AU5499299A - Method and device for producing process gas-vapor mixtures - Google Patents
Method and device for producing process gas-vapor mixturesInfo
- Publication number
- AU5499299A AU5499299A AU54992/99A AU5499299A AU5499299A AU 5499299 A AU5499299 A AU 5499299A AU 54992/99 A AU54992/99 A AU 54992/99A AU 5499299 A AU5499299 A AU 5499299A AU 5499299 A AU5499299 A AU 5499299A
- Authority
- AU
- Australia
- Prior art keywords
- process gas
- producing process
- vapor mixtures
- vapor
- mixtures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/BY1999/000007 WO2001020057A1 (en) | 1999-09-14 | 1999-09-14 | Method and device for producing process gas-vapor mixtures |
Publications (1)
Publication Number | Publication Date |
---|---|
AU5499299A true AU5499299A (en) | 2001-04-17 |
Family
ID=4083772
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU54992/99A Abandoned AU5499299A (en) | 1999-09-14 | 1999-09-14 | Method and device for producing process gas-vapor mixtures |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU5499299A (en) |
WO (1) | WO2001020057A1 (en) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5674574A (en) * | 1996-05-20 | 1997-10-07 | Micron Technology, Inc. | Vapor delivery system for solid precursors and method regarding same |
-
1999
- 1999-09-14 AU AU54992/99A patent/AU5499299A/en not_active Abandoned
- 1999-09-14 WO PCT/BY1999/000007 patent/WO2001020057A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2001020057A1 (en) | 2001-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |