BE605794A - Method of attacking semiconductor elements - Google Patents

Method of attacking semiconductor elements

Info

Publication number
BE605794A
BE605794A BE605794A BE605794A BE605794A BE 605794 A BE605794 A BE 605794A BE 605794 A BE605794 A BE 605794A BE 605794 A BE605794 A BE 605794A BE 605794 A BE605794 A BE 605794A
Authority
BE
Belgium
Prior art keywords
attacking
semiconductor elements
semiconductor
elements
attacking semiconductor
Prior art date
Application number
BE605794A
Other languages
French (fr)
Inventor
Edwin James Pritchard
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of BE605794A publication Critical patent/BE605794A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/32—Alkaline compositions
    • C23F1/40—Alkaline compositions for etching other metallic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
BE605794A 1960-07-06 1961-07-05 Method of attacking semiconductor elements BE605794A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US4104260A 1960-07-06 1960-07-06

Publications (1)

Publication Number Publication Date
BE605794A true BE605794A (en) 1961-11-03

Family

ID=21914413

Family Applications (1)

Application Number Title Priority Date Filing Date
BE605794A BE605794A (en) 1960-07-06 1961-07-05 Method of attacking semiconductor elements

Country Status (5)

Country Link
BE (1) BE605794A (en)
CH (1) CH429364A (en)
DE (1) DE1214511B (en)
GB (1) GB909228A (en)
NL (2) NL132314C (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3356500A (en) * 1964-09-28 1967-12-05 Santa Barbara Res Ct Production of infrared detector patterns
DE1544281C3 (en) * 1966-03-04 1975-04-03 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for doping silicon semiconductor material
CN114316990B (en) * 2021-12-09 2023-04-07 湖北兴福电子材料股份有限公司 Germanium etching solution with high etching cone angle

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL192840A (en) * 1954-12-01
DE1058333B (en) * 1954-12-01 1959-05-27 Philips Nv Process for etching the surface of a semiconducting body made of a telluride of a divalent metal

Also Published As

Publication number Publication date
CH429364A (en) 1967-01-31
DE1214511B (en) 1966-04-14
NL266770A (en)
GB909228A (en) 1962-10-31
NL132314C (en)

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