BE605776A - - Google Patents

Info

Publication number
BE605776A
BE605776A BE605776DA BE605776A BE 605776 A BE605776 A BE 605776A BE 605776D A BE605776D A BE 605776DA BE 605776 A BE605776 A BE 605776A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of BE605776A publication Critical patent/BE605776A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE605776D 1960-09-26 BE605776A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58170A US3157501A (en) 1960-09-26 1960-09-26 Production of dyed polymeric images

Publications (1)

Publication Number Publication Date
BE605776A true BE605776A (zh)

Family

ID=22015129

Family Applications (1)

Application Number Title Priority Date Filing Date
BE605776D BE605776A (zh) 1960-09-26

Country Status (4)

Country Link
US (1) US3157501A (zh)
BE (1) BE605776A (zh)
DE (1) DE1260975B (zh)
GB (1) GB980286A (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL134367C (zh) * 1965-07-06
GB1123103A (en) * 1966-08-22 1968-08-14 Agfa Gevaert Nv Process for the photopolymerisation of ethylenically unsaturated monomers
US4036644A (en) * 1973-03-16 1977-07-19 International Business Machines Corporation Photoresist process and photosensitive O-quinone diazide article with aliphatic carboxylic acid as adhesion promotor
FR2221754A1 (en) * 1973-03-16 1974-10-11 Ibm Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
US4259421A (en) * 1979-06-04 1981-03-31 Rca Corporation Improving etch-resistance of casein-based photoresist pattern
JPS60191237A (ja) * 1984-03-13 1985-09-28 Asahi Chem Ind Co Ltd 露光硬化後非粘着性感光性樹脂組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2344785A (en) * 1940-08-03 1944-03-21 Dow Chemical Co Photopolymerization method
US2635536A (en) * 1947-08-07 1953-04-21 Du Pont Mordanting
US2864700A (en) * 1951-03-17 1958-12-16 Mondiacolor Photomechanical method for preparing multicolor mosaic carriers for additive color photography and cinematography
US2969731A (en) * 1954-05-24 1961-01-31 Unexposed area
GB810261A (en) * 1955-01-13 1959-03-11 Sandoz Ltd Dyeing and printing pastes
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
US2848296A (en) * 1955-11-17 1958-08-19 Goodrich Co B F Process for the basic dyeing of vinylidene cyanide interpolymers
US2927021A (en) * 1956-03-27 1960-03-01 Horizons Inc Method of producing a relief image
US3029145A (en) * 1960-06-09 1962-04-10 Gen Aniline & Film Corp Preparation of polymer resist images

Also Published As

Publication number Publication date
DE1260975B (de) 1968-02-08
US3157501A (en) 1964-11-17
GB980286A (en) 1965-01-13

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