BE642664A - - Google Patents
Info
- Publication number
- BE642664A BE642664A BE642664A BE642664A BE642664A BE 642664 A BE642664 A BE 642664A BE 642664 A BE642664 A BE 642664A BE 642664 A BE642664 A BE 642664A BE 642664 A BE642664 A BE 642664A
- Authority
- BE
- Belgium
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/002—Inhomogeneous material in general
- H01B3/004—Inhomogeneous material in general with conductive additives or conductive layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0346—Deburring, rounding, bevelling or smoothing conductor edges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/07—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process being removed electrolytically
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Weting (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Surface Treatment Of Glass (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US252628A US3314869A (en) | 1963-01-21 | 1963-01-21 | Method of manufacturing multilayer microcircuitry including electropolishing to smooth film conductors |
Publications (1)
Publication Number | Publication Date |
---|---|
BE642664A true BE642664A (nl) | 1964-05-15 |
Family
ID=22956844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE642664A BE642664A (nl) | 1963-01-21 | 1964-01-17 |
Country Status (5)
Country | Link |
---|---|
US (1) | US3314869A (nl) |
BE (1) | BE642664A (nl) |
CH (1) | CH425924A (nl) |
DE (1) | DE1258941B (nl) |
GB (1) | GB1053162A (nl) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3418227A (en) * | 1966-03-31 | 1968-12-24 | Texas Instruments Inc | Process for fabricating multiple layer circuit boards |
US3519543A (en) * | 1967-10-27 | 1970-07-07 | Talon Inc | Process for electrolytically cleaning and polishing electrical contacts |
FR2350697A1 (fr) * | 1976-05-06 | 1977-12-02 | Cii | Structure perfectionnee de circuits multicouches |
US4078980A (en) * | 1976-10-01 | 1978-03-14 | National Semiconductor Corporation | Electrolytic chromium etching of chromium-layered semiconductor |
US4139434A (en) * | 1978-01-30 | 1979-02-13 | General Dynamics Corporation | Method of making circuitry with bump contacts |
DE2834221C3 (de) * | 1978-08-04 | 1981-04-30 | Preh Elektrofeinmechanische Werke Jakob Preh Nachf. GmbH & Co, 8740 Bad Neustadt | Verfahren zur Herstellung von Dünnschichtleiterbahnen |
DE4406397A1 (de) * | 1994-02-26 | 1995-08-31 | Curamik Electronics Gmbh | Substrat für elektrische Schaltkreise sowie Verfahren zum Herstellen des Substrates |
US7150820B2 (en) * | 2003-09-22 | 2006-12-19 | Semitool, Inc. | Thiourea- and cyanide-free bath and process for electrolytic etching of gold |
DE102006008261A1 (de) * | 2006-02-22 | 2007-08-30 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Ätzlösung und Verfahren zur Strukturierung eines UBM-Schichtsystems |
JP2015133167A (ja) * | 2015-04-22 | 2015-07-23 | 大日本印刷株式会社 | サスペンション用基板、サスペンション、素子付サスペンション、およびハードディスクドライブ |
KR20210069469A (ko) * | 2019-12-03 | 2021-06-11 | 삼성전자주식회사 | 알루미늄 가공물의 표면 무늬 형성 방법 |
CN111560617A (zh) * | 2020-06-22 | 2020-08-21 | 陕西凯利清洗有限公司 | 一种新型循环水清洗预膜剂的制备方法与使用方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA450899A (en) * | 1948-08-31 | The Himmel Brothers Company | Electropolishing electrolyte | |
US2591042A (en) * | 1947-01-08 | 1952-04-01 | Conmar Prod Corp | Apparatus for electrolytic treatment of spaced metallic elements |
US2610144A (en) * | 1947-02-08 | 1952-09-09 | Oneida Ltd | Method of electropolishing |
NL176250B (nl) * | 1952-02-26 | Owens Corning Fiberglass Corp | Inrichting voor het vormen van korrels uit een glasgemeng. | |
US2726200A (en) * | 1952-06-07 | 1955-12-06 | Kemart Corp | Lithographic plates and method of preparing |
GB728606A (en) * | 1952-08-28 | 1955-04-20 | Technograph Printed Circuits L | Electric resistance devices |
US2758074A (en) * | 1953-08-26 | 1956-08-07 | Rca Corp | Printed circuits |
US2784155A (en) * | 1954-04-12 | 1957-03-05 | Eastman Kodak Co | Electrolytic process for removing machining burrs from metal articles |
US2900580A (en) * | 1954-06-04 | 1959-08-18 | Beck S Inc | Printed electrical circuit components having integral lead-outs and methods of making same |
US2971176A (en) * | 1956-01-16 | 1961-02-07 | Eisler Paul | Production of electrical components from metal foils, semi-conductors and insulating films or sheets |
US3130134A (en) * | 1957-01-09 | 1964-04-21 | Ibm | Plated circuit magnetic core array |
GB892451A (en) * | 1957-12-03 | 1962-03-28 | Radio And Allied Ind Ltd | Improvements in and relating to the manufacture of printed circuits |
GB874965A (en) * | 1958-07-09 | 1961-08-16 | G V Planer Ltd | Improvements in or relating to electrical circuits or circuit elements |
US3058895A (en) * | 1958-11-10 | 1962-10-16 | Anocut Eng Co | Electrolytic shaping |
US3174920A (en) * | 1961-06-09 | 1965-03-23 | Post Daniel | Method for producing electrical resistance strain gages by electropolishing |
-
0
- GB GB1053162D patent/GB1053162A/en active Active
-
1963
- 1963-01-21 US US252628A patent/US3314869A/en not_active Expired - Lifetime
-
1964
- 1964-01-17 DE DEJ25134A patent/DE1258941B/de active Pending
- 1964-01-17 BE BE642664A patent/BE642664A/xx unknown
- 1964-01-20 CH CH62664A patent/CH425924A/de unknown
Also Published As
Publication number | Publication date |
---|---|
GB1053162A (nl) | |
US3314869A (en) | 1967-04-18 |
DE1258941B (de) | 1968-01-18 |
CH425924A (de) | 1966-12-15 |