AU2225201A - Composition for polishing magnetic disk substrate and polishing method, and magnetic disk substrate polished thereby - Google Patents

Composition for polishing magnetic disk substrate and polishing method, and magnetic disk substrate polished thereby

Info

Publication number
AU2225201A
AU2225201A AU22252/01A AU2225201A AU2225201A AU 2225201 A AU2225201 A AU 2225201A AU 22252/01 A AU22252/01 A AU 22252/01A AU 2225201 A AU2225201 A AU 2225201A AU 2225201 A AU2225201 A AU 2225201A
Authority
AU
Australia
Prior art keywords
magnetic disk
disk substrate
polishing
composition
polished
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU22252/01A
Inventor
Norihiko Miyata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of AU2225201A publication Critical patent/AU2225201A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
AU22252/01A 1999-12-27 2000-12-26 Composition for polishing magnetic disk substrate and polishing method, and magnetic disk substrate polished thereby Abandoned AU2225201A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP11/369095 1999-12-27
JP36909599 1999-12-27
JP2000016614A JP2004127327A (en) 1999-12-27 2000-01-26 Composition for polishing magnetic disk substrate
JP2000/16614 2000-01-26
PCT/JP2000/009230 WO2001048114A1 (en) 1999-12-27 2000-12-26 Composition for polishing magnetic disk substrate and polishing method, and magnetic disk substrate polished thereby

Publications (1)

Publication Number Publication Date
AU2225201A true AU2225201A (en) 2001-07-09

Family

ID=26582068

Family Applications (1)

Application Number Title Priority Date Filing Date
AU22252/01A Abandoned AU2225201A (en) 1999-12-27 2000-12-26 Composition for polishing magnetic disk substrate and polishing method, and magnetic disk substrate polished thereby

Country Status (3)

Country Link
JP (1) JP2004127327A (en)
AU (1) AU2225201A (en)
WO (1) WO2001048114A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006021259A (en) * 2004-07-06 2006-01-26 Fuji Electric Device Technology Co Ltd Polishing method of magnetic disk base board and magnetic disk medium
JP2014101518A (en) * 2014-01-06 2014-06-05 Fujimi Inc Polishing composition, polishing method and elasticity deterioration preventing method of polishing pad
JP6480139B2 (en) * 2014-09-30 2019-03-06 株式会社フジミインコーポレーテッド Polishing composition

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0781132B2 (en) * 1990-08-29 1995-08-30 株式会社フジミインコーポレーテッド Abrasive composition
US5391258A (en) * 1993-05-26 1995-02-21 Rodel, Inc. Compositions and methods for polishing
US5993686A (en) * 1996-06-06 1999-11-30 Cabot Corporation Fluoride additive containing chemical mechanical polishing slurry and method for use of same
US6039891A (en) * 1996-09-24 2000-03-21 Cabot Corporation Multi-oxidizer precursor for chemical mechanical polishing
JPH10102037A (en) * 1996-10-02 1998-04-21 Kao Corp Abrasive composition and production of substrate using the same
JP3709044B2 (en) * 1996-10-17 2005-10-19 昭和電工株式会社 Abrasive composition for glass polishing and method for producing the same
WO1998021289A1 (en) * 1996-11-14 1998-05-22 Kao Corporation Abrasive composition for the base of magnetic recording medium and process for producing the base by using the same
JPH10219300A (en) * 1997-02-03 1998-08-18 Mitsubishi Chem Corp Detergent composition for abrasive liquid
JPH1121545A (en) * 1997-06-30 1999-01-26 Fujimi Inkooporeetetsudo:Kk Polishing composition
JP4372237B2 (en) * 1997-12-24 2009-11-25 花王株式会社 Polishing method for magnetic recording medium substrate
JPH11256142A (en) * 1998-03-16 1999-09-21 Kao Corp Grinding liquid composition
JP3810588B2 (en) * 1998-06-22 2006-08-16 株式会社フジミインコーポレーテッド Polishing composition
JP4076630B2 (en) * 1998-08-07 2008-04-16 花王株式会社 Polishing liquid composition
JP2000063806A (en) * 1998-08-17 2000-02-29 Okamoto Machine Tool Works Ltd Abrasive slurry and preparation thereof
JP2000063804A (en) * 1998-08-25 2000-02-29 Okamoto Machine Tool Works Ltd Abrasive slurry
JP4090589B2 (en) * 1998-09-01 2008-05-28 株式会社フジミインコーポレーテッド Polishing composition
JP2000136375A (en) * 1998-10-30 2000-05-16 Okamoto Machine Tool Works Ltd Abrasive slurry
JP2000144109A (en) * 1998-11-10 2000-05-26 Okamoto Machine Tool Works Ltd Polishing agent slurry for polishing chemical machinery
JP2000160139A (en) * 1998-12-01 2000-06-13 Fujimi Inc Grinding composition and grinding method using the same
JP2000252244A (en) * 1998-12-28 2000-09-14 Hitachi Chem Co Ltd Polishing liquid for metal and polishing method using the same
JP4406111B2 (en) * 1999-04-28 2010-01-27 花王株式会社 Polishing liquid composition
JP2000340532A (en) * 1999-05-31 2000-12-08 Mitsubishi Materials Corp Slurry for polishing and polishing method using the same
JP4282848B2 (en) * 1999-06-04 2009-06-24 旭化成ケミカルズ株式会社 Inorganic particle dispersion composition
JP4156137B2 (en) * 1999-07-19 2008-09-24 株式会社トクヤマ Metal film abrasive

Also Published As

Publication number Publication date
JP2004127327A (en) 2004-04-22
WO2001048114A1 (en) 2001-07-05

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase