AU2003289141A1 - Process for producing compound semiconductor, apparatus therefor, infrared emitting element and infrared receiving element - Google Patents
Process for producing compound semiconductor, apparatus therefor, infrared emitting element and infrared receiving elementInfo
- Publication number
- AU2003289141A1 AU2003289141A1 AU2003289141A AU2003289141A AU2003289141A1 AU 2003289141 A1 AU2003289141 A1 AU 2003289141A1 AU 2003289141 A AU2003289141 A AU 2003289141A AU 2003289141 A AU2003289141 A AU 2003289141A AU 2003289141 A1 AU2003289141 A1 AU 2003289141A1
- Authority
- AU
- Australia
- Prior art keywords
- infrared
- compound semiconductor
- apparatus therefor
- producing compound
- emitting element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Led Devices (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002368333A JP4331936B2 (ja) | 2002-12-19 | 2002-12-19 | 化合物半導体の製造方法及び化合物半導体の製造装置 |
JP2002-368333 | 2002-12-19 | ||
PCT/JP2003/015479 WO2004057655A1 (ja) | 2002-12-19 | 2003-12-03 | 化合物半導体の製造方法及び化合物半導体の製造装置並びに赤外線発光素子及び赤外線受光素子 |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003289141A1 true AU2003289141A1 (en) | 2004-07-14 |
Family
ID=32677114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003289141A Abandoned AU2003289141A1 (en) | 2002-12-19 | 2003-12-03 | Process for producing compound semiconductor, apparatus therefor, infrared emitting element and infrared receiving element |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4331936B2 (ja) |
AU (1) | AU2003289141A1 (ja) |
WO (1) | WO2004057655A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7560736B2 (en) * | 2005-08-15 | 2009-07-14 | General Electric Company | Mid-infrared resonant cavity light emitting diodes |
JP4961820B2 (ja) * | 2006-04-26 | 2012-06-27 | 住友電気工業株式会社 | 化合物半導体の製造方法 |
JP2012080010A (ja) * | 2010-10-05 | 2012-04-19 | Sumitomo Electric Ind Ltd | エピタキシャルウエハ、半導体素子、およびこれらの製造方法 |
JP6132746B2 (ja) * | 2013-11-05 | 2017-05-24 | 浜松ホトニクス株式会社 | 赤外線検出素子 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4024965B2 (ja) * | 1999-07-22 | 2007-12-19 | 三菱化学株式会社 | エピタキシャルウエハおよび発光ダイオード |
-
2002
- 2002-12-19 JP JP2002368333A patent/JP4331936B2/ja not_active Expired - Fee Related
-
2003
- 2003-12-03 AU AU2003289141A patent/AU2003289141A1/en not_active Abandoned
- 2003-12-03 WO PCT/JP2003/015479 patent/WO2004057655A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP2004200480A (ja) | 2004-07-15 |
JP4331936B2 (ja) | 2009-09-16 |
WO2004057655A1 (ja) | 2004-07-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |