AU2003264338A1 - Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method - Google Patents

Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method

Info

Publication number
AU2003264338A1
AU2003264338A1 AU2003264338A AU2003264338A AU2003264338A1 AU 2003264338 A1 AU2003264338 A1 AU 2003264338A1 AU 2003264338 A AU2003264338 A AU 2003264338A AU 2003264338 A AU2003264338 A AU 2003264338A AU 2003264338 A1 AU2003264338 A1 AU 2003264338A1
Authority
AU
Australia
Prior art keywords
position detection
mark position
superimposing
superimposing measurement
detection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003264338A
Inventor
Hiroshi Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003264338A1 publication Critical patent/AU2003264338A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7092—Signal processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
AU2003264338A 2002-08-22 2003-08-21 Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method Abandoned AU2003264338A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-242049 2002-08-22
JP2002242049A JP4178875B2 (en) 2002-08-22 2002-08-22 Mark position detection device, mark position detection method, overlay measurement device, and overlay measurement method
PCT/JP2003/010582 WO2004019389A1 (en) 2002-08-22 2003-08-21 Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method

Publications (1)

Publication Number Publication Date
AU2003264338A1 true AU2003264338A1 (en) 2004-03-11

Family

ID=31944008

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003264338A Abandoned AU2003264338A1 (en) 2002-08-22 2003-08-21 Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method

Country Status (4)

Country Link
JP (1) JP4178875B2 (en)
AU (1) AU2003264338A1 (en)
TW (1) TW200405427A (en)
WO (1) WO2004019389A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005302970A (en) * 2004-04-09 2005-10-27 Nikon Corp Method for creating recipe, position detector, and misregistration detector
JP2006118931A (en) * 2004-10-20 2006-05-11 Nikon Corp Mark position detection apparatus and misregistration detection apparatus
JP4757701B2 (en) * 2006-04-25 2011-08-24 Ｊｕｋｉ株式会社 Electronic component suction position correction method and apparatus
JP4770590B2 (en) 2006-05-26 2011-09-14 ソニー株式会社 Outline creation apparatus, creation method, and image processing apparatus
TWI762417B (en) * 2021-09-01 2022-04-21 環球晶圓股份有限公司 Method for identifying wafer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3347490B2 (en) * 1994-09-28 2002-11-20 キヤノン株式会社 Positioning method, projection exposure apparatus and position deviation measuring apparatus by the method
JPH104044A (en) * 1996-06-13 1998-01-06 Hitachi Ltd Method for detecting pattern, method for detecting alignment mark and optical apparatus using the methods
KR20020006690A (en) * 1999-03-24 2002-01-24 시마무라 테루오 Position determining device, position determining method and exposure device, exposure method and alignment determining device, and alignment determining method
JP4046884B2 (en) * 1999-03-26 2008-02-13 キヤノン株式会社 Position measuring method and semiconductor exposure apparatus using the position measuring method

Also Published As

Publication number Publication date
WO2004019389A1 (en) 2004-03-04
TW200405427A (en) 2004-04-01
JP2004079970A (en) 2004-03-11
JP4178875B2 (en) 2008-11-12

Similar Documents

Publication Publication Date Title
AU2003271973A1 (en) Position sensing apparatus and method
AU2003289272A1 (en) Surface position detection apparatus, exposure method, and device porducing method
AU2003226970A1 (en) Distance measuring device and method for determining a distance
AU2003242019A1 (en) Distance measurement method and device
AU2003237232A1 (en) Sensor device and methods for using same
AU2002313867A1 (en) A sensing device for measuring the three dimension shape and its measuring method
AU2003242433A1 (en) Gas detection device
AU2002352369A1 (en) Detectable components and detection apparatus for detecting such components
AU2003299606A1 (en) Method for aberration detection and measurement
AU2003241457A1 (en) Method, apparatus, and system for automatically positioning a probe or sensor
AU2003249289A1 (en) Apparatus and method for absolute angular position sensing
AU2003235653A1 (en) Method and device for measuring distance
AU2003243559A1 (en) Apparatus and methods for detecting cerebrospinal fluid
AU2003280602A1 (en) Wiring pattern inspection device, inspection method, detection device, and detection method
AU2003239534A1 (en) Methods and apparatus for accurate phase detection
AU2003240238A1 (en) Method and device for detection in the frequency range, based on a time range measurement
AU2003221063A1 (en) Calibration evaluation method and device for acceleration sensor
AU2003241737A1 (en) Position measurement method, exposure method, exposure device, and device manufacturing method
AU2003262553A1 (en) Device and method for measurement
GB0220434D0 (en) Detection device
AU2003264338A1 (en) Mark position detection device, mark position detection method, superimposing measurement device, and superimposing measurement method
IL153012A0 (en) Method and device for detecting analytes
AU2003257821A1 (en) Gas sensor and gas detecting method
AU2003302066A1 (en) Position measurement method, position measurement device, exposure method, and exposure device
AU2002307967A1 (en) Gas detection device

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase