AU5704300A - Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk - Google Patents

Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk

Info

Publication number
AU5704300A
AU5704300A AU57043/00A AU5704300A AU5704300A AU 5704300 A AU5704300 A AU 5704300A AU 57043/00 A AU57043/00 A AU 57043/00A AU 5704300 A AU5704300 A AU 5704300A AU 5704300 A AU5704300 A AU 5704300A
Authority
AU
Australia
Prior art keywords
magnetic disk
substrate
composition
producing
polishing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU57043/00A
Inventor
Norihiko Miyata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of AU5704300A publication Critical patent/AU5704300A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
AU57043/00A 1999-06-28 2000-06-28 Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk Abandoned AU5704300A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/181753 1999-06-28
JP18175399 1999-06-28
PCT/JP2000/004245 WO2001000745A1 (en) 1999-06-28 2000-06-28 Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk

Publications (1)

Publication Number Publication Date
AU5704300A true AU5704300A (en) 2001-01-31

Family

ID=16106296

Family Applications (1)

Application Number Title Priority Date Filing Date
AU57043/00A Abandoned AU5704300A (en) 1999-06-28 2000-06-28 Composition for polishing substrate for magnetic disk and method for producing substrate for magnetic disk

Country Status (5)

Country Link
CN (1) CN1152104C (en)
AU (1) AU5704300A (en)
MY (1) MY128169A (en)
TW (1) TW581803B (en)
WO (1) WO2001000745A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4095833B2 (en) * 2002-05-30 2008-06-04 株式会社フジミインコーポレーテッド Polishing composition
WO2011030580A1 (en) * 2009-09-10 2011-03-17 積水化学工業株式会社 Photosensitive composition and printed wiring board
KR101257336B1 (en) * 2012-04-13 2013-04-23 유비머트리얼즈주식회사 Polishing slurry and method of polishing using the same
CN116057141B (en) * 2020-08-03 2024-07-12 Cmc材料有限责任公司 Ruthenium chemical mechanical polishing slurry containing titanium dioxide

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3733599B2 (en) * 1993-08-11 2006-01-11 住友化学株式会社 Metal oxide powder and method for producing the same
JPH10121035A (en) * 1996-08-30 1998-05-12 Showa Denko Kk Composition for polishing magnetic disk substrate
JPH11198028A (en) * 1998-01-14 1999-07-27 Showa Alum Corp Abrasive for magnetic disc substrate and method of polishing

Also Published As

Publication number Publication date
WO2001000745A1 (en) 2001-01-04
TW581803B (en) 2004-04-01
MY128169A (en) 2007-01-31
CN1315991A (en) 2001-10-03
CN1152104C (en) 2004-06-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase