|
BE606888A
(da)
*
|
1960-08-05 |
1900-01-01 |
|
|
|
US3382069A
(en)
*
|
1964-06-18 |
1968-05-07 |
Azoplate Corp |
Planographic printing plate
|
|
US3778270A
(en)
*
|
1970-11-12 |
1973-12-11 |
Du Pont |
Photosensitive bis-diazonium salt compositions and elements
|
|
GB1347759A
(en)
*
|
1971-06-17 |
1974-02-27 |
Howson Algraphy Ltd |
Light sensitive materials
|
|
US3847614A
(en)
*
|
1971-09-13 |
1974-11-12 |
Scott Paper Co |
Diazo photopolymer composition and article comprising carboxylated resin
|
|
DE2641099A1
(de)
*
|
1976-09-13 |
1978-03-16 |
Hoechst Ag |
Lichtempfindliche kopierschicht
|
|
US4132553A
(en)
*
|
1977-03-24 |
1979-01-02 |
Polychrome Corporation |
Color proofing guide
|
|
US4408532A
(en)
*
|
1980-04-30 |
1983-10-11 |
Minnesota Mining And Manufacturing Company |
Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer
|
|
US4401743A
(en)
*
|
1980-04-30 |
1983-08-30 |
Minnesota Mining And Manufacturing Company |
Aqueous developable photosensitive composition and printing plate
|
|
US4326020A
(en)
*
|
1980-09-10 |
1982-04-20 |
Polychrome Corporation |
Method of making positive acting diazo lithographic printing plate
|
|
US4403028A
(en)
*
|
1981-01-26 |
1983-09-06 |
Andrews Paper & Chemical Co., Inc. |
Light sensitive diazonium salts and diazotype materials
|
|
US4533619A
(en)
*
|
1982-03-18 |
1985-08-06 |
American Hoechst Corporation |
Acid stabilizers for diazonium compound condensation products
|
|
DE3308395A1
(de)
*
|
1983-03-09 |
1984-09-13 |
Hoechst Ag, 6230 Frankfurt |
Zweikomponenten-diazotypiematerial
|
|
JPS603632A
(ja)
*
|
1983-06-21 |
1985-01-10 |
Fuji Photo Film Co Ltd |
感光性平版印刷版
|
|
DE3541723A1
(de)
*
|
1985-11-26 |
1987-05-27 |
Hoechst Ag |
Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt
|
|
JPH0693116B2
(ja)
*
|
1986-01-21 |
1994-11-16 |
富士写真フイルム株式会社 |
感光性組成物
|
|
US5290666A
(en)
*
|
1988-08-01 |
1994-03-01 |
Hitachi, Ltd. |
Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt
|
|
JP2768692B2
(ja)
*
|
1988-08-01 |
1998-06-25 |
株式会社日立製作所 |
感放射線組成物及びパターン形成方法
|
|
US5002856A
(en)
*
|
1989-08-02 |
1991-03-26 |
E. I. Du Pont De Nemours And Company |
Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid
|
|
US5200291A
(en)
*
|
1989-11-13 |
1993-04-06 |
Hoechst Celanese Corporation |
Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
|
|
US5219711A
(en)
*
|
1990-04-10 |
1993-06-15 |
E. I. Du Pont De Nemours And Company |
Positive image formation utilizing resist material with carbazole diazonium salt acid generator
|
|
US5370965A
(en)
*
|
1991-12-10 |
1994-12-06 |
Fuji Photo Film Co., Ltd. |
Positive-working light-sensitive composition containing diazonium salt and novolak resin
|
|
EP4321547A1
(en)
*
|
2022-08-12 |
2024-02-14 |
Prefere Resins Holding GmbH |
Crosslinkable systems
|