AU2958799A - Exposure method and exposure system - Google Patents

Exposure method and exposure system

Info

Publication number
AU2958799A
AU2958799A AU29587/99A AU2958799A AU2958799A AU 2958799 A AU2958799 A AU 2958799A AU 29587/99 A AU29587/99 A AU 29587/99A AU 2958799 A AU2958799 A AU 2958799A AU 2958799 A AU2958799 A AU 2958799A
Authority
AU
Australia
Prior art keywords
exposure
exposure method
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU29587/99A
Inventor
Kazuya Ota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2958799A publication Critical patent/AU2958799A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7061—Scanning probe microscopy, e.g. AFM, scanning tunneling microscopy
AU29587/99A 1998-03-30 1999-03-26 Exposure method and exposure system Abandoned AU2958799A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10/83696 1998-03-30
JP8369698 1998-03-30
PCT/JP1999/001564 WO1999050893A1 (en) 1998-03-30 1999-03-26 Exposure method and exposure system

Publications (1)

Publication Number Publication Date
AU2958799A true AU2958799A (en) 1999-10-18

Family

ID=13809670

Family Applications (1)

Application Number Title Priority Date Filing Date
AU29587/99A Abandoned AU2958799A (en) 1998-03-30 1999-03-26 Exposure method and exposure system

Country Status (2)

Country Link
AU (1) AU2958799A (en)
WO (1) WO1999050893A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020127865A1 (en) * 2001-03-08 2002-09-12 Motorola, Inc. Lithography method for forming semiconductor devices with sub-micron structures on a wafer and apparatus
JP2003257834A (en) * 2002-03-04 2003-09-12 Toshiba Corp Method and apparatus for manufacturing semiconductor device
JP4962006B2 (en) * 2004-04-23 2012-06-27 株式会社ニコン Measuring method, measuring apparatus, exposure method and exposure apparatus
US7476490B2 (en) 2004-06-25 2009-01-13 Asml Netherlands B.V. Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method
WO2010055660A1 (en) * 2008-11-14 2010-05-20 パナソニック株式会社 Flat panel display manufacturing method
JP2010118301A (en) * 2008-11-14 2010-05-27 Panasonic Corp Photosensitive paste for flat panel display, and plasma display panel using the same
CN105765462B (en) * 2013-11-27 2019-03-19 东京毅力科创株式会社 System and method are adjusted using the substrate of optical projection
JP7265827B2 (en) * 2019-02-18 2023-04-27 キヤノン株式会社 Exposure system and article manufacturing method
CN111983899A (en) * 2020-06-11 2020-11-24 百及纳米科技(上海)有限公司 Sub-nanometer-level high-precision photoetching writing field splicing method, photoetching machine system used by same, wafer and electron beam drift measuring method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6448415A (en) * 1987-08-19 1989-02-22 Canon Kk Aligner
JPH0845814A (en) * 1994-07-27 1996-02-16 Nikon Corp Exposure device and positioning method
JPH09257457A (en) * 1996-03-18 1997-10-03 Matsushita Electron Corp Measuring method for shape of pattern and measuring method for position of pattern

Also Published As

Publication number Publication date
WO1999050893A1 (en) 1999-10-07

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase