BE689369A - - Google Patents

Info

Publication number
BE689369A
BE689369A BE689369DA BE689369A BE 689369 A BE689369 A BE 689369A BE 689369D A BE689369D A BE 689369DA BE 689369 A BE689369 A BE 689369A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE689369A publication Critical patent/BE689369A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
BE689369D 1965-11-10 1966-11-07 BE689369A (enEXAMPLES)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US507103A US3397672A (en) 1965-11-10 1965-11-10 Control system for vapor-deposition coating apparatus

Publications (1)

Publication Number Publication Date
BE689369A true BE689369A (enEXAMPLES) 1967-05-08

Family

ID=24017264

Family Applications (1)

Application Number Title Priority Date Filing Date
BE689369D BE689369A (enEXAMPLES) 1965-11-10 1966-11-07

Country Status (7)

Country Link
US (1) US3397672A (enEXAMPLES)
BE (1) BE689369A (enEXAMPLES)
DE (1) DE1521573A1 (enEXAMPLES)
ES (1) ES333150A1 (enEXAMPLES)
FR (1) FR1498949A (enEXAMPLES)
GB (1) GB1168813A (enEXAMPLES)
NL (1) NL6615541A (enEXAMPLES)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115491663A (zh) * 2022-11-21 2022-12-20 常州翊迈新材料科技有限公司 燃料电池金属极板涂层设备等离子体在线监控装置

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3636916A (en) * 1966-03-14 1972-01-25 Optical Coating Laboratory Inc Coating apparatus and system
GB1168641A (en) * 1966-05-19 1969-10-29 British Iron Steel Research Formation of Polymer Coatings on Substrates.
FR1534681A (fr) * 1966-06-15 1968-08-02 Michel A Braguier Procédé de métallisation au zinc en continu d'une bande en matière diélectrique
GB1173978A (en) * 1967-11-14 1969-12-10 Edwards High Vaccum Internat L Vacuum Deposition Apparatus
GB1281572A (en) * 1968-11-22 1972-07-12 Vepa Ag Device and method for treating a material length
US3907607A (en) * 1969-07-14 1975-09-23 Corning Glass Works Continuous processing of ribbon material
US3853093A (en) * 1970-01-14 1974-12-10 Optical Coating Laboratory Inc Optical thickness rate monitor
US3709192A (en) * 1970-06-01 1973-01-09 Sierracin Corp Coating control system
DE2345157C2 (de) * 1973-09-07 1975-09-18 August Thyssen-Huette Ag, 4100 Duisburg Vorrichtung zum Abstreifen von Metall beim Feuermetallisieren von Metallbändern
DE3330092A1 (de) * 1983-08-20 1985-03-07 Leybold-Heraeus GmbH, 5000 Köln Verfahren zum einstellen der oertlichen verdampfungsleistung an verdampfern in vakuumaufdampfprozessen
FR2611983A1 (fr) * 1987-04-29 1988-09-09 Vtu Angel Kantchev Circuit d'alimentation electrique pour un evaporateur a faisceau d'electrons
US6652654B1 (en) * 2000-09-27 2003-11-25 Bechtel Bwxt Idaho, Llc System configured for applying multiple modifying agents to a substrate
US6623686B1 (en) 2000-09-28 2003-09-23 Bechtel Bwxt Idaho, Llc System configured for applying a modifying agent to a non-equidimensional substrate
US20050244580A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company Deposition apparatus for temperature sensitive materials
KR20160035053A (ko) * 2013-12-20 2016-03-30 가부시키가이샤 아루박 전자총 장치 및 진공 증착 장치
DE102020200366A1 (de) 2019-04-23 2020-10-29 Sms Group Gmbh PVD Dickenregelung
CN113817992B (zh) * 2021-10-28 2025-02-11 成都天一国泰真空设备有限公司 一种用于真空镀膜机电子枪的电磁铁偏转结构

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2860075A (en) * 1951-01-27 1958-11-11 Continental Can Co Method of making a heater for vacuum deposition
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US2872341A (en) * 1954-09-10 1959-02-03 Int Resistance Co Method of providing an adherent metal coating on a fluorocarbon resin
US2903547A (en) * 1957-08-21 1959-09-08 Continental Can Co Vaporizing element connector and method
US2930879A (en) * 1957-12-16 1960-03-29 New York Air Brake Co Vaporization of metals
DE1156521B (de) * 1961-09-05 1963-10-31 Heraeus Gmbh W C Elektronenstrahlkanone zum Erhitzen von Metallen
US3146335A (en) * 1962-03-29 1964-08-25 United Aircraft Corp Focusing device for electron beams
DE1199097B (de) * 1962-09-25 1965-08-19 Heraeus Gmbh W C Vorrichtung zum Vakuumbedampfen breiter Baender, insbesondere mit Metallen, durch Erhitzen des Verdampfungsgutes mittels Elektronenstrahlen
DE1261971B (de) * 1963-02-13 1968-02-29 United Aircraft Corp Einrichtung zum Schweissen, Schneiden oder zur Materialbearbeitung mittels eines Ladungstraegerstrahls
US3235480A (en) * 1963-04-08 1966-02-15 Electra Mfg Company Thermionic evaporation rate controller
GB1065060A (en) * 1963-04-19 1967-04-12 United Aircraft Corp Improvements in and relating to apparatus for working articles with energised beams
US3235647A (en) * 1963-06-06 1966-02-15 Temescal Metallurgical Corp Electron bombardment heating with adjustable impact pattern
US3244855A (en) * 1963-07-19 1966-04-05 United States Steel Corp System for correcting the shift of an electron-gun beam from the desired region of impingement
US3281265A (en) * 1963-09-17 1966-10-25 United States Steel Corp Method and apparatus for controlling coating thickness by electron beam evaporation
US3276902A (en) * 1963-10-01 1966-10-04 Itt Method of vapor deposition employing an electron beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115491663A (zh) * 2022-11-21 2022-12-20 常州翊迈新材料科技有限公司 燃料电池金属极板涂层设备等离子体在线监控装置

Also Published As

Publication number Publication date
NL6615541A (enEXAMPLES) 1967-05-11
US3397672A (en) 1968-08-20
FR1498949A (fr) 1967-10-20
GB1168813A (en) 1969-10-29
DE1521573A1 (de) 1969-11-06
ES333150A1 (es) 1967-07-16

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