BE569763A - - Google Patents

Info

Publication number
BE569763A
BE569763A BE569763DA BE569763A BE 569763 A BE569763 A BE 569763A BE 569763D A BE569763D A BE 569763DA BE 569763 A BE569763 A BE 569763A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE569763A publication Critical patent/BE569763A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
BE569763D 1957-08-01 BE569763A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK32598A DE1053930B (de) 1957-08-01 1957-08-01 Lichtempfindliches Material fuer die Herstellung von Druckplatten auf photomechanischem Wege

Publications (1)

Publication Number Publication Date
BE569763A true BE569763A (da)

Family

ID=7219491

Family Applications (1)

Application Number Title Priority Date Filing Date
BE569763D BE569763A (da) 1957-08-01

Country Status (8)

Country Link
US (1) US3050387A (da)
BE (1) BE569763A (da)
CH (1) CH370967A (da)
DE (1) DE1053930B (da)
FR (1) FR1210042A (da)
GB (1) GB836341A (da)
NL (2) NL230099A (da)
SE (1) SE310842B (da)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0388484A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Hochauflösender Photoresist
EP0388483A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Verfahren zum Erzeugen einer Photoresiststruktur

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL130712C (da) * 1959-07-29
NL130926C (da) * 1959-09-04
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE613039A (da) * 1961-01-25
NL280959A (da) * 1961-07-28
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
US5212042A (en) * 1989-08-22 1993-05-18 Fuji Photo Film Co., Ltd. Positive type light-sensitive composition

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1981102A (en) * 1932-08-10 1934-11-20 Agfa Ansco Corp Photographic material and process of making the same
CH307356A (de) * 1951-08-08 1955-05-31 Kalle & Co Ag Lichtempfindliches Material für die photomechanische Reproduktion.
US2754209A (en) * 1952-06-10 1956-07-10 Azoplate Corp Light-sensitive para quinone diazides for making printing plates
DE1003576B (de) * 1955-02-25 1957-02-28 Kalle & Co Ag Aus Schichttraeger und lichtempfindlicher, wasserloeslicher oder wasserquellbarer Kolloidschicht bestehendes Material fuer die Herstellung von Gerbbildern
NL204620A (da) * 1955-02-25

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0388484A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Hochauflösender Photoresist
EP0388483A1 (de) * 1989-03-20 1990-09-26 Siemens Aktiengesellschaft Verfahren zum Erzeugen einer Photoresiststruktur

Also Published As

Publication number Publication date
NL103895C (da)
SE310842B (da) 1969-05-12
DE1053930B (de) 1959-03-26
FR1210042A (fr) 1960-03-04
GB836341A (en) 1960-06-01
US3050387A (en) 1962-08-21
NL230099A (da)
CH370967A (de) 1963-07-31

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