AU5635000A - Pyrometric dose correction for proximity heating of resists during electron beamlithography - Google Patents

Pyrometric dose correction for proximity heating of resists during electron beamlithography

Info

Publication number
AU5635000A
AU5635000A AU56350/00A AU5635000A AU5635000A AU 5635000 A AU5635000 A AU 5635000A AU 56350/00 A AU56350/00 A AU 56350/00A AU 5635000 A AU5635000 A AU 5635000A AU 5635000 A AU5635000 A AU 5635000A
Authority
AU
Australia
Prior art keywords
pyrometric
dose correction
during electron
proximity heating
beamlithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU56350/00A
Inventor
Robert Innes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Etec Systems Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of AU5635000A publication Critical patent/AU5635000A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0814—Particular reflectors, e.g. faceted or dichroic mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0806—Focusing or collimating elements, e.g. lenses or concave mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0808—Convex mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/084—Adjustable or slidable
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31769—Proximity effect correction

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU56350/00A 1999-06-23 2000-06-22 Pyrometric dose correction for proximity heating of resists during electron beamlithography Abandoned AU5635000A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US33905499A 1999-06-23 1999-06-23
US09339054 1999-06-23
PCT/US2000/017335 WO2000079342A2 (en) 1999-06-23 2000-06-22 Pyrometric dose correction for proximity heating of resists during electron beam lithography

Publications (1)

Publication Number Publication Date
AU5635000A true AU5635000A (en) 2001-01-09

Family

ID=23327290

Family Applications (1)

Application Number Title Priority Date Filing Date
AU56350/00A Abandoned AU5635000A (en) 1999-06-23 2000-06-22 Pyrometric dose correction for proximity heating of resists during electron beamlithography

Country Status (2)

Country Link
AU (1) AU5635000A (en)
WO (1) WO2000079342A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2427265B (en) * 2005-06-15 2007-07-11 Everspring Ind Co Ltd Improved reflective mirror structure
EP2527156A1 (en) 2011-05-25 2012-11-28 RLS Merilna Tehnika D.O.O. Apparatus and method for writing a pattern in a substrate

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2813203A (en) * 1950-04-07 1957-11-12 Leeds & Northrup Co Optical systems for radiation pyrometers
JPS63246818A (en) * 1987-04-02 1988-10-13 Toshiba Corp Charged particle beam lithography and device therefor
FR2623621B1 (en) * 1987-11-20 1991-12-27 Commissariat Energie Atomique OPTICAL DEVICE FOR FORMING AND LINEAR SCANNING OF AN IMAGE ON A DETECTOR AND ITS APPLICATION TO A PYROMETER
US5304441A (en) * 1992-12-31 1994-04-19 International Business Machines Corporation Method of optimizing exposure of photoresist by patterning as a function of thermal modeling
US5667300A (en) * 1994-06-22 1997-09-16 Mandelis; Andreas Non-contact photothermal method for measuring thermal diffusivity and electronic defect properties of solids
DE29518491U1 (en) * 1995-10-27 1996-03-07 Goellner Manfred Dipl Ing Radiation measuring device

Also Published As

Publication number Publication date
WO2000079342A2 (en) 2000-12-28
WO2000079342A3 (en) 2001-03-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase