AU5460898A - Composition and method for polishing rigid disks - Google Patents

Composition and method for polishing rigid disks

Info

Publication number
AU5460898A
AU5460898A AU54608/98A AU5460898A AU5460898A AU 5460898 A AU5460898 A AU 5460898A AU 54608/98 A AU54608/98 A AU 54608/98A AU 5460898 A AU5460898 A AU 5460898A AU 5460898 A AU5460898 A AU 5460898A
Authority
AU
Australia
Prior art keywords
composition
rigid disks
polishing
polishing rigid
disks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU54608/98A
Inventor
Steven K. Grumbine
Brian L Mueller
Matthew Neville
Christopher C. Streinz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/753,482 external-priority patent/US5958288A/en
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of AU5460898A publication Critical patent/AU5460898A/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F3/00Brightening metals by chemical means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AU54608/98A 1996-11-26 1997-11-21 Composition and method for polishing rigid disks Abandoned AU5460898A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US08/753,482 US5958288A (en) 1996-11-26 1996-11-26 Composition and slurry useful for metal CMP
US08753482 1996-11-26
US08844195 1997-04-18
US08/844,195 US6015506A (en) 1996-11-26 1997-04-18 Composition and method for polishing rigid disks
PCT/US1997/021730 WO1998023697A1 (en) 1996-11-26 1997-11-21 Composition and method for polishing rigid disks

Publications (1)

Publication Number Publication Date
AU5460898A true AU5460898A (en) 1998-06-22

Family

ID=27115754

Family Applications (1)

Application Number Title Priority Date Filing Date
AU54608/98A Abandoned AU5460898A (en) 1996-11-26 1997-11-21 Composition and method for polishing rigid disks

Country Status (3)

Country Link
AU (1) AU5460898A (en)
TW (1) TW442364B (en)
WO (1) WO1998023697A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6162268A (en) * 1999-05-03 2000-12-19 Praxair S. T. Technology, Inc. Polishing slurry
CN1125861C (en) * 1999-07-16 2003-10-29 长兴化学工业股份有限公司 Composition for chemical and mechanical grinding on semiconductor
CN1125862C (en) * 1999-09-20 2003-10-29 长兴化学工业股份有限公司 Composite ground in chemical machine for semiconductor processing
JP4238951B2 (en) * 1999-09-28 2009-03-18 株式会社フジミインコーポレーテッド Polishing composition and method for producing memory hard disk using the same
US6299795B1 (en) 2000-01-18 2001-10-09 Praxair S.T. Technology, Inc. Polishing slurry
SG90227A1 (en) * 2000-01-18 2002-07-23 Praxair Technology Inc Polishing slurry
US6261476B1 (en) * 2000-03-21 2001-07-17 Praxair S. T. Technology, Inc. Hybrid polishing slurry
US20050028449A1 (en) * 2001-09-03 2005-02-10 Norihiko Miyata Polishing composition
US6604987B1 (en) 2002-06-06 2003-08-12 Cabot Microelectronics Corporation CMP compositions containing silver salts
WO2004111145A1 (en) * 2003-06-13 2004-12-23 Showa Denko K.K. Polishing composition and polishing method
US8013024B2 (en) 2007-06-29 2011-09-06 Deborah D. L. Chung High-performance interface materials for improving thermal contacts
CN113001418B (en) * 2021-01-28 2024-01-26 广东朗旗新材料科技有限公司 Ceramic bond of superhard abrasive tool, superhard abrasive tool and preparation method of superhard abrasive tool

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63274782A (en) * 1987-05-02 1988-11-11 Mishima Kosan Co Ltd Lapping fluid for stainless steel
JP2689706B2 (en) * 1990-08-08 1997-12-10 上村工業株式会社 Polishing method
US5527423A (en) * 1994-10-06 1996-06-18 Cabot Corporation Chemical mechanical polishing slurry for metal layers
EP0792515A1 (en) * 1994-11-18 1997-09-03 Advanced Micro Devices, Inc. Method of making a chemical-mechanical polishing slurry and the polishing slurry

Also Published As

Publication number Publication date
TW442364B (en) 2001-06-23
WO1998023697A1 (en) 1998-06-04

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