AU541410B2 - Depositing oxide layers by photochemical vapor deposition - Google Patents

Depositing oxide layers by photochemical vapor deposition

Info

Publication number
AU541410B2
AU541410B2 AU71003/81A AU7100381A AU541410B2 AU 541410 B2 AU541410 B2 AU 541410B2 AU 71003/81 A AU71003/81 A AU 71003/81A AU 7100381 A AU7100381 A AU 7100381A AU 541410 B2 AU541410 B2 AU 541410B2
Authority
AU
Australia
Prior art keywords
vapor deposition
oxide layers
photochemical vapor
depositing oxide
depositing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
AU71003/81A
Other versions
AU7100381A (en
Inventor
John W. Peters
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Priority to AU71003/81A priority Critical patent/AU541410B2/en
Publication of AU7100381A publication Critical patent/AU7100381A/en
Application granted granted Critical
Publication of AU541410B2 publication Critical patent/AU541410B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Inorganic Chemistry (AREA)
AU71003/81A 1981-05-26 1981-05-26 Depositing oxide layers by photochemical vapor deposition Ceased AU541410B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU71003/81A AU541410B2 (en) 1981-05-26 1981-05-26 Depositing oxide layers by photochemical vapor deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AU71003/81A AU541410B2 (en) 1981-05-26 1981-05-26 Depositing oxide layers by photochemical vapor deposition

Publications (2)

Publication Number Publication Date
AU7100381A AU7100381A (en) 1982-12-02
AU541410B2 true AU541410B2 (en) 1985-01-10

Family

ID=3754005

Family Applications (1)

Application Number Title Priority Date Filing Date
AU71003/81A Ceased AU541410B2 (en) 1981-05-26 1981-05-26 Depositing oxide layers by photochemical vapor deposition

Country Status (1)

Country Link
AU (1) AU541410B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU595251B2 (en) * 1985-10-23 1990-03-29 Canon Kabushiki Kaisha Method for forming deposited film
AU597004B2 (en) * 1985-10-24 1990-05-24 Canon Kabushiki Kaisha Method for forming a deposited film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU595251B2 (en) * 1985-10-23 1990-03-29 Canon Kabushiki Kaisha Method for forming deposited film
AU597004B2 (en) * 1985-10-24 1990-05-24 Canon Kabushiki Kaisha Method for forming a deposited film

Also Published As

Publication number Publication date
AU7100381A (en) 1982-12-02

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