BE680536A - - Google Patents

Info

Publication number
BE680536A
BE680536A BE680536DA BE680536A BE 680536 A BE680536 A BE 680536A BE 680536D A BE680536D A BE 680536DA BE 680536 A BE680536 A BE 680536A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE680536A publication Critical patent/BE680536A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
BE680536D 1965-11-24 1966-05-04 BE680536A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1965K0057722 DE1447963B2 (de) 1965-11-24 1965-11-24 Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial

Publications (1)

Publication Number Publication Date
BE680536A true BE680536A (enrdf_load_stackoverflow) 1966-11-04

Family

ID=7228378

Family Applications (1)

Application Number Title Priority Date Filing Date
BE680536D BE680536A (enrdf_load_stackoverflow) 1965-11-24 1966-05-04

Country Status (8)

Country Link
AT (1) AT297757B (enrdf_load_stackoverflow)
BE (1) BE680536A (enrdf_load_stackoverflow)
CH (1) CH463279A (enrdf_load_stackoverflow)
DE (1) DE1447963B2 (enrdf_load_stackoverflow)
ES (1) ES326362A1 (enrdf_load_stackoverflow)
GB (1) GB1154749A (enrdf_load_stackoverflow)
NL (1) NL149298C (enrdf_load_stackoverflow)
SE (1) SE340951B (enrdf_load_stackoverflow)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1513368A (en) 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
DE2855393A1 (de) 1978-12-21 1980-07-03 Hoechst Ag Verfahren zum herstellen von flachdruckformen
DE3110632A1 (de) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
DE3128951A1 (de) * 1981-07-22 1983-02-10 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von fotopolymer-tiefdurckformen
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
DE3246037A1 (de) * 1982-12-09 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
US5084372A (en) * 1982-12-09 1992-01-28 Hoechst Celanese Corporation Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
US4732840A (en) * 1985-03-22 1988-03-22 Fuji Photo Film Co., Ltd. Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups
DE3725741A1 (de) * 1987-08-04 1989-02-16 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3827901A1 (de) * 1988-08-17 1990-02-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
GB8822956D0 (en) * 1988-09-30 1988-11-09 Cookson Graphics Plc Baking treatment of lithographic printing plate
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4004511A1 (de) * 1990-02-14 1991-08-22 Hoechst Ag Vorrichtung zum einbrennen von lichtempfindlichen schichten waehrend der herstellung von druckformen
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4414897A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen
DE4444669A1 (de) 1994-12-15 1996-06-20 Hoechst Ag Strahlungsempfindliches Gemisch
DE19739299A1 (de) * 1997-09-08 1999-03-11 Agfa Gevaert Ag Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck
DE19834745A1 (de) 1998-08-01 2000-02-03 Agfa Gevaert Ag Strahlungsempfindliches Gemisch mit IR-absorbierenden, anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial
DE19834746A1 (de) 1998-08-01 2000-02-03 Agfa Gevaert Ag Strahlungsempfindliches Gemisch mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial
JP4184813B2 (ja) 2002-02-19 2008-11-19 コダックグラフィックコミュニケーションズ株式会社 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法
US7195859B2 (en) 2002-10-04 2007-03-27 Agfa-Gevaert Method of making a lithographic printing plate precursor
US7348126B2 (en) 2004-04-27 2008-03-25 Agfa Graphics N.V. Negative working, heat-sensitive lithographic printing plate precursor
US7354696B2 (en) 2004-07-08 2008-04-08 Agfa Graphics Nv Method for making a lithographic printing plate
US7195861B2 (en) 2004-07-08 2007-03-27 Agfa-Gevaert Method for making a negative working, heat-sensitive lithographic printing plate precursor
US7425405B2 (en) 2004-07-08 2008-09-16 Agfa Graphics, N.V. Method for making a lithographic printing plate
EP2159049B1 (en) 2008-09-02 2012-04-04 Agfa Graphics N.V. A heat-sensitive positive-working lithographic printing plate precursor
EP2213690B1 (en) 2009-01-30 2015-11-11 Agfa Graphics N.V. A new alkali soluble resin
ES2381535T3 (es) 2009-06-18 2012-05-29 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
EP2329951B1 (en) 2009-12-04 2012-06-20 AGFA Graphics NV A lithographic printing plate precursor
ES2395993T3 (es) 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
CN103328214B (zh) 2011-01-25 2015-06-17 爱克发印艺公司 平版印刷版前体
EP2489512B1 (en) 2011-02-18 2013-08-28 Agfa Graphics N.V. A lithographic printing plate precursor
US9562129B2 (en) 2013-01-01 2017-02-07 Agfa Graphics Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
EP3170662B1 (en) 2015-11-20 2019-08-14 Agfa Nv A lithographic printing plate precursor

Also Published As

Publication number Publication date
GB1154749A (en) 1969-06-11
DE1447963A1 (de) 1968-11-14
CH463279A (de) 1968-09-30
DE1447963B2 (de) 1972-09-07
NL6606131A (enrdf_load_stackoverflow) 1967-05-25
NL149298C (nl) 1982-09-16
ES326362A1 (es) 1967-03-01
NL149298B (nl) 1976-04-15
AT297757B (de) 1972-04-10
SE340951B (enrdf_load_stackoverflow) 1971-12-06

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Legal Events

Date Code Title Description
RE20 Patent expired

Owner name: HOECHST A.G.

Effective date: 19860504