BE536020A - - Google Patents
Info
- Publication number
- BE536020A BE536020A BE536020DA BE536020A BE 536020 A BE536020 A BE 536020A BE 536020D A BE536020D A BE 536020DA BE 536020 A BE536020 A BE 536020A
- Authority
- BE
- Belgium
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C11/00—Alloys based on lead
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/36—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S420/00—Alloys or metallic compositions
- Y10S420/903—Semiconductive
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL337946X | 1954-02-27 | ||
NL240654X | 1954-06-24 | ||
NL140954X | 1954-09-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE536020A true BE536020A (is) |
Family
ID=27351258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE536020D BE536020A (is) | 1954-02-27 |
Country Status (7)
Country | Link |
---|---|
US (2) | US3078397A (is) |
BE (1) | BE536020A (is) |
CH (1) | CH337946A (is) |
DE (1) | DE1036392B (is) |
FR (1) | FR1128423A (is) |
GB (1) | GB803017A (is) |
NL (10) | NL185470B (is) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1219240B (de) * | 1960-05-25 | 1966-06-16 | Philips Nv | Verfahren zur Herstellung von Halbleitervorrichtungen unter Verwendung eines Elektrodenmaterials auf Indium-, Zinn-, Blei- oder Wismut-Basis |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL131155C (is) * | 1958-02-22 | |||
NL242895A (is) * | 1958-09-02 | |||
NL252974A (is) * | 1959-07-24 | |||
NL258171A (is) * | 1959-11-27 | |||
DE1128047B (de) * | 1959-11-30 | 1962-04-19 | Akad Wissenschaften Ddr | Verfahren zum Herstellen von sperrschicht-freien Kontakten auf einem Kristall aus einer halbleitenden A B-Verbindung durch Aufdampfen von Aluminium |
GB985864A (en) * | 1960-08-05 | 1965-03-10 | Telefunken Patent | A semiconductor device |
NL270339A (is) * | 1960-10-20 | |||
US3240980A (en) * | 1961-01-03 | 1966-03-15 | Sylvania Electric Prod | Spark gap socket |
NL274847A (is) * | 1961-02-16 | |||
DE1178520B (de) * | 1961-08-24 | 1964-09-24 | Philips Patentverwaltung | Legierungsverfahren zur Herstellung von Halbleiteranordnungen |
BE624228A (is) * | 1961-10-31 | |||
US3258371A (en) * | 1962-02-01 | 1966-06-28 | Semiconductor Res Found | Silicon semiconductor device for high frequency, and method of its manufacture |
US3307088A (en) * | 1962-03-13 | 1967-02-28 | Fujikawa Kyoichi | Silver-lead alloy contacts containing dopants for semiconductors |
DE1163977B (de) * | 1962-05-15 | 1964-02-27 | Intermetall | Sperrfreier Kontakt an einer Zone des Halbleiterkoerpers eines Halbleiterbauelementes |
DE1295697B (de) * | 1962-05-23 | 1969-05-22 | Walter Brandt Gmbh | Halbleiterbauelement und Verfahren zu seiner Herstellung |
DE1292258B (de) * | 1962-09-21 | 1969-04-10 | Siemens Ag | Verfahren zum Herstellen eines hoeheren Dotierungsgrades in Halbleitermaterialien, als ihn die Loeslichkeit eines Fremdstoffes im Halbleitermaterial zulaesst |
US3249831A (en) * | 1963-01-04 | 1966-05-03 | Westinghouse Electric Corp | Semiconductor controlled rectifiers with a p-n junction having a shallow impurity concentration gradient |
GB1074284A (en) * | 1963-01-09 | 1967-07-05 | Mullard Ltd | Improvements in and relating to semiconductor devices |
NL298354A (is) * | 1963-03-29 | |||
US3255056A (en) * | 1963-05-20 | 1966-06-07 | Rca Corp | Method of forming semiconductor junction |
US3354365A (en) * | 1964-10-29 | 1967-11-21 | Texas Instruments Inc | Alloy contact containing aluminum and tin |
US3416979A (en) * | 1964-08-31 | 1968-12-17 | Matsushita Electric Ind Co Ltd | Method of making a variable capacitance silicon diode with hyper abrupt junction |
US3515953A (en) * | 1967-03-21 | 1970-06-02 | Rca Corp | Adaptive diode having mobile doping impurities |
US4891284A (en) * | 1988-09-27 | 1990-01-02 | International Lead Zinc Research Organization, Inc. | Lead-aluminum material |
US5248476A (en) * | 1992-04-30 | 1993-09-28 | The Indium Corporation Of America | Fusible alloy containing bismuth, indium, lead, tin and gallium |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2589658A (en) * | 1948-06-17 | 1952-03-18 | Bell Telephone Labor Inc | Semiconductor amplifier and electrode structures therefor |
US2569347A (en) * | 1948-06-26 | 1951-09-25 | Bell Telephone Labor Inc | Circuit element utilizing semiconductive material |
US2697269A (en) * | 1950-07-24 | 1954-12-21 | Bell Telephone Labor Inc | Method of making semiconductor translating devices |
US2836522A (en) * | 1952-11-15 | 1958-05-27 | Rca Corp | Junction type semiconductor device and method of its manufacture |
BE525428A (is) * | 1952-12-30 | |||
US2719253A (en) * | 1953-02-11 | 1955-09-27 | Bradley Mining Company | Nonlinear conduction elements |
US2781480A (en) * | 1953-07-31 | 1957-02-12 | Rca Corp | Semiconductor rectifiers |
US2802159A (en) * | 1953-10-20 | 1957-08-06 | Hughes Aircraft Co | Junction-type semiconductor devices |
DE1012696B (de) * | 1954-07-06 | 1957-07-25 | Siemens Ag | Halbleiteruebergang zwischen Zonen verschiedenen Leitungstypus und Verfahren zur Herstellung des UEberganges |
US2784300A (en) * | 1954-12-29 | 1957-03-05 | Bell Telephone Labor Inc | Method of fabricating an electrical connection |
-
0
- NL NL98710D patent/NL98710C/xx active
- BE BE536020D patent/BE536020A/xx unknown
- NL NLAANVRAGE8801151,A patent/NL188679B/xx unknown
- NL NL98717D patent/NL98717C/xx active
- NL NL190760D patent/NL190760A/xx unknown
- NL NL94467D patent/NL94467C/xx active
- NL NL190762D patent/NL190762A/xx unknown
- NL NL98719D patent/NL98719C/xx active
- NL NL98718D patent/NL98718C/xx active
- NL NL190761D patent/NL190761A/xx unknown
- NL NLAANVRAGE7704331,A patent/NL185470B/xx unknown
-
1955
- 1955-02-21 US US489644A patent/US3078397A/en not_active Expired - Lifetime
- 1955-02-23 DE DEN10247A patent/DE1036392B/de active Pending
- 1955-02-24 GB GB5558/55A patent/GB803017A/en not_active Expired
- 1955-02-25 CH CH337946D patent/CH337946A/de unknown
- 1955-02-25 FR FR1128423D patent/FR1128423A/fr not_active Expired
- 1955-03-23 US US496278A patent/US3078195A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1219240B (de) * | 1960-05-25 | 1966-06-16 | Philips Nv | Verfahren zur Herstellung von Halbleitervorrichtungen unter Verwendung eines Elektrodenmaterials auf Indium-, Zinn-, Blei- oder Wismut-Basis |
Also Published As
Publication number | Publication date |
---|---|
NL98718C (is) | |
NL190762A (is) | |
US3078195A (en) | 1963-02-19 |
NL188679B (nl) | |
GB803017A (en) | 1958-10-15 |
CH337946A (de) | 1959-04-30 |
NL190761A (is) | |
NL98717C (is) | |
NL190760A (is) | |
NL98710C (is) | |
NL94467C (is) | |
US3078397A (en) | 1963-02-19 |
FR1128423A (fr) | 1957-01-04 |
NL185470B (nl) | |
DE1036392B (de) | 1958-08-14 |
NL98719C (is) |