BE707745A - - Google Patents
Info
- Publication number
- BE707745A BE707745A BE707745DA BE707745A BE 707745 A BE707745 A BE 707745A BE 707745D A BE707745D A BE 707745DA BE 707745 A BE707745 A BE 707745A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Graft Or Block Polymers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polyamides (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEB0092007 | 1967-04-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE707745A true BE707745A (en) | 1968-04-16 |
Family
ID=6986153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE707745D BE707745A (en) | 1967-04-11 | 1967-12-08 |
Country Status (2)
| Country | Link |
|---|---|
| BE (1) | BE707745A (en) |
| DE (1) | DE1572303A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2924848A1 (en) * | 1978-06-22 | 1980-01-17 | Hercules Inc | METHOD FOR PRODUCING PRINTING PLATES AND THESE PRINTING PLATES |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2455305A1 (en) * | 1979-04-24 | 1980-11-21 | Uk Poligrafichesky Instit | Primer for photopolymerisable printing elements - contains titanium di:oxide and epoxy! resin with amine crosslinking agent |
| FR2457512A1 (en) * | 1979-05-22 | 1980-12-19 | Uk Poligrafichesky Instit | Adhesive antihalation compsn. for printing plate mfr - contg. di:phenylol-propane epoxy! resin-phenolic novolak resin copolymer, iron oxide or chromium oxide and a solvent |
-
1967
- 1967-04-11 DE DE19671572303 patent/DE1572303A1/en active Pending
- 1967-12-08 BE BE707745D patent/BE707745A/xx unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2924848A1 (en) * | 1978-06-22 | 1980-01-17 | Hercules Inc | METHOD FOR PRODUCING PRINTING PLATES AND THESE PRINTING PLATES |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1572303A1 (en) | 1970-01-08 |