BE694653A - - Google Patents
Info
- Publication number
- BE694653A BE694653A BE694653DA BE694653A BE 694653 A BE694653 A BE 694653A BE 694653D A BE694653D A BE 694653DA BE 694653 A BE694653 A BE 694653A
- Authority
- BE
- Belgium
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8727/66A GB1116674A (en) | 1966-02-28 | 1966-02-28 | Naphthoquinone diazide sulphofluoride |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BE694653A true BE694653A (US20100056889A1-20100304-C00004.png) | 1967-08-28 |
Family
ID=9858093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BE694653D BE694653A (US20100056889A1-20100304-C00004.png) | 1966-02-28 | 1967-02-27 |
Country Status (7)
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3637384A (en) * | 1969-02-17 | 1972-01-25 | Gaf Corp | Positive-working diazo-oxide terpolymer photoresists |
| US3984250A (en) * | 1970-02-12 | 1976-10-05 | Eastman Kodak Company | Light-sensitive diazoketone and azide compositions and photographic elements |
| NL165852C (nl) * | 1970-09-29 | 1981-05-15 | Hoechst Ag | Werkwijze voor het vervaardigen van een reprografisch kopieermateriaal door een lichtgevoelige laag aan te brengen op een drager. |
| US3890153A (en) * | 1971-03-13 | 1975-06-17 | Philips Corp | Positive-acting napthoquinone diazide photosensitive composition |
| US3920455A (en) * | 1971-05-28 | 1975-11-18 | Polychrome Corp | Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters |
| JPS4833905A (US20100056889A1-20100304-C00004.png) * | 1971-09-02 | 1973-05-15 | ||
| US3900325A (en) * | 1972-06-12 | 1975-08-19 | Shipley Co | Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide |
| US4164421A (en) * | 1972-12-09 | 1979-08-14 | Fuji Photo Film Co., Ltd. | Photocurable composition containing an o-quinonodiazide for printing plate |
| DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
| US4123279A (en) * | 1974-03-25 | 1978-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinonediazide containing planographic printing plate |
| US4259430A (en) * | 1974-05-01 | 1981-03-31 | International Business Machines Corporation | Photoresist O-quinone diazide containing composition and resist mask formation process |
| US4093461A (en) * | 1975-07-18 | 1978-06-06 | Gaf Corporation | Positive working thermally stable photoresist composition, article and method of using |
| US4339522A (en) * | 1979-06-18 | 1982-07-13 | International Business Machines Corporation | Ultra-violet lithographic resist composition and process |
| US4284706A (en) * | 1979-12-03 | 1981-08-18 | International Business Machines Corporation | Lithographic resist composition for a lift-off process |
| US4379830A (en) * | 1981-10-06 | 1983-04-12 | Polychrome Corporation | Developer for positive photolithographic articles |
| GB2127175A (en) * | 1982-09-07 | 1984-04-04 | Letraset International Ltd | Manufacture of signs |
| JPS63265242A (ja) * | 1987-04-23 | 1988-11-01 | Fuji Photo Film Co Ltd | 多色画像形成方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1847513A (en) * | 1932-03-01 | Pbocess pob pbepabing diazonitjm pittoro-sttlphonates | ||
| US807422A (en) * | 1905-09-15 | 1905-12-12 | Kalle And Company Ag | Zinc azonaphthol dye and process of making same. |
| US1444469A (en) * | 1917-05-31 | 1923-02-06 | Firm Of Kalle & Co Ag | Manufacture of light copy paper |
| DE462399C (de) * | 1926-11-12 | 1928-07-10 | Kalle & Co Akt Ges | Verfahren zur Herstellung von Diazolichtbildern unter Anwendung von Metallsalzen |
| NL46296C (US20100056889A1-20100304-C00004.png) * | 1930-02-05 | |||
| US2436697A (en) * | 1944-07-31 | 1948-02-24 | American Cyanamid Co | Sulfofluorides of azoic dyestuffs |
| NL95406C (US20100056889A1-20100304-C00004.png) * | 1954-08-20 | |||
| DE1447015B2 (de) * | 1963-10-03 | 1973-03-15 | Kalle Ag, 6202 Wiesbaden-Biebrich | Lichtempfindliche schichten zur herstellung von druckformen |
-
1966
- 1966-02-28 GB GB8727/66A patent/GB1116674A/en not_active Expired
-
1967
- 1967-02-03 NL NL6701699A patent/NL6701699A/xx unknown
- 1967-02-08 US US614544A patent/US3495979A/en not_active Expired - Lifetime
- 1967-02-09 FR FR94745A patent/FR1511335A/fr not_active Expired
- 1967-02-23 CH CH267267A patent/CH472059A/fr not_active IP Right Cessation
- 1967-02-24 DE DE19671522458 patent/DE1522458A1/de active Pending
- 1967-02-27 BE BE694653D patent/BE694653A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FR1511335A (fr) | 1968-01-26 |
| CH472059A (fr) | 1969-04-30 |
| NL6701699A (US20100056889A1-20100304-C00004.png) | 1967-04-25 |
| GB1116674A (en) | 1968-06-12 |
| US3495979A (en) | 1970-02-17 |
| DE1522458A1 (de) | 1969-07-31 |
