BE700506A - - Google Patents
Info
- Publication number
- BE700506A BE700506A BE700506DA BE700506A BE 700506 A BE700506 A BE 700506A BE 700506D A BE700506D A BE 700506DA BE 700506 A BE700506 A BE 700506A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US56210466A | 1966-07-01 | 1966-07-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE700506A true BE700506A (xx) | 1967-12-01 |
Family
ID=24244811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE700506D BE700506A (xx) | 1966-07-01 | 1967-06-26 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3497356A (xx) |
BE (1) | BE700506A (xx) |
DE (1) | DE1547810B2 (xx) |
GB (1) | GB1185388A (xx) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1597515A1 (de) * | 1967-10-28 | 1970-06-11 | Basf Ag | Verfahren zum Aufbringen lichtempfindlicher Platten,Filme oder Folien auf metallischen Unterlagen |
US4036644A (en) * | 1973-03-16 | 1977-07-19 | International Business Machines Corporation | Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor |
JPS5555344A (en) * | 1978-10-20 | 1980-04-23 | Toray Ind Inc | Lithographic printing plate |
US4336113A (en) * | 1981-06-26 | 1982-06-22 | American Hoechst Corporation | Electrolytic graining of aluminum with hydrogen peroxide and nitric or hydrochloric acid |
US4455364A (en) * | 1981-11-14 | 1984-06-19 | Konishiroku Photo Industry Co., Ltd. | Process for forming metallic image, composite material for the same |
JPH0644150B2 (ja) * | 1986-05-09 | 1994-06-08 | 関西ペイント株式会社 | プリント配線フオトレジスト用電着塗料組成物 |
US5102775A (en) * | 1988-09-30 | 1992-04-07 | Kansai Paint Co., Ltd. | Visible light sensitive electrodeposition coating composition and image-forming method using the same |
JPH02302092A (ja) * | 1989-05-16 | 1990-12-14 | Kansai Paint Co Ltd | プリント配線板の製造方法 |
US5236810A (en) * | 1989-10-03 | 1993-08-17 | Kansai Paint Co., Ltd. | Process for preparing printed-circuit board |
JPH0465184A (ja) * | 1990-07-05 | 1992-03-02 | Kansai Paint Co Ltd | 電着前処理方法 |
US5374500A (en) * | 1993-04-02 | 1994-12-20 | International Business Machines Corporation | Positive photoresist composition containing photoacid generator and use thereof |
CN102262357A (zh) * | 2010-05-27 | 2011-11-30 | 中芯国际集成电路制造(上海)有限公司 | 光刻胶和光刻胶图形的优化方法 |
US8778568B2 (en) * | 2010-12-14 | 2014-07-15 | General Electric Company | Optical data storage media and methods for using the same |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2670286A (en) * | 1951-01-20 | 1954-02-23 | Eastman Kodak Co | Photosensitization of polymeric cinnamic acid esters |
US2691584A (en) * | 1952-01-12 | 1954-10-12 | Eastman Kodak Co | Stabilization of synthetic polymer sensitized zinc lithographic printing plates |
US2852379A (en) * | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
-
1966
- 1966-07-01 US US562104A patent/US3497356A/en not_active Expired - Lifetime
-
1967
- 1967-06-26 BE BE700506D patent/BE700506A/xx not_active IP Right Cessation
- 1967-06-28 DE DE19671547810 patent/DE1547810B2/de active Pending
- 1967-06-29 GB GB03027/67D patent/GB1185388A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1547810B2 (de) | 1971-02-25 |
DE1547810A1 (de) | 1969-12-04 |
GB1185388A (en) | 1970-03-25 |
US3497356A (en) | 1970-02-24 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE20 | Patent expired |
Owner name: EASTMAN KODAK CY Effective date: 19870626 |