AU2003400A - Method and apparatus for projection exposure - Google Patents

Method and apparatus for projection exposure

Info

Publication number
AU2003400A
AU2003400A AU20034/00A AU2003400A AU2003400A AU 2003400 A AU2003400 A AU 2003400A AU 20034/00 A AU20034/00 A AU 20034/00A AU 2003400 A AU2003400 A AU 2003400A AU 2003400 A AU2003400 A AU 2003400A
Authority
AU
Australia
Prior art keywords
projection exposure
exposure
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU20034/00A
Inventor
Satoru Oshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003400A publication Critical patent/AU2003400A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU20034/00A 1999-01-13 2000-01-13 Method and apparatus for projection exposure Abandoned AU2003400A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11/7008 1999-01-13
JP700899 1999-01-13
PCT/JP2000/000126 WO2000042639A1 (en) 1999-01-13 2000-01-13 Method and apparatus for projection exposure

Publications (1)

Publication Number Publication Date
AU2003400A true AU2003400A (en) 2000-08-01

Family

ID=11654042

Family Applications (1)

Application Number Title Priority Date Filing Date
AU20034/00A Abandoned AU2003400A (en) 1999-01-13 2000-01-13 Method and apparatus for projection exposure

Country Status (2)

Country Link
AU (1) AU2003400A (en)
WO (1) WO2000042639A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002313714A (en) * 2000-12-14 2002-10-25 Nikon Corp Device manufacturing apparatus, wiring unit and filter unit
DE10109031A1 (en) * 2001-02-24 2002-09-05 Zeiss Carl Optical beam guidance system and method for preventing contamination of optical components thereof
EP2287644B1 (en) 2009-08-18 2014-04-09 Mitsubishi Electric Corporation Light source device and method of producing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6347033A (en) * 1986-08-08 1988-02-27 Mitsubishi Heavy Ind Ltd High-speed machining device
US5559584A (en) * 1993-03-08 1996-09-24 Nikon Corporation Exposure apparatus
JPH09275054A (en) * 1996-04-03 1997-10-21 Nikon Corp Semiconductor manufacturing apparatus
JPH10242029A (en) * 1997-02-27 1998-09-11 Canon Inc Aligner
JPH10270535A (en) * 1997-03-25 1998-10-09 Nikon Corp Moving stage device and circuit-device manufacture using the same

Also Published As

Publication number Publication date
WO2000042639A1 (en) 2000-07-20

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase