BE623971A - - Google Patents
Info
- Publication number
- BE623971A BE623971A BE623971DA BE623971A BE 623971 A BE623971 A BE 623971A BE 623971D A BE623971D A BE 623971DA BE 623971 A BE623971 A BE 623971A
- Authority
- BE
- Belgium
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B13/00—Preparation of cellulose ether-esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B3/00—Preparation of cellulose esters of organic acids
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B3/00—Preparation of cellulose esters of organic acids
- C08B3/08—Preparation of cellulose esters of organic acids of monobasic organic acids with three or more carbon atoms, e.g. propionate or butyrate
- C08B3/10—Preparation of cellulose esters of organic acids of monobasic organic acids with three or more carbon atoms, e.g. propionate or butyrate with five or more carbon-atoms, e.g. valerate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B3/00—Preparation of cellulose esters of organic acids
- C08B3/16—Preparation of mixed organic cellulose esters, e.g. cellulose aceto-formate or cellulose aceto-propionate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B31/00—Preparation of derivatives of starch
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/109—Polyester
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US146742A US3257664A (en) | 1961-10-23 | 1961-10-23 | Light-sensitive polymers |
Publications (1)
Publication Number | Publication Date |
---|---|
BE623971A true BE623971A (nl) |
Family
ID=22518800
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE623971D BE623971A (nl) | 1961-10-23 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3257664A (nl) |
BE (1) | BE623971A (nl) |
DE (1) | DE1283673B (nl) |
GB (1) | GB949919A (nl) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3445545A (en) * | 1966-12-12 | 1969-05-20 | Nat Starch Chem Corp | Ethylenically unsaturated derivatives of cinnamic acid and light resistant polymers prepared therefrom |
US4486526A (en) * | 1969-05-29 | 1984-12-04 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated phenol-blocked isocyanate polyurethane materials |
US4330611A (en) * | 1969-05-29 | 1982-05-18 | Richardson Graphics Company | Lithographic plate and photoresist having photosensitive layers of diazo and cinnamoylated polyvinyl alcohol materials |
US3647446A (en) * | 1970-03-05 | 1972-03-07 | Eastman Kodak Co | Process for preparing high-relief printing plates |
JPS4919643B1 (nl) * | 1970-11-14 | 1974-05-18 | ||
US3881935A (en) * | 1971-01-07 | 1975-05-06 | Powers Chemco Inc | Photosensitive polymer composition |
JPS49103975A (nl) * | 1973-02-02 | 1974-10-02 | ||
CA1099849A (en) * | 1976-08-02 | 1981-04-21 | Robert C. Daly | Acid-resistant copolymer and photographic element incorporating same |
US4152159A (en) * | 1977-06-03 | 1979-05-01 | Eastman Kodak Company | Acid-resistant copolymer and photographic element incorporating same |
JPS54135525A (en) * | 1978-04-12 | 1979-10-20 | Konishiroku Photo Ind Co Ltd | Photosensitive material |
US4229514A (en) * | 1978-12-29 | 1980-10-21 | Konishiroku Photo Industry Co., Ltd. | Photosensitive composition |
USRE31309E (en) * | 1979-07-18 | 1983-07-12 | E. I. Du Pont De Nemours And Company | High solids ambient temperature curing coatings of acrylic-fatty acid drying oil resins |
US4242243A (en) * | 1979-07-18 | 1980-12-30 | E. I. Du Pont De Nemours And Company | High solids ambient temperature curing coatings of acrylic-fatty acid drying oil resins |
US4983670A (en) * | 1988-12-20 | 1991-01-08 | Allied-Signal Inc. | Cellulose acetate bound photosensitizer for producing singlet oxygen |
US5266441A (en) * | 1989-07-29 | 1993-11-30 | Canon Kabushiki Kaisha | Image forming medium and image forming method |
DE4038895C2 (de) * | 1990-12-06 | 1998-07-02 | Harald Dr Mueller | Licht- und strahlungsempfindliche Gemische |
US5990193A (en) * | 1995-12-12 | 1999-11-23 | University Of Pittsburgh | Polymers for reversible photoinduced sol gel transitions |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2670287A (en) * | 1951-01-20 | 1954-02-23 | Eastman Kodak Co | Photosensitization of polymeric cinnamic acid esters |
US2725372A (en) * | 1951-01-20 | 1955-11-29 | Eastman Kodak Co | Light sensitive unsaturated esters of polyvinyl alcohol |
US2670286A (en) * | 1951-01-20 | 1954-02-23 | Eastman Kodak Co | Photosensitization of polymeric cinnamic acid esters |
US2666701A (en) * | 1952-10-15 | 1954-01-19 | Eastman Kodak Co | Optical sensitization of photomechanical resists |
US2941988A (en) * | 1956-04-02 | 1960-06-21 | Olin Mathieson | Process for the alkoxylation of polyvinyl alcohol |
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0
- BE BE623971D patent/BE623971A/xx unknown
-
1961
- 1961-10-23 US US146742A patent/US3257664A/en not_active Expired - Lifetime
-
1962
- 1962-10-02 DE DEE23622A patent/DE1283673B/de active Pending
- 1962-10-23 GB GB40184/62A patent/GB949919A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB949919A (en) | 1964-02-19 |
US3257664A (en) | 1966-06-21 |
DE1283673B (de) | 1969-02-20 |