BE611541A - - Google Patents

Info

Publication number
BE611541A
BE611541A BE611541DA BE611541A BE 611541 A BE611541 A BE 611541A BE 611541D A BE611541D A BE 611541DA BE 611541 A BE611541 A BE 611541A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE611541A publication Critical patent/BE611541A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2022Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
BE611541D 1961-01-13 BE611541A (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82413A US3144331A (en) 1961-01-13 1961-01-13 Process for conditioning photopolymerizable elements

Publications (1)

Publication Number Publication Date
BE611541A true BE611541A (fi)

Family

ID=22171053

Family Applications (1)

Application Number Title Priority Date Filing Date
BE611541D BE611541A (fi) 1961-01-13

Country Status (6)

Country Link
US (1) US3144331A (fi)
BE (1) BE611541A (fi)
DE (1) DE1214085B (fi)
FR (1) FR1317386A (fi)
GB (1) GB931368A (fi)
NL (1) NL273451A (fi)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3287130A (en) * 1964-08-25 1966-11-22 Rauland Corp Process of cathode-ray tube screening comprising a backward exposure step
US3380825A (en) * 1964-11-27 1968-04-30 Du Pont Process for producing images
US3547633A (en) * 1966-10-03 1970-12-15 Hughes Aircraft Co Photochemical polymer intensification process
US3549366A (en) * 1967-02-16 1970-12-22 Hughes Aircraft Co Ultraviolet hardening of photosensitized polyacrylamide and products
US3727233A (en) * 1969-11-06 1973-04-10 Gijutsuin K Int Trade Ind Method of recording an electronic image
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US4323636A (en) * 1971-04-01 1982-04-06 E. I. Du Pont De Nemours And Company Photosensitive block copolymer composition and elements
US3859091A (en) * 1971-09-08 1975-01-07 Grace W R & Co Preparation of printing or pattern plates
US3784378A (en) * 1971-10-18 1974-01-08 Du Pont Double-exposure method for producing reverse images in photopolymers
US3787211A (en) * 1971-12-10 1974-01-22 Basf Ag Makeready foil for relief printing
US4207112A (en) * 1974-01-29 1980-06-10 Fuji Photo Film Co., Ltd. Heat developable light-sensitive materials
US3953621A (en) * 1974-03-21 1976-04-27 Gte Sylvania Incorporated Process of forming cathode ray tube screens
NL7908327A (nl) * 1979-11-14 1981-06-16 Stork Screens Bv Werkwijze en inrichting voor het vervaardigen van een gedessineerde drukwals.
US4291118A (en) * 1979-12-26 1981-09-22 W. R. Grace & Co. Relief imaging liquids
US4308337A (en) * 1980-03-10 1981-12-29 Rca Corporation Uniform light exposure of positive photoresist for replicating spiral groove in plastic substrate
US4576892A (en) * 1980-07-28 1986-03-18 Polychrome Corporation Photosensitive materials
US4423135A (en) * 1981-01-28 1983-12-27 E. I. Du Pont De Nemours & Co. Preparation of photosensitive block copolymer elements
US4482624A (en) * 1983-02-15 1984-11-13 The Mead Corporation Photosensitive material employing encapsulated radiation sensitive composition and process for improving sensitivity by sequestering oxygen
US4528261A (en) * 1983-03-28 1985-07-09 E. I. Du Pont De Nemours And Company Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards
DE3510219A1 (de) * 1985-03-21 1986-09-25 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung eines photopolymerisierbaren aufzeichnungsmaterials
US4931380A (en) * 1985-07-18 1990-06-05 Microsi, Inc. Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist
US4716097A (en) * 1986-02-03 1987-12-29 E. I. Du Pont De Nemours And Company Increased photopolymer photospeed employing yellow light preexposure
DE4011023A1 (de) * 1990-04-05 1991-10-10 Hoechst Ag Nachbehandlungsgeraet fuer druckplatten
DE4225829A1 (de) * 1992-08-05 1994-02-10 Hoechst Ag Vorbehandlungseinrichtung für bildmäßig zu belichtende Druckformen
DE4225828A1 (de) * 1992-08-05 1994-02-10 Hoechst Ag Laserbelichtungsgerät für bildmäßig zu belichtende Druckformen
DE4225831A1 (de) * 1992-08-05 1994-02-10 Hoechst Ag Nachbehandlungsgerät für bildmäßig belichtete Druckplatten
AU3119397A (en) * 1996-05-16 1997-12-05 Napp Systems Inc. Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor
US6903809B2 (en) * 2003-05-29 2005-06-07 Perkinelmer, Inc. Integrated, in-line bumping and exposure system
US7470386B2 (en) * 2004-04-26 2008-12-30 Sipix Imaging, Inc. Roll-to-roll embossing tools and processes
US7632625B2 (en) * 2004-05-25 2009-12-15 Roberts David H Method of pre-exposing relief image printing plate
US8236479B2 (en) * 2008-01-23 2012-08-07 E I Du Pont De Nemours And Company Method for printing a pattern on a substrate
US20090191482A1 (en) * 2008-01-30 2009-07-30 E.I. Du Pont De Nemours And Company Device and method for preparing relief printing form
US8241835B2 (en) 2008-01-30 2012-08-14 E I Du Pont De Nemours And Company Device and method for preparing relief printing form
WO2011002967A1 (en) 2009-07-02 2011-01-06 E. I. Du Pont De Nemours And Company Method for printing a material onto a substrate
EP2748678B1 (en) 2011-08-26 2018-07-04 E. I. du Pont de Nemours and Company Method for preparing a relief printing form
US9097974B2 (en) 2012-08-23 2015-08-04 E I Du Pont De Nemours And Company Method for preparing a relief printing form

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE525225A (fi) * 1951-08-20
US2703756A (en) * 1951-12-12 1955-03-08 Gen Aniline & Film Corp Vesicular prints and process of making same
GB860165A (en) * 1956-11-28 1961-02-01 Polaroid Corp Improvements relating to photographic methods and apparatus
US2964401A (en) * 1957-02-18 1960-12-13 Du Pont Photopolymerizable elements and processes

Also Published As

Publication number Publication date
DE1214085B (de) 1966-04-07
NL273451A (fi)
GB931368A (en) 1963-07-17
US3144331A (en) 1964-08-11
FR1317386A (fr) 1963-02-08

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