-19 Kodak Polychrome Graphics, Llc Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
JP4991074B2 (en) * 2000-02-27 2012-08-01 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Photoreactive acid generator and photoresist containing the same

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5338641A (en) * 1989-09-09 1994-08-16 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α,α-bis(sulfonyl) diazo methane as an acid forming compound
EP0417557A2 (en) * 1989-09-09 1991-03-20 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and recording material prepared therefrom
EP0417556A2 (en) * 1989-09-09 1991-03-20 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and recording material prepared therefrom
US5340682A (en) * 1989-09-09 1994-08-23 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and copying material produced therefrom comprising an α-carbonyl-α-sulfonyl diazomethane, a water-insoluble binder and an acid cleavable compound
EP0417556A3 (en) * 1989-09-09 1991-10-16 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and recording material prepared therefrom
EP0417557A3 (en) * 1989-09-09 1991-10-16 Hoechst Aktiengesellschaft Positive-working radiation-sensitive mixture and recording material prepared therefrom
EP0440374A2 (en) * 1990-01-30 1991-08-07 Wako Pure Chemical Industries Ltd Chemical amplified resist material
JPH04210960A (en) * 1990-01-30 1992-08-03 Wako Pure Chem Ind Ltd Novel diazodisulfone compound
US5216135A (en) * 1990-01-30 1993-06-01 Wako Pure Chemical Industries, Ltd. Diazodisulfones
EP0440374A3 (en) * 1990-01-30 1992-04-29 Wako Pure Chemical Industries Ltd Chemical amplified resist material
USRE40211E1 (en) * 1990-01-30 2008-04-01 Wako Pure Chemical Industries, Ltd. Diazodisulfones
EP0440375A1 (en) * 1990-01-30 1991-08-07 Wako Pure Chemical Industries Ltd Diazodisulfones
JP2500533B2 (en) * 1990-01-30 1996-05-29 和光純薬工業株式会社 Novel diazodisulfone compound
US5424166A (en) * 1990-02-28 1995-06-13 Hoechst Aktiengesellschaft Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom
US5468589A (en) * 1991-06-18 1995-11-21 Wako Pure Chemical Industries, Ltd. Resist material and pattern formation process
US5670299A (en) * 1991-06-18 1997-09-23 Wako Pure Chemical Industries, Ltd. Pattern formation process
US5627006A (en) * 1991-12-16 1997-05-06 Wako Pure Chemical Industries, Ltd. Resist material
US6280899B1 (en) * 1996-04-23 2001-08-28 Kodak Polychrome Graphics, Llc Relation to lithographic printing forms
US6485890B2 (en) 1996-04-23 2002-11-26 Kodak Polychrome Graphics, Llc Lithographic printing forms
US6482577B1 (en) 1996-09-30 2002-11-19 Kodak Polychrome Graphics, Llc Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6063544A (en) 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6218083B1 (en) 1997-07-05 2001-04-17 Kodak Plychrome Graphics, Llc Pattern-forming methods
US6117610A (en) 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US6060217A (en) 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6153733A (en) * 1998-05-18 2000-11-28 Tokyo Ohka Kogyo Co., Ltd. (Disulfonyl diazomethane compounds)
JP4991074B2 (en) * 2000-02-27 2012-08-01 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Photoreactive acid generator and photoresist containing the same

Also Published As

Publication number Publication date
NL6812645A (en) 1969-02-25
BE720276A (en) 1969-03-03

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees