AU6699894A - Method of preparation of mask for ion beam lithography - Google Patents

Method of preparation of mask for ion beam lithography

Info

Publication number
AU6699894A
AU6699894A AU66998/94A AU6699894A AU6699894A AU 6699894 A AU6699894 A AU 6699894A AU 66998/94 A AU66998/94 A AU 66998/94A AU 6699894 A AU6699894 A AU 6699894A AU 6699894 A AU6699894 A AU 6699894A
Authority
AU
Australia
Prior art keywords
mask
preparation
ion beam
beam lithography
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
AU66998/94A
Inventor
Martin Peckerar
Joseph Yahalom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Technion Research and Development Foundation Ltd
US Department of Navy
Original Assignee
Technion Research and Development Foundation Ltd
US Department of Health and Human Services
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Technion Research and Development Foundation Ltd, US Department of Health and Human Services filed Critical Technion Research and Development Foundation Ltd
Publication of AU6699894A publication Critical patent/AU6699894A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
AU66998/94A 1993-04-04 1994-04-04 Method of preparation of mask for ion beam lithography Withdrawn AU6699894A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL105299 1993-04-04
IL105299A IL105299A0 (en) 1993-04-04 1993-04-04 Ion beam lithography mask and a method for its preparation
PCT/US1994/003628 WO1994024608A2 (en) 1993-04-04 1994-04-04 Method of preparation of mask for ion beam lithography

Publications (1)

Publication Number Publication Date
AU6699894A true AU6699894A (en) 1994-11-08

Family

ID=11064709

Family Applications (1)

Application Number Title Priority Date Filing Date
AU66998/94A Withdrawn AU6699894A (en) 1993-04-04 1994-04-04 Method of preparation of mask for ion beam lithography

Country Status (3)

Country Link
AU (1) AU6699894A (en)
IL (1) IL105299A0 (en)
WO (1) WO1994024608A2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4021276A (en) * 1975-12-29 1977-05-03 Western Electric Company, Inc. Method of making rib-structure shadow mask for ion implantation
DE2922416A1 (en) * 1979-06-01 1980-12-11 Ibm Deutschland SHADOW MASK FOR STRUCTURING SURFACE AREAS AND METHOD FOR THEIR PRODUCTION

Also Published As

Publication number Publication date
WO1994024608A3 (en) 1994-12-08
WO1994024608A2 (en) 1994-10-27
IL105299A0 (en) 1993-08-18

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