BE709772A - - Google Patents

Info

Publication number
BE709772A
BE709772A BE709772DA BE709772A BE 709772 A BE709772 A BE 709772A BE 709772D A BE709772D A BE 709772DA BE 709772 A BE709772 A BE 709772A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE709772A publication Critical patent/BE709772A/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • H10P14/47Electrolytic deposition, i.e. electroplating; Electroless plating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/012Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
    • H10W72/01251Changing the shapes of bumps
    • H10W72/01255Changing the shapes of bumps by using masks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/019Manufacture or treatment of bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241Dispositions, e.g. layouts
    • H10W72/242Dispositions, e.g. layouts relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/251Materials
    • H10W72/252Materials comprising solid metals or solid metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
BE709772D 1967-01-25 1968-01-23 BE709772A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6701136A NL6701136A (https=) 1967-01-25 1967-01-25

Publications (1)

Publication Number Publication Date
BE709772A true BE709772A (https=) 1968-07-23

Family

ID=19799110

Family Applications (1)

Application Number Title Priority Date Filing Date
BE709772D BE709772A (https=) 1967-01-25 1968-01-23

Country Status (10)

Country Link
US (1) US3528090A (https=)
AT (1) AT275609B (https=)
BE (1) BE709772A (https=)
CH (1) CH479162A (https=)
DE (1) DE1614306C3 (https=)
ES (1) ES349652A1 (https=)
FR (1) FR1555930A (https=)
GB (1) GB1204263A (https=)
NL (1) NL6701136A (https=)
SE (1) SE350648B (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3638304A (en) * 1969-11-06 1972-02-01 Gen Motors Corp Semiconductive chip attachment method
BE790652A (fr) * 1971-10-28 1973-02-15 Siemens Ag Composant a semi-conducteurs a connexions portantes
US3740619A (en) * 1972-01-03 1973-06-19 Signetics Corp Semiconductor structure with yieldable bonding pads having flexible links and method
US3911474A (en) * 1972-01-03 1975-10-07 Signetics Corp Semiconductor structure and method
DE3806287A1 (de) * 1988-02-27 1989-09-07 Asea Brown Boveri Aetzverfahren zur strukturierung einer mehrschicht-metallisierung
JP2002521575A (ja) * 1998-07-24 2002-07-16 アンテルユニヴェルシテール・ミクロ−エレクトロニカ・サントリュム・ヴェー・ゼッド・ドゥブルヴェ 導電パターンの電解メッキシステムとその電解メッキ方法
US6758958B1 (en) 1998-07-24 2004-07-06 Interuniversitair Micro-Elektronica Centrum System and a method for plating of a conductive pattern
US9524945B2 (en) 2010-05-18 2016-12-20 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with L-shaped non-metal sidewall protection structure
US8377816B2 (en) * 2009-07-30 2013-02-19 Taiwan Semiconductor Manufacturing Company, Ltd. Method of forming electrical connections
US8841766B2 (en) 2009-07-30 2014-09-23 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with non-metal sidewall protection structure
US8324738B2 (en) 2009-09-01 2012-12-04 Taiwan Semiconductor Manufacturing Company, Ltd. Self-aligned protection layer for copper post structure
US8659155B2 (en) 2009-11-05 2014-02-25 Taiwan Semiconductor Manufacturing Company, Ltd. Mechanisms for forming copper pillar bumps
US8610270B2 (en) 2010-02-09 2013-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and semiconductor assembly with lead-free solder
US8441124B2 (en) 2010-04-29 2013-05-14 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with non-metal sidewall protection structure
US8546254B2 (en) * 2010-08-19 2013-10-01 Taiwan Semiconductor Manufacturing Company, Ltd. Mechanisms for forming copper pillar bumps using patterned anodes
KR102458034B1 (ko) 2015-10-16 2022-10-25 삼성전자주식회사 반도체 패키지, 반도체 패키지의 제조방법, 및 반도체 모듈

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3386894A (en) * 1964-09-28 1968-06-04 Northern Electric Co Formation of metallic contacts
US3408271A (en) * 1965-03-01 1968-10-29 Hughes Aircraft Co Electrolytic plating of metal bump contacts to semiconductor devices upon nonconductive substrates

Also Published As

Publication number Publication date
DE1614306A1 (de) 1970-08-20
DE1614306B2 (de) 1974-05-16
GB1204263A (en) 1970-09-03
NL6701136A (https=) 1968-07-26
SE350648B (https=) 1972-10-30
US3528090A (en) 1970-09-08
ES349652A1 (es) 1969-04-01
DE1614306C3 (de) 1974-12-19
AT275609B (de) 1969-10-27
CH479162A (de) 1969-09-30
FR1555930A (https=) 1969-01-31

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