BE681795A - - Google Patents

Info

Publication number
BE681795A
BE681795A BE681795DA BE681795A BE 681795 A BE681795 A BE 681795A BE 681795D A BE681795D A BE 681795DA BE 681795 A BE681795 A BE 681795A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE681795A publication Critical patent/BE681795A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE681795D 1965-06-01 1966-05-31 BE681795A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB23394/65A GB1115245A (en) 1965-06-01 1965-06-01 Method for recording and reproducing information by surface deformation of a polymeric composition

Publications (1)

Publication Number Publication Date
BE681795A true BE681795A (zh) 1966-10-31

Family

ID=10194902

Family Applications (1)

Application Number Title Priority Date Filing Date
BE681795D BE681795A (zh) 1965-06-01 1966-05-31

Country Status (7)

Country Link
US (1) US3615476A (zh)
AT (1) AT275316B (zh)
BE (1) BE681795A (zh)
CH (1) CH465404A (zh)
DE (1) DE1522383A1 (zh)
GB (1) GB1115245A (zh)
NL (1) NL6607507A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3977875A (en) * 1970-03-13 1976-08-31 Ciba-Geigy Ag Method for modifying vesicular images
US3928039A (en) * 1970-03-13 1975-12-23 Ciba Geigy Ag Method for modifying vesicular images
DE2105488A1 (de) * 1971-02-05 1972-08-10 Agfa-Gevaert Ag, 5090 Leverkusen Verfahren zur Herstellung photographischer Bilder
US3841874A (en) * 1971-03-15 1974-10-15 Xidex Corp Method for improving the photographic characteristics of vesicular photographic materials
US3961101A (en) * 1974-09-16 1976-06-01 Rca Corporation Process for improved development of electron-beam-sensitive resist films
GB1512796A (en) * 1974-12-13 1978-06-01 Ibm Image forming process
US5024918A (en) * 1976-12-23 1991-06-18 Texas Instruments Incorporated Heat activated dry development of photoresist by means of active oxygen atmosphere
CA1324015C (en) * 1988-10-06 1993-11-09 Yasuo Yamagishi Method of and apparatus for forming volume type phase hologram

Also Published As

Publication number Publication date
DE1522383A1 (de) 1969-07-17
US3615476A (en) 1971-10-26
AT275316B (de) 1969-10-27
CH465404A (de) 1968-11-15
NL6607507A (zh) 1966-08-25
GB1115245A (en) 1968-05-29

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