BE1030198B1 - Method and system for monitoring and measuring a coating thickness - Google Patents

Abstract

A known method and system for monitoring and measuring a coating thickness is described. The method includes: forming a slit image by making a light receiving device incident on a slit light, which penetrates a collimator having slits, and recording a position of the slit image L0; determining positions of the slit collimator and the light receiving device, placing a coating substrate between the slit collimator and the light receiving device, the slit light being obliquely incident on a coating surface of the coating substrate, recording a position of the slit image L penetrating the coating substrate; coating the coating surface, and recording a position of the slit image L1 penetrating the coated coating substrate; Determining, depending on L0, L and L1, a coating thickness and monitoring the coating thickness. With the method and system disclosed in the present invention, the coating thickness can be monitored and measured during coating. And the system is simple in structure, easy to operate, and can effectively overcome the shortcomings of the prior art.

Description

' BE2022/5936

Method and system for monitoring and measuring a coating thickness

TECHNICAL AREA

The present invention relates to the technical field of coating and more particularly to a method and system for monitoring and measuring a

coating thickness.

STATE OF THE ART

A coated film generally serves as a protective layer and has many advantages. With the

However, depending on the thickness of a coating medium, the destructive or constructive interference of a reflected light or a transmitted light having a certain wavelength at upper and lower interfaces can be controlled. To ensure that the performance of a coated product is not compromised, monitoring and measuring the

Coating thickness has therefore become an indispensable link in production.

Currently, the quartz crystal microbalance method (QCM) is the most direct method to control a coating. With this device, the evaporation source can be driven directly and the stop plate can be driven cyclically by PID control, so that the evaporation rate is maintained. As long as the device is connected to control software, the entire coating process can be controlled. But QCM's accuracy is limited, in part because it monitors quality rather than optical coating thickness. Although the QCM is very stable at lower temperatures, it becomes more stable at higher ones

Temperatures very sensitive to temperature. With prolonged heating, it is difficult to prevent a sensor from falling into this temperature-sensitive range, leading to significant

errors in film layer control.

Optical surveillance is the preferred surveillance method for high-precision

Coatings as it can more accurately monitor the thickness of the film layer. For example, an optical interferometer is used to measure the thickness of the film layer. The

However, interference phenomenon requires high stability of the device, otherwise a large

Measurement error can occur and it is difficult to accurately read the thickness of the film layer (the

Accuracy depends on accurate reading of interference fringes).

Therefore, it is an urgent task for those skilled in the art to overcome the above deficiencies and provide a method or system which is simple in principle, easy to operate, and can monitor and measure the coating thickness in real time during a coating process.

° BE2022/5936

CONTENT OF THE PRESENT INVENTION

With this in mind, the present invention provides a method and system

monitoring and measuring a coating thickness. In order to solve the above problem, the following technical solutions are used in the present invention:

In one aspect, the present invention discloses a method for monitoring and measuring a coating thickness, comprising:

Creating a slit image by incident slit light using a collimator

Columns penetrating, onto a light receiving device, and recording a position of

slit image Lo;

determining the positions of the collimator with slits and the light-receiving device,

Placing a coating substrate between the slit collimator and the

Light receiving device, wherein the slit light obliquely incident on a coating surface of the

coating substrate falls, recording a position of the slit image L penetrating the coating substrate;

coating the coating surface, and recording a position of the slit image L+ penetrating the coated coating substrate;

Determining, depending on Lo, L and L4, a coating thickness and monitoring the

coating thickness.

It is preferably provided that using Lo, L and L+ the

coating thickness is determined according to the following formula: a LL, _ __LaLo — LLo cosa(tga — tg6,) cosa(tga — tg6,) tg0, = nosina

V/n12 — (nosina)? where in the formula % for an angle of incidence of the slit light, ©, for an angle of refraction of

Slit light after penetrating the coated film layer, no for a refractive index of

air and n: represents a refractive index of the coated film layer.

It is preferably provided that the accuracy of the light receiving device of the

coating thickness and on the ratio of the refractive index of the coated film layer to the refractive index of the coating substrate.

According to another aspect, the present invention further discloses a system for

Monitoring and measuring a coating thickness, the system using the method for monitoring and measuring a coating thickness described above, and wherein the system comprises a light source, a collimator with slits, a support table and a

Light receiving device includes; wherein the light source is passed through the collimator with slits and for generating

slit light is used;

° BE2022/5936 being the support table between the collimator with columns and the

light receiving means is arranged and used for supporting the coating substrate, on the support table the coating substrate is coated; wherein the light receiving means is used to receive the slit light penetrating the support table, to form a slit image and a position of the

to record the slit image, thereby facilitating the calculation and monitoring of the coating thickness depending on the recorded position of the slit image.

It is preferably provided that before use positions of the collimator with

Columns and the light receiving device are calibrated, and the positions after

calibration remain unchanged.

It is preferably provided that the support table is circular and at its edge with

degrees is engraved.

It is preferable that an A-B line and a C-D line are marked on the support table, the A-B line being perpendicular to the incident slit light, an angle between the C-D line and the A-B line being an incident angle of the slit light; wherein a lower edge of the coating substrate is arranged along the C-D line so that the slit light is incident on the coating surface of the coating substrate at a set angle of incidence.

It is preferably provided that the light-receiving device with a

Monitoring terminal is connected, which is used for displaying the slit image generated by the light receiving means and for recording the corresponding position.

Preferably, it is provided that the monitoring terminal has a built-in formula for calculating a coating thickness and is used to calculate and monitor the coating thickness in real time according to this formula and calculate and

Display monitoring results on the monitoring terminal, where the formula is: a LL, _ __LaLo — LLo cosa(tga — tg6,) cosa(tga — tg6,) tg0, = nosina ni? — (nosina)? where in the formula % stands for an incident angle of the slit light, θ: for a refraction angle of the slit light after penetrating through the coated film layer, no for a refractive index of air, and n: for a refractive index of the coated film layer.

It is preferably provided that the monitoring terminal is also provided with a

Coating system is connected and is used to control the coating system in real time depending on the calculation and monitoring results.

From the above technical solutions it can be seen that compared to the prior art

Technique The present invention provides a method and system for monitoring and measurement

* BE2022/5936 provides a coating thickness. By what is disclosed in the present invention

Method and system, the coating thickness can be monitored and measured during a coating process. And the system has a simple structure, low poses

Demands on the device and is easy to operate, the system can monitor a condition of the coating by tracking the position of the slit image, whereby the

Thickness of the film layer is measured accurately, the system is not affected by factors such as

Device stability and temperature is affected as in the interference method and can effectively overcome the deficiencies of the prior art.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to more clearly illustrate the technical solutions in the exemplary embodiments of the present invention and the prior art, the drawings required for describing the exemplary embodiments or the prior art are briefly introduced below. Obviously, the drawings in the following description represent only a few

Embodiments of the present utility model represent. The person skilled in the art can also obtain further drawings based on these drawings, without being inventive

effort to make.

Fig. 1 shows a schematic view of a principle for monitoring and measuring a

coating thickness according to the present invention;

Fig. 2 shows a schematic view of different positions of an intersection point between incident light and X-axis and a slit image in different situations according to the present invention; and

Fig. 3 shows a schematic structural view of a support table in the system for

Coating thickness monitoring and measurement according to the present invention.

Description of reference symbols: 1-collimator with slits, 2-light receiving device, 3-support table, 4-thing to be measured

coating substrate.

DETAILED DESCRIPTION

The technical solutions in the embodiments of the present invention will be described below clearly and fully with reference to the accompanying drawings of the embodiments of the present invention. Obviously the ones described

Embodiments are only part of the embodiments of the present invention and do not include all of the embodiments. All other embodiments dated

those of ordinary skill in the art based on the embodiments herein

Invention obtained without inventive effort should fall within the scope of the present invention.

° BE2022/5936

To overcome the deficiencies of the prior art, embodiments of the present invention disclose a new method for monitoring and measuring a

Coating thickness, which includes the following steps in particular:

Creating a slit image by incident slit light using a collimator

penetrating slits, onto a light receiving device, and recording a slit image position

Lo at this time;

determining the positions of the collimator with slits and the light-receiving device,

Placing a coating substrate between the slit collimator and the

Light receiving device, wherein the slit light obliquely incident on a coating surface of the

coating substrate falls, recording a position of the slit image L penetrating the coating substrate;

coating the coating surface, and recording a position of the slit image L+ penetrating the coated coating substrate;

Determining, depending on Lo, L and L4, a coating thickness and monitoring the

coating thickness.

First, having the light source pass through the slit collimator before incidence aims to produce a sharp slit image. In this case, as the light source

Laser light source, in particular a 632.8 nm or 650 nm laser light source, or an ordinary monochromatic light source, such as a 590 nm sodium light source, can be selected.

Furthermore, in an embodiment, the light receiving means may be a telescope system with CCD, which can be mounted on a 3D adjustment frame as needed, which can ensure that the slit image entering the CCD is sharp and clear. Furthermore, the imaging position of the exiting light under different

Conditions are identified and recorded by the telescope system with CCD.

In addition, the accuracy of the light-receiving device should depend on the

coating thickness and the ratio of the refractive index of the coated film layer to the refractive index of the coating substrate. Specifically, the thinner the thickness of the coated film layer, the higher the accuracy required of the light-receiving device; or, the closer the ratio of the

Refractive index of the film layer to be measured to the refractive index of the

Coating substrate is 1, that is, the smaller the difference between the two

Refractive indexes, the higher the accuracy of the light receiving device. Overall, the choice of accuracy for the light receiving device ultimately depends on the actual application.

After the positions of the collimator with slits and the light receiving device are calibrated, they remain unchanged.

° BE2022/5936

Then, as shown in Fig. 1, the red dotted line represents the direction of the original incident light that enters the CCD directly for imaging, while the blue dotted

line represents a light that penetrates only the coating substrate, and the green dashed line represents a light that penetrates both the coated film layer and the

Coating substrate penetrates. In the above cases, the angle of incidence of the incident light remains the same.

A case where the refractive index of the coated film layer is larger than the refractive index of the coating substrate (i.e., n1 > n2) is given as an example. If there is no sample to be measured, the incident light falls directly on the CCD, with the

exit position is recorded as Lo. When the light is incident through the coating substrate, the exit position is recorded as L. After coating the

coating substrate, the exit position of the incident light is recorded as L:. If the coating substrate, the refractive index of the coated film layer, the parameters of the incident light (such as wavelength range, etc.) and the angle of incidence of the light (im

(Generally, 30° or 45°) are selected, the Lo and L positions are fixed. during the

During the coating process, the position of L: relative to L observed on the CCD changes with the coating thickness. By observing the change in position of L; can he

Coating process, i.e. the monitoring and measurement of the coating thickness, can be monitored in real time. The position of L relative to LO is determined by the thickness of the

Coating substrate determined, and the position of L1 relative to L is determined by the

Refractive index and the thickness of the coated film layer are determined.

The present invention indirectly measures the thickness of the coated film layer, can be used in a coating scene, particularly in the coating process of the transparent

Film layer, can be used, and can realize real-time monitoring and measurement of coating thickness during coating.

In particular, the method for indirectly measuring the coating thickness is realized by the following formula: d= LL i _ LiLo - LLo cosa(tga - tg6 i ) cosa(tga - tg6 i ) tg0 i = nosina

V/n12 — (nosina)? where in the formula % stands for an incident angle of the slit light, θ: for a refraction angle of the slit light after penetrating through the coated film layer, no for a refractive index of air, and n: for a refractive index of the coated film layer.

The principle of measurement is clearly explained below, again referring to FIG.

/ BE2022/5936

When there is no sample, the slit light is incident obliquely on the light receiving device at a certain angle of incidence, at which time the position of the generated

slit image is Lo. When an uncoated coating substrate is placed, the position of the slit light incident on the light receiving device at the same angle of incidence is

L. When coating the coating substrate, the slit light falls under the same

angle of incidence, where the position of the slit image formed at that time is L:. It should be noted that the position of L; constantly changing at this point.

The normal line passing through the point of incidence on the coating surface is set as the Y-axis. The line where the bottom surface of the coating substrate is is the X-axis. In the absence of a sample, the incident light and the X-axis intersect at Xo. When an uncoated coating substrate is placed, the incident light and the X-axis intersect at X. During the coating process of the

Coating substrate, the incident light and the X-axis intersect at X4. As shown in Fig. 2, according to the positions of Ls, L and L+, the positions of Xo, X and X4 can be calibrated, thereby indirectly calibrating the sample substrate and the coating thickness, finally realizing real-time monitoring and measurement of the coating process. The reason is that the position of X depends on the thickness and the

index of refraction of the coating substrate and the position of X4 depends on the thickness and index of refraction of the coated film layer.

It is further assumed that the coated film layer has a thickness of d: and one

refractive index of n: and that the coating substrate has a thickness of da and a refractive index of na. In general, dy is much smaller than d2, and the magnitude of 6, and 82 depend on the magnitude of nı and na; and for nı > na, 84 < 82. Therefore, LoL and LoL: are much larger than LL. During the measurement process, LoL and LoL are: easier to measure than LL. Therefore, in the measurement process, the value of LL; measured by calibrating Lo, L, and L4 instead of directly calibrating L and L to measure the value of LL.

In one embodiment, the angle of incidence is 30°, with nı > n2, and the thickness of the coated film layer is very thin, so the distance between L″ and L is very small.

At this point, the values of LoL and LoL; measured, and then the value of

LL; according to the values of LoL and Lel: determined, namely:

LL=LL-LL, due to LLy = XX, x cos30° Lilo = XX X cos 3 0° applies L,L = cos 3 0°(X4Xp — XX).

It is further assumed that when the incident light enters the transparent substrate directly, the angle of refraction is .degree. That when, after coating, the incident light enters the coated film layer, the angle of refraction is the first

Refraction 9: is, and that when the refracted light enters the transparent substrate, the

is the angle of refraction of the second refraction θ2, where upon analysis the relationship 6=6: is obtained.

Through further combination with Fig. 1 and Fig. 2, the following relationship can result:

OX, = (d, +d,) xtg30°

OX =d, xtg30° + d, xtg6,

OX, =d, xtg0 +d, xtg6, n,sin30°=n,sin6 = n, sin, then: sing, = 2e5in50° n1

From this it can be seen that in a right triangle, one right angled side corresponding to the included angle 6, is nosin30° and the hypotenuse is n,, therefore the other right angled side is /n,* — (nosin30°)2, like this: m sin 30' n tgó, ZA A

In} —(n,sin30)? 4n?-n} m sin 30° n 190, = 2 5 ; zn = 2

In" —(n sin 30') Jan? — n,

LL = cos 30° xd, x(tg30 —tg0,)

LL = cos 30° x [d, x{(£g30 —tg6,) + d, x(tg30 -t90,)

LL = cos 30° xd, x(£g30 -tg9) d - LL, Lb cos 30(£tg30° —t go) cos30({g30 tg)

Finally, according to the expression of dı, measurement and monitoring takes place. the

coating thickness.

In the process of monitoring the coating of the coating substrate, regardless of n: > na or n: < na (i.e. ©; < 82 or 6, > 82), only the positions of L1 are different. In the case of multiple dielectric films, one can consider using the substrate and a finished coated film as a new "substrate" and then monitoring and measuring a currently coated layer of film. If several

Layers of films are continuously coated, it can be considered to monitor some specific positions of Ly during the moving process, indicating that the corresponding film layer has reached the required coating thickness, this monitoring and control process can even be automated.

From the description of the method disclosed in the present invention

Measurement and monitoring of the coating thickness and its principle can be seen that the

) BE2022/5936

Method is simple in principle, convenient to operate, effectively overcomes the shortcomings of the prior art, and can realize the measurement of the coating thickness during coating, as well as advantageous effects of monitoring.

According to another aspect, embodiments of the present invention further disclose a coating thickness monitoring and measurement system mainly comprising the above-described coating thickness monitoring and measurement method

Coating thickness used, the system in particular a light source, a

collimator with slits, a support table and a light receiving device; wherein the light source is passed through the collimator with slits and for generating

slit light is used; wherein the support table between the collimator with columns and the

light receiving means is arranged and used for supporting the coating substrate, on the support table the coating substrate is coated; wherein the light receiving means is used to receive the slit light penetrating the support table, to form a slit image and a position of the

to record the slit image, thereby facilitating the calculation and monitoring of the coating thickness depending on the recorded position of the slit image.

In one embodiment, it is provided that the support table is circular and is evenly engraved on its edge with angular degrees. As shown in Fig. 3, the total circumference is 360 degrees in total, the minimum scale being minutes of arc, at the same time an A-B line and a C-D line are marked on the support table, the A-B

line is perpendicular to the incident slit light, with an angle between the C-D line and the A-B line being an incident angle of the slit light; wherein a lower edge of the coating substrate is arranged along the C-D line so that the slit light is incident on the coating surface of the coating substrate at a set angle of incidence.

And due to the position of the slit image on the light receiving device, e.g. B. on the

CCD, only one slit image can be observed at a time. It is therefore provided in one embodiment that the light-receiving device with a

is connected to the monitoring terminal, which is used to view and directly read the data from the

Light receiving device generated slit image and for recording the corresponding

position is used.

In one embodiment, it is provided that the monitoring terminal also has and uses a built-in formula for calculating a coating thickness

Is to calculate and monitor the coating thickness in real time according to this formula, and display calculation and monitoring results on the monitoring terminal.

The formula is:

a LL, _ __LaLo — LLo cosa(tga — tg0,) cosa(tga — tg01) tg0, = nosina

V/n12 — (nosina)? where in the formula & stands for an incident angle of the slit light, θ: for a refraction angle of the slit light after penetrating through the coated film layer, no for a refractive index of air, and n: for a refractive index of the coated film layer.

Furthermore, the monitoring terminal is also connected to a coating facility and is used to, depending on the calculation and monitoring results, the

Coating system real-time control to provide automatic control of the whole

to enable the coating process.

The system disclosed in the present invention for monitoring and measuring a

Coating thickness works as follows: 1) There is no sample on the support table, and the incident light shines directly into the

Light receiving device enters (the light path is shown by the red solid line in Fig. 1), wherein after setting the monitoring system, the

light-receiving device observes a bright slit image, now the position of the slit image on the light-receiving device is marked as Lo and recorded; 2) a coating substrate is placed on the stage as required (making the coating surface parallel to the CD line), now with the incident

Light enters the coating substrate first and then the light receiving device (the

Light path is shown by the blue dotted line in Fig. 1). At this time, the position and brightness of the slit image observed on the light-receiving device change, and the position of the slit image at that time is calibrated and recorded as L; 3) then the coating is started on the coating substrate, now the incident light enters the film layer first, then the coating substrate and finally the light receiving device (the light path is shown by the green long dashed line in

1 represents). The position and brightness of the observed on the light receiving device

Slit image change with the change in the refractive index of the film layer and the

Coating thickness, so the coating process and the coating situation in

Can be monitored in real time, and the position of the slit image at that time is calibrated and recorded as L1 After the refractive index of the film layer and the angle of incidence of the

light have been determined, the thickness of the film layer can be calibrated depending on the position of L1. That is, the coating thickness is real-time about the

Monitoring terminal monitored and measured.

" BE2022/5936

In addition, it should be noted that before using the system, the positions of the collimator with slits and the light receiving device must be calibrated, and the positions remain unchanged after calibration.

First, before the sample to be measured is placed on the support table, the

Collimator and the light receiving device adjusted so that they have a clear and sharp

Can display slit image, so that it is set to the position of Lo in Fig. 1, wherein the calibration is performed. When there is no sample on the stage, the exiting light should always be kept at the same position on the CCD. And in front of everyone

Using the system, it should be confirmed whether the position of Lo has changed; if there is a change, the system must be readjusted and corrected again.

Second, when the coating substrate is placed, the slit image changes from that

position from Lo to the position of L and decreases in brightness; since the refractive index of the

Coating substrate remains unchanged, the angle of incidence of the incident light on the coating substrate also remains unchanged, so the distance between Lo and L should be a fixed value. If the distance changes and provided that the

With the collimator and the light receiving device fixed, it is necessary to first confirm whether the incident surface of the coating substrate is on the CD line of the stage, then rotate the stage to adjust the angle of incidence until LoL reaches the desired value.

It is to be stated that in the subsequent continuous coating process the

distance between Lo and L is still a fixed value.

As coating begins, the image of the gap changes from the L position to the L+-

Position whose brightness is lower than that at the L position. As the thickness of the coated film layer changes, the position of L changes constantly, with the change in position of L indirectly reflecting the change in the thickness of the coated film layer. Therefore, during the coating process, by monitoring the position of L in real time, the

Coating process (including the coating thickness, the coating of multiple

film layers, etc.) can be controlled in real time. If appropriate hardware and software is available for control, the entire coating process can be controlled automatically.

The various embodiments in the present description will be described in a progressive manner. Each of the embodiments focuses on the

Differences from other embodiments. Identical or similar parts between the different embodiments may refer to each other. Since the in the

Embodiments disclosed device disclosed in the embodiments

procedure, it is described in a relatively simple manner, with its relevant parts on the

Description of the procedure can be referenced.

The above description of the disclosed embodiments enables those skilled in the art to implement or use the present invention. Different

Modifications to these embodiments will be obvious to those skilled in the art.

The general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention.

Therefore, the present invention is not limited to the embodiments shown herein,

but should be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims (10)

EXPECTATIONS A method for monitoring and measuring a coating thickness, comprising: - forming a slit image by incident a slit light passing through a collimator having slits on a light receiving device, and recording a position of the slit image Lo; - setting positions of the slit collimator and the light-receiving device, placing a coating substrate between the slit collimator and the light-receiving device, wherein the slit light is obliquely incident on a coating surface of the coating substrate, recording a position of the slit image L penetrating the coating substrate; - coating the coating surface, and recording a position of the slit image L+ penetrating the coated coating substrate; - Determine, depending on Lo, L and L+, a coating thickness and monitor the coating thickness. 2. The method for monitoring and measuring a coating thickness according to claim 1, wherein using Lo, L and L: the coating thickness is determined according to the following formula: a LL, _ ___LaLo - LLo cosa(tga - tg6,) cosa(tga - te6 ,) tg0, = nosina V/n12 — (nosina)? where in the formula a for an incident angle of the slit light, ©; stands for a refraction angle of the slit light after penetrating the coated film layer, no for a refractive index of air, and n: for a refractive index of the coated film layer. 3. A method for monitoring and measuring a coating thickness according to claim 1, wherein the accuracy of the light receiving device depends on the coating thickness and on the ratio of the refractive index of the coated film layer to the refractive index of the coating substrate. _ BE2022/5936 4. A coating thickness monitoring and measurement system, characterized by using the coating thickness monitoring and measurement method according to any one of claims 1 to 3, wherein - the system comprises a light source, a collimator with slits, a support table and a light receiving device ; — the light source is passed through the collimator with slits and used to generate slit light; - the supporting table is arranged between the collimator with slits and the light receiving means and used for supporting the coating substrate, on which supporting table the coating substrate is coated; — the light receiving means is used to receive the slit light penetrating the support table, form a slit image and record a position of the slit image, thereby facilitating calculation and monitoring of the coating thickness depending on the recorded position of the slit image. 5. A coating thickness monitoring and measurement system according to claim 4, wherein positions of the slit collimator and the light receiving device are calibrated before use, and the positions remain unchanged after the calibration. 6. The system for monitoring and measuring a coating thickness according to claim 4, wherein the support table is circular and is engraved with angular degrees on its edge. 7. System for monitoring and measuring a coating thickness according to claim 6, wherein - an AB line and a CD line are marked on the support table, - the AB line is perpendicular to the incident slit light, - an angle between the CD line and the A-B line is an incident angle of the slit light; - a lower edge of the coating substrate is arranged along the C-D line so that the slit light is incident on the coating surface of the coating substrate at a set angle of incidence. 8. A coating thickness monitoring and measuring system according to claim 4, wherein said light receiving means is connected to a monitoring terminal used for displaying the slit image generated by said light receiving means and recording the corresponding position. 9. System for monitoring and measuring a coating thickness according to claim 8, wherein that the monitoring terminal has a built-in formula for calculating a coating thickness and is used to calculate and monitor the coating thickness in real time and display calculation and monitoring results on the monitoring terminal according to this formula, where the formula is: a LL, _ ___LaLo — LLo cosa(tga — tg6,) cosa(tga — te6,) tg0, = nosina V/n12 — (nosina)? where in the formula a stands for an incident angle of the slit light, θ: for a refraction angle of the slit light after penetrating through the coated film layer, no for a refractive index of air, and n: for a refractive index of the coated film layer. 10. The system for monitoring and measuring a coating thickness according to claim 9, characterized in that the monitoring terminal is further connected to a coating facility and used to control the coating facility in real time depending on the calculation and monitoring results.