AU5326499A - Hardcoats for flat panel display substrates - Google Patents

Hardcoats for flat panel display substrates

Info

Publication number
AU5326499A
AU5326499A AU53264/99A AU5326499A AU5326499A AU 5326499 A AU5326499 A AU 5326499A AU 53264/99 A AU53264/99 A AU 53264/99A AU 5326499 A AU5326499 A AU 5326499A AU 5326499 A AU5326499 A AU 5326499A
Authority
AU
Australia
Prior art keywords
hardcoats
flat panel
panel display
display substrates
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU53264/99A
Inventor
Cyndi Brodbeck
Chandra Venkatraman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bekaert NV SA
Original Assignee
Advanced Refractory Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Refractory Technologies Inc filed Critical Advanced Refractory Technologies Inc
Publication of AU5326499A publication Critical patent/AU5326499A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/123—Treatment by wave energy or particle radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2201/00—Polymeric substrate or laminate
    • B05D2201/02—Polymeric substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141—Plasma treatment
    • B05D3/142—Pretreatment
    • B05D3/144—Pretreatment of polymeric substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
AU53264/99A 1998-07-27 1999-07-27 Hardcoats for flat panel display substrates Abandoned AU5326499A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US9424498P 1998-07-27 1998-07-27
US60094244 1998-07-27
PCT/US1999/017203 WO2000006794A1 (en) 1998-07-27 1999-07-27 Hardcoats for flat panel display substrates

Publications (1)

Publication Number Publication Date
AU5326499A true AU5326499A (en) 2000-02-21

Family

ID=22243985

Family Applications (1)

Application Number Title Priority Date Filing Date
AU53264/99A Abandoned AU5326499A (en) 1998-07-27 1999-07-27 Hardcoats for flat panel display substrates

Country Status (5)

Country Link
EP (1) EP1109947A4 (en)
JP (1) JP2002521247A (en)
AU (1) AU5326499A (en)
TW (1) TW533228B (en)
WO (1) WO2000006794A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4617933B2 (en) * 2004-03-25 2011-01-26 旭硝子株式会社 Film coated with glass with low softening point
JP4775763B2 (en) * 2006-05-18 2011-09-21 凸版印刷株式会社 Gas barrier film
US8115326B2 (en) * 2006-11-30 2012-02-14 Corning Incorporated Flexible substrates having a thin-film barrier
JP4841451B2 (en) 2007-01-31 2011-12-21 大日本スクリーン製造株式会社 Substrate processing apparatus and substrate processing method
JP5600981B2 (en) * 2010-03-23 2014-10-08 コニカミノルタ株式会社 Gas barrier film, method for producing organic device, and organic device
FR2976577B1 (en) * 2011-06-17 2014-03-28 Saint Gobain METHOD FOR MANUFACTURING A GLAZING COMPRISING A POROUS LAYER
JP5651763B2 (en) * 2013-11-28 2015-01-14 株式会社半導体エネルギー研究所 Display device
DE102017003042B3 (en) * 2017-03-29 2018-08-16 Rodenstock Gmbh Gradient hard layer with changing modulus of elasticity

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6038727A (en) * 1983-08-09 1985-02-28 Konishiroku Photo Ind Co Ltd Magnetic recording medium and its manufacture
US5424131A (en) * 1987-11-30 1995-06-13 Polyplasma, Inc. Barrier coatings on spacecraft materials
US5041303A (en) * 1988-03-07 1991-08-20 Polyplasma Incorporated Process for modifying large polymeric surfaces
US5314724A (en) * 1991-01-08 1994-05-24 Fujitsu Limited Process for forming silicon oxide film
US5728465A (en) * 1991-05-03 1998-03-17 Advanced Refractory Technologies, Inc. Diamond-like nanocomposite corrosion resistant coatings
US5508368A (en) * 1994-03-03 1996-04-16 Diamonex, Incorporated Ion beam process for deposition of highly abrasion-resistant coatings
US5618619A (en) * 1994-03-03 1997-04-08 Monsanto Company Highly abrasion-resistant, flexible coatings for soft substrates

Also Published As

Publication number Publication date
WO2000006794A9 (en) 2000-08-03
EP1109947A1 (en) 2001-06-27
JP2002521247A (en) 2002-07-16
EP1109947A4 (en) 2004-09-22
WO2000006794A1 (en) 2000-02-10
TW533228B (en) 2003-05-21

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase